- 专利标题: Semiconductor devices including active areas with increased contact area
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申请号: US15473031申请日: 2017-03-29
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公开(公告)号: US10128245B2公开(公告)日: 2018-11-13
- 发明人: Do Sun Lee , Joon Gon Lee , Na Rae Kim , Chul Sung Kim , Do Hyun Lee , Ryuji Tomita , Sang Jin Hyun
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel, P.A.
- 优先权: KR10-2016-0122222 20160923
- 主分类号: H01L29/78
- IPC分类号: H01L29/78 ; H01L27/092 ; H01L29/165 ; H01L29/45 ; H01L29/417 ; H01L21/8238 ; H01L29/08 ; H01L29/66 ; H01L21/02 ; H01L21/285
摘要:
Semiconductor devices may have a first semiconductor element including first active regions that are doped with a first conductivity-type impurity and that are on a semiconductor substrate, a first gate structure between the first active regions, and first contacts connected to the first active regions, respectively; and a second semiconductor element including second active regions that are doped with a second conductivity-type impurity different from the first conductivity-type impurity and that are on the semiconductor substrate, a second gate structure between the second active regions, and second contacts connected to the second active regions, respectively, and having a second length greater than a first length of each of the first contacts in a first direction parallel to an upper surface of the semiconductor substrate.
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