- 专利标题: Charged particle beam apparatus
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申请号: US16920898申请日: 2020-07-06
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公开(公告)号: US11335535B2公开(公告)日: 2022-05-17
- 发明人: Yohei Nakamura , Takafumi Miwa , Heita Kimizuka , Natsuki Tsuno , Muneyuki Fukuda
- 申请人: Hitachi High-Tech Corporation
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Tech Corporation
- 当前专利权人: Hitachi High-Tech Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge, P.C.
- 优先权: JPJP2019-146172 20190808
- 主分类号: H01J37/244
- IPC分类号: H01J37/244 ; H01J37/28 ; G01N23/2251
摘要:
Provided is a charged particle beam apparatus capable of estimating an internal device structure of a sample. The charged particle beam apparatus includes an electron beam optical system, a detector, and a calculator. The electron beam optical system irradiates a plurality of irradiation points on a sample, which are different in position or time, with an electron beam. The detector detects electrons emitted from the sample in response to irradiation of the electron beam by the electron beam optical system. The calculator calculates a dependence relationship between the irradiation points based on the electrons detected by the detector at the plurality of irradiation points.
公开/授权文献
- US20210043415A1 CHARGED PARTICLE BEAM APPARATUS 公开/授权日:2021-02-11
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