Invention Grant
- Patent Title: Field effect transistors including vertically oriented gate electrodes extending inside vertically protruding portions of a substrate
- Patent Title (中): 场效应晶体管包括在衬底的垂直突出部分内延伸的垂直取向的栅电极
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Application No.: US10945246Application Date: 2004-09-20
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Publication No.: US07129541B2Publication Date: 2006-10-31
- Inventor: Sung-Min Kim , Hye-Jin Cho , Shin-Ae Lee , Eun-Jung Yun , Dong-Gun Park
- Applicant: Sung-Min Kim , Hye-Jin Cho , Shin-Ae Lee , Eun-Jung Yun , Dong-Gun Park
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2003-0065128 20030919
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L3/113 ; H01L31/119

Abstract:
A field effect transistor on an active region of a semiconductor substrate includes a vertically protruding thin-body portion of the semiconductor substrate and a vertically oriented gate electrode at least partially inside a cavity defined by opposing sidewalls of the vertically protruding portion of the substrate. The transistor further includes an insulating layer surrounding an upper portion of the vertically oriented gate electrode and a laterally oriented gate electrode on the insulating layer and connected to a top portion of the vertically oriented gate electrode. Accordingly, a T-shaped gate electrode is defined having a lateral portion on a top surface of a semiconductor substrate and having a vertical portion at least partially inside a cavity defined by opposing sidewalls of a vertically protruding portion of the substrate.
Public/Granted literature
- US20050062109A1 Field effect transistors with vertically oriented gate electrodes and methods for fabricating the same Public/Granted day:2005-03-24
Information query
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