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公开(公告)号：US20190094707A1
公开(公告)日：2019-03-28
申请号：US16203693
申请日：2018-11-29
IPC分类号： G03F7/20
摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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公开(公告)号：US09645508B2
公开(公告)日：2017-05-09
申请号：US15018582
申请日：2016-02-08
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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公开(公告)号：US20140362355A1
公开(公告)日：2014-12-11
申请号：US14310873
申请日：2014-06-20
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
摘要翻译： 提供了一种用于清洁光刻设备的污染表面的设备和方法。 液体限制结构包括用于向结构下方的间隙供应和提取液体的至少两个开口。 可以切换开口之间的流动方向。 液体可以被供应到适于双流的开口的径向向外的间隙。 供应和提取线分别从液体限制结构提供液体和从液体中提取液体具有耐有机液体腐蚀的内表面。 腐蚀性清洁液可用于清洁光刻胶污染物。
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公开(公告)号：US10241418B2
公开(公告)日：2019-03-26
申请号：US15527645
申请日：2015-09-21
发明人： Marc Hauptmann , Dylan John David Davies , Paul Janssen , Naoko Tsugama , Richard Joseph Bruls , Kornelis Tijmen Hoekerd , Edwin Johannes Maria Janssen , Petrus Johannes Van Den Oever , Ronald Van Der Wilk , Antonius Hubertus Van Schijndel , Jorge Alberto Vieyra Salas
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20 , G03F1/84 , G01N21/95 , H01L21/66 , G01N21/956 , G01N27/61
摘要： A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.
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公开(公告)号：US09927716B2
公开(公告)日：2018-03-27
申请号：US15589674
申请日：2017-05-08
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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公开(公告)号：US10437156B2
公开(公告)日：2019-10-08
申请号：US16203693
申请日：2018-11-29
IPC分类号： G03F7/20
摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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7.发明申请公开(公告)号：US20190219929A1
公开(公告)日：2019-07-18
申请号：US16362754
申请日：2019-03-25
发明人： Marc Hauptmann , Dylan John David Davies , Paul Janssen , Naoko Tsugama , Richard Joseph Bruls , Kornelis Tijmen Hoekerd , Edwin Johannes Maria Janssen , Petrus Johannes Van Den Oever , Ronald Van Der Wilk , Antonius Hubertus Van Schijndel , Jorge Alberto Vieyra Salas
CPC分类号： G03F7/70616 , G01N21/9501 , G01N27/61 , G01N2021/95676 , G03F1/84 , G03F7/70508 , G03F7/70783 , H01L22/12 , H01L22/20
摘要： A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.
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公开(公告)号：US09261796B2
公开(公告)日：2016-02-16
申请号：US14310873
申请日：2014-06-20
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
摘要翻译： 提供了一种用于清洁光刻设备的污染表面的设备和方法。 液体限制结构包括用于向结构下方的间隙供应和提取液体的至少两个开口。 可以切换开口之间的流动方向。 液体可以被供应到适于双流的开口的径向向外的间隙。 供应和提取线分别从液体限制结构提供液体和从液体中提取液体具有耐有机液体腐蚀的内表面。 腐蚀性清洁液可用于清洁光刻胶污染物。
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