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公开(公告)号:US12110393B2
公开(公告)日:2024-10-08
申请号:US17268433
申请日:2018-08-17
申请人: WACKER CHEMIE AG
发明人: Detlev Ostendorf
CPC分类号: C08L83/04 , C08G77/12 , C08G77/18 , C08G77/20 , C08G77/24 , C08G77/26 , C08G77/70 , C08G77/80
摘要: Organopolysiloxane mixtures curable by hydrosilylation include MT organopolysiloxanes having 10 to 20 siloxy units and containing a fraction of 0.15 to 0.24 M units based on total siloxy units in the organopolysiloxane, and a polydispersity of 1.05 to 1.40, a hydrosilylation catalyst, and an Si—H-functional organopolysiloxane are curable to vulcanizates with elastic moduli which may be greater than 0.5 GPa.
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2.
公开(公告)号:US20240294759A1
公开(公告)日:2024-09-05
申请号:US18571110
申请日:2022-06-15
申请人: SILOXENE AG
IPC分类号: C08L83/04 , C08G77/18 , C08G77/26 , C08G77/28 , C08G83/00 , C08L63/00 , C08L83/08 , C09D183/06 , C09D183/08 , C09J183/06 , C09J183/08
CPC分类号: C08L83/04 , C08G77/18 , C08G77/26 , C08G77/28 , C08G83/005 , C08L63/00 , C08L83/08 , C09D183/06 , C09D183/08 , C09J183/06 , C09J183/08
摘要: The present invention pertains to a polymeric liquid polysiloxane material comprising non-organofunctional Q-type siloxane moieties and optionally mono-organofunctional T-type siloxane moieties, for efficient rearrangement and curing reactions. The present invention further pertains to associated uses of the material.
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3.
公开(公告)号:US20240287257A1
公开(公告)日:2024-08-29
申请号:US18613569
申请日:2024-03-22
发明人: Manchao Xiao , Matthew R. MacDonald , Xinjian Lei , Meiliang Wang
IPC分类号: C08G77/26 , C07F7/10 , C07F7/18 , C07F7/21 , C08G77/04 , C08G77/06 , C08L83/08 , C23C16/40 , C23C16/455
CPC分类号: C08G77/26 , C07F7/10 , C07F7/1888 , C07F7/21 , C08G77/045 , C08G77/06 , C08L83/08 , C23C16/401 , C23C16/45527 , C23C16/45553 , C08G2390/40
摘要: Amino-functionalized linear and cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized linear and cyclic oligosiloxanes are also disclosed.
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公开(公告)号:US20240280905A1
公开(公告)日:2024-08-22
申请号:US18440906
申请日:2024-02-13
申请人: Brewer Science, Inc.
发明人: Si Li , Ming Luo , Ruimeng Zhang , Kelsey Brakensiek , Xue Wang , Yichen Liang , Xinlin Lu , Pengtao Lu
IPC分类号: G03F7/11 , C07D301/00 , C07F7/08 , C08G77/26 , C08G77/50 , C09D183/04 , C09D183/14
CPC分类号: G03F7/11 , C07D301/00 , C07F7/0834 , C08G77/26 , C08G77/50 , C09D183/04 , C09D183/14
摘要: Novel lithographic compositions for use as an EUV underlayer are disclosed. The invention includes methods of fabricating microelectronics structures using those compositions as well as structures formed by those methods. The method involves utilizing an underlayer immediately below the photoresist layer. The underlayer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred underlayers are formed from spin-coatable, monomeric, oligomeric, and/or polymeric compositions and exhibit uniform thicknesses and low roughness. The disclosed method enables a 14/28 nm pattern using EUV lithography and better depth of focus (DOF) than standard EUV underlayers.
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5.
公开(公告)号:US20240279255A1
公开(公告)日:2024-08-22
申请号:US18290969
申请日:2022-10-06
发明人: Erich Molitor , Joseph Neuman , Michael Tulchinsky , Ruth Figueroa , David Devore , Mrunmayi Kumbhalkar , Michael Ferritto , Michael Telgenhoff , Brian Rekken , Souvagya Biswas , Michael A. Brammer , Heather A. Spinney
CPC分类号: C07F7/0889 , C07F7/0838 , C08G77/26
摘要: An organosilicon compound with a primary aminopropyl-functional group is prepared. A catalyzed reductive amination process for combining a secondary propylimine-functional organosilicon compound with ammonia and hydrogen produces the primary aminopropyl-functional organosilicon compound.
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6.
