Field effect transistors including vertically oriented gate electrodes extending inside vertically protruding portions of a substrate
    2.
    发明授权
    Field effect transistors including vertically oriented gate electrodes extending inside vertically protruding portions of a substrate 有权
    场效应晶体管包括在衬底的垂直突出部分内延伸的垂直取向的栅电极

    公开(公告)号:US07129541B2

    公开(公告)日:2006-10-31

    申请号:US10945246

    申请日:2004-09-20

    摘要: A field effect transistor on an active region of a semiconductor substrate includes a vertically protruding thin-body portion of the semiconductor substrate and a vertically oriented gate electrode at least partially inside a cavity defined by opposing sidewalls of the vertically protruding portion of the substrate. The transistor further includes an insulating layer surrounding an upper portion of the vertically oriented gate electrode and a laterally oriented gate electrode on the insulating layer and connected to a top portion of the vertically oriented gate electrode. Accordingly, a T-shaped gate electrode is defined having a lateral portion on a top surface of a semiconductor substrate and having a vertical portion at least partially inside a cavity defined by opposing sidewalls of a vertically protruding portion of the substrate.

    摘要翻译: 在半导体衬底的有源区域上的场效应晶体管包括半导体衬底的垂直突出的薄体部分和至少部分地在由衬底的垂直突出部分的相对侧壁限定的空腔内的垂直取向的栅电极。 晶体管还包括围绕垂直取向的栅电极的上部的绝缘层和绝缘层上的横向取向的栅电极,并连接到垂直取向的栅电极的顶部。 因此,T形栅电极被限定为具有在半导体衬底的顶表面上的横向部分,并且具有至少部分至少部分在由衬底的垂直突出部分的相对侧壁限定的空腔内的垂直部分。