Invention Application
US20130284369A1 TWO-PHASE OPERATION OF PLASMA CHAMBER BY PHASE LOCKED LOOP
审中-公开
通过相位锁定环进行等离子体室的两相操作
- Patent Title: TWO-PHASE OPERATION OF PLASMA CHAMBER BY PHASE LOCKED LOOP
- Patent Title (中): 通过相位锁定环进行等离子体室的两相操作
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Application No.: US13632302Application Date: 2012-10-01
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Publication No.: US20130284369A1Publication Date: 2013-10-31
- Inventor: Satoru Kobayashi , Lawrence Wong , Jonathan Liu , Yang Yang , Kartik Ramaswamy , Shahid Rauf , Shane C. Nevil , Kallol Bera , Kenneth S. Collins
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C16/505
- IPC: C23C16/505 ; B05C9/00
Abstract:
Plasma distribution is controlled in a plasma reactor by controlling the phase difference between opposing RF electrodes, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.
Information query
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