公开(公告)号:US20240278055A1
公开(公告)日:2024-08-22
申请号:US18553850
申请日:2022-06-21
发明人: Anirudha Banerjee , Nanguo Liu , Zachary Wenzlick , Yihan Liu
CPC分类号: A62D1/0071 , A62D1/0014 , C01B33/14 , C08G77/045 , C08G77/26 , C01P2004/64
摘要: A foam stabilizing composition includes a) colloidal silica and b) a siloxane cationic surfactant. The siloxane cationic surfactant includes a cationic moiety having the formula Z1-D1-N(Y)a(R)2-a, where Z1 is a siloxane moiety, D1 is a divalent linking group, R is H or an unsubstituted hydrocarbyl group having from 1 to 4 carbon atoms, subscript a is 1 or 2, and each Y has formula -D-NR13+, where D is a divalent linking group and each R1 is independently an unsubstituted hydrocarbyl group having from 1 to 4 carbon atoms. A firefighting includes the foam stabilizing composition and water. Methods of making and using the same are also provided.
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公开(公告)号:US20240209155A1
公开(公告)日:2024-06-27
申请号:US18550825
申请日:2022-03-16
发明人: Kaoru Okamura
CPC分类号: C08G77/26 , C08G77/38 , C08G2210/00
摘要: [Purpose ]One of the purposes of the present invention is to provide a siloxane compound having an amide bond and a (meth)acrylate group. Further, other purpose of the present invention is to provide a method for preparing a siloxane compound having beneficial purity as a medical material.
[Solution] A siloxane compound represented by the following formula (1), having at least two groups represented by the following formula (2) in one molecular
wherein R is, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, R1 is, independently of each other, a group defined for R or a group represented by the following formula (2) or (3), R2 is, independently of each other, a group represented by the following formula (2) or (3), p is an integer of 0 to 500, q is an integer of 0 to 50, provided that said formula (1) has at least two groups represented by the following formula (2), the bonding order of the siloxane units is not limited and may form a block structure or a random bonding,
wherein R3 is a hydrogen atom or a methyl group, R4 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms, L1 is a divalent hydrocarbon group having 1 to 5 carbon atoms, L2 is a divalent hydrocarbon group having 2 to 10 carbon atoms and which may contain an ether bond, and the site marked with * or ** is a binding position to the silicon atom in formula (1).-
公开(公告)号:US12019352B2
公开(公告)日:2024-06-25
申请号:US17024960
申请日:2020-09-18
发明人: Min Sang Kim , Yoon Seok Ko , Boreum Jeong , Sang Soo Jee
IPC分类号: C08F220/14 , C08G77/14 , C08G77/26 , C08K5/23 , C08L33/10 , G02F1/1516 , G02F1/361 , C08L43/04
CPC分类号: G02F1/3619 , C08F220/14 , C08G77/14 , C08G77/26 , C08K5/23 , C08L33/10 , G02F1/15165 , G02F1/3612 , C08L43/04 , G02F2202/022 , G02F2202/38
摘要: A composition for preparing a nonlinear optic material including an organic chromophore that is polarized by an electric field, a precursor that can form an inorganic material polymer by a sol-gel reaction, and a compatibilizer that can bind to both the organic chromophore and the inorganic material polymer, wherein the organic chromophore includes a functional group at a terminal end that can bind to both the inorganic material polymer and the compatibilizer, a nonlinear optic material prepared from the composition, a method of preparing the nonlinear optic material, and an electro-optic device including the nonlinear optic material are disclosed.
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公开(公告)号:US20240206222A1
公开(公告)日:2024-06-20
申请号:US17760848
申请日:2022-02-25
发明人: Lingyu DU , Jinchuan LI
IPC分类号: H10K50/816 , C08G77/00 , C08G77/26 , H10K50/818 , H10K85/40 , H10K102/00
CPC分类号: H10K50/816 , C08G77/26 , H10K50/818 , H10K85/40 , C08G77/80 , H10K2102/311
摘要: The present application provides an OLED display panel and a display device. The OLED display panel includes a substrate and an anode disposed on the substrate, wherein the anode includes a first conductive body layer and a self-repairing layer, and the self-repairing layer is located on a side of the first conductive body layer close to the substrate.
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公开(公告)号:US20240069441A1
公开(公告)日:2024-02-29
申请号:US18254997
申请日:2021-11-26
发明人: Satoshi TAKEDA , Wataru SHIBAYAMA , Shuhei SHIGAKI , Ken ISHIBASHI , Kodai KATO , Makoto NAKAJIMA
IPC分类号: G03F7/11 , C08G77/26 , C09D183/08
CPC分类号: G03F7/11 , C08G77/26 , C09D183/08
摘要: A resist underlayer film-forming composition capable of reducing occurrence of defects caused by microparticles or the like that may be generated during formation of a coating film. A silicon-containing resist underlayer film-forming composition including: [A]a polysiloxane; [B] a glycol compound having a normal boiling point of 230.0° C. or higher and being of the following Formula (1):
(wherein R1 and R2 are each independently a hydrogen atom, a C1-4 alkyl group, or a C3-4 acyl group; and n is an integer of 3 or more); and [C] a solvent (except for a compound corresponding to the compound [B]).
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