Invention Grant
- Patent Title: Semiconductor device including undulated profile of net doping in a drift zone
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Application No.: US14165658Application Date: 2014-01-28
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Publication No.: US10211325B2Publication Date: 2019-02-19
- Inventor: Elmar Falck , Andreas Haertl , Manfred Pfaffenlehner , Francisco Javier Santos Rodriguez , Daniel Schloegl , Hans-Joachim Schulze , Andre Stegner , Johannes Georg Laven
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L29/739 ; H01L21/265 ; H01L21/324 ; H01L29/06 ; H01L29/66 ; H01L29/861 ; H01L21/263 ; H01L29/36 ; H01L29/10 ; H01L29/08

Abstract:
A semiconductor device includes a semiconductor body having opposite first and second sides. The semiconductor device further includes a drift zone in the semiconductor body between the second side and a pn junction. A profile of net doping of the drift zone along at least 50% of a vertical extension of the drift zone between the first and second sides is undulated and includes doping peak values between 1×1013 cm−3 and 5×1014 cm−3. A device blocking voltage Vbr is defined by a breakdown voltage of the pn junction between the drift zone and a semiconductor region of opposite conductivity type that is electrically coupled to the first side of the semiconductor body.
Public/Granted literature
- US20150214347A1 Semiconductor Device Including Undulated Profile of Net Doping in a Drift Zone Public/Granted day:2015-07-30
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