公开(公告)号：US20040211441A1

公开(公告)日：2004-10-28

申请号：US10434900

申请日：2003-04-22

Inventor： Ching-An Huang ,  Chun-Ching Hsu

IPC: C23G001/00

CPC classification number: C23F1/28 ,  C23G1/086

Abstract: A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of the cut section is achieved. An oxidized film with a thickness of several micrometers is formed when a cut and punched steel is quenched and tempered at high temperature. Due to high strength and hardness of the steel, the oxidized film and edge burs are difficult to be removed by mechanical grinding. Therefore, a suitable electrolyte composes of only a little chemical reagent and oxidizer in deionized water is used to remove the oxidized film and punched bur simultaneously using chemical etching method.

Abstract translation: 公开了一种化学蚀刻方法，用于除去硬化处理的碳钢（SK3，SK4和SK5）的氧化膜和去除切口以及冲压边缘毛刺。 由此，能够实现切断部的圆角。 当切割和冲压的钢在高温下淬火和回火时，形成厚度为几微米的氧化膜。 由于钢的高强度和硬度，氧化膜和边缘钻头难以通过机械研磨而被去除。 因此，仅使用少量化学试剂的合适电解质和去离子水中的氧化剂用于使用化学蚀刻法同时除去氧化膜和冲压毛刺。

公开(公告)号：US20040154640A1

公开(公告)日：2004-08-12

申请号：US10723455

申请日：2003-11-25

Inventor： Kim R. Smith ,  Mark D. Levitt ,  Stephen Engel ,  David J. Falbaum ,  Jerry D. Hoyt

IPC: C23G001/00

CPC classification number: C11D3/0094 ,  C11D1/02 ,  C11D1/143 ,  C11D1/146 ,  C11D1/22 ,  C11D1/28 ,  C11D1/29 ,  C11D1/722 ,  C11D1/83 ,  C11D3/2065 ,  C11D3/2068 ,  C11D3/3765 ,  C11D11/0035

Abstract: A cleaning composition is provided. The cleaning composition includes an anionic surfactant and a water hardness anti-precipitant mixture. The water hardness anti-precipitant mixture includes a dispersant and at least one of a sheeting agent and a humectant. The weight ratio of the dispersant to the total amount of the sheeting agent and the humectant can be at least about 1:75 and less than about 75:1. Methods for providing and using a ready to use cleaning composition are provided.

Abstract translation: 提供清洁组合物。 清洁组合物包括阴离子表面活性剂和水硬度的抗沉淀剂混合物。 水硬度抗沉淀剂混合物包括分散剂和片剂和湿润剂中的至少一种。 分散剂与片剂和湿润剂的总量的重量比可以为至少约1:75且小于约75:1。 提供了提供和使用即用型清洁组合物的方法。

公开(公告)号：US20040118430A1

公开(公告)日：2004-06-24

申请号：US10329171

申请日：2002-12-24

Inventor： Brian Nils Hansen ,  Samuel Wesley Crouch ,  Brooks Michael Hybertson

IPC: C23G001/00 ,  B08B003/10

CPC classification number: H01L21/67748 ,  B08B3/10 ,  B08B7/00 ,  B08B7/0021 ,  H01L21/02052 ,  H01L21/67109 ,  H01L21/67126 ,  H01L21/67751 ,  Y10S134/902

Abstract: Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from the processing space. The heating system of the apparatus heats both the cover and the stage inside the pressurized chamber such that cycle time to equilibrate heated, pressurized fluids such as supercritical carbon dioxide inside the chamber are decreased. The apparatus includes a mechanism that raises the stage inside the chamber, pressing it against the fixed cover and sealing the inside of the pressure vessel. In one embodiment a screw-type jack is used to move the component-loaded stage fitted with a deformable o-ring seal a short travel distance to seat against the lid and seal the pressure chamber. In a related embodiment a computer and an electronic stepper motor are used to drive the pressing means in an automated fashion.

Abstract translation: 公开了一种用于压力处理部件的装置，其包括改进的封闭系统，其使产尘部件最小化并允许容易地进入腔室。 提供端口用于将加压气体和流体引入和释放到处理空间和从处理空间释放。 设备的加热系统加热加压室内的盖和台，使得室内加热的加压流体例如超临界二氧化碳的循环时间减少。 该装置包括一个机构，其升高室内的台阶，将其压靠固定盖并密封压力容器的内部。 在一个实施例中，使用螺旋式千斤顶将装配有可变形O形环密封件的部件加载台移动到短的行进距离，以抵靠盖子并密封压力室。 在相关实施例中，使用计算机和电子步进电机以自动方式驱动按压装置。

公开(公告)号：US20040084060A1

公开(公告)日：2004-05-06

申请号：US10620513

申请日：2003-07-16

Inventor： Peter Zhu ,  Henry Hui ,  Les Feldman

IPC: C23G001/00

CPC classification number: A62D3/30 ,  A61L2/16 ,  A62D2101/28 ,  C07C45/78 ,  C07C227/18 ,  C07C229/16

Abstract: A method and kit are disclosed for removing or alleviating the severity or intensity of stains from aldehyde-based sterilizing solutions through the use of reducing agents. This invention is effective even for porous surfaces such as filter paper and porous nylon films as well as for smooth surfaces such as glass, aluminum, copper, brass and stainless steel. Also, the invention may be used in a variety of formats such as a kit useful for making or using solutions or gels to treat the aldehyde-based stained surfaces of, for example, medical devices, hospital bench or table tops, hospital floors and skin (if in appropriate pH range), etc.

Abstract translation: 公开了通过使用还原剂从醛基杀菌溶液中除去或减轻污渍的严重性或强度的方法和试剂盒。 本发明对于诸如滤纸和多孔尼龙膜的多孔表面以及玻璃，铝，铜，黄铜和不锈钢等光滑表面也是有效的。 此外，本发明可以以各种形式使用，例如可用于制备或使用溶液或凝胶来治疗例如医疗装置，医院工作台或桌面，医院地板和皮肤的醛基染色表面的试剂盒 （如果在适当的pH范围内）等

公开(公告)号：US20040011381A1

公开(公告)日：2004-01-22

申请号：US10198309

申请日：2002-07-17

Inventor： Leonard E. Klebanoff ,  Samuel Graham JR.

IPC: C23G001/00

CPC classification number: G03F7/70925 ,  B08B7/0035 ,  C03C17/3482 ,  C03C23/0075 ,  C03C2218/32 ,  H01L21/02046

Abstract: A method using atomic hydrogen for removing carbon contamination from optical surfaces. The method is particularly useful for removing carbon and hydrocarbon contamination in-situ from the surface of the multilayer optics used for extreme ultraviolet lithography (EUVL) without degrading the quality of the optical surface. Atomic hydrogen at pressures in the range of about 10null3 and 10null4 Torr without the potentially detrimental heating of the optic is used to provide cleaning rates of about 6-60 null/hr.

Abstract translation: 使用原子氢去除光学表面碳污染的方法。 该方法特别可用于从用于极紫外光刻（EUVL）的多层光学器件的表面原位除去碳和碳氢化合物污染物，而不会降低光学表面的质量。 使用大约10 -3和10 -4 Torr范围内的压力的原子氢，而不会对光学元件造成潜在的有害的加热，以提供大约6-60埃/小时的清洁率。

公开(公告)号：US20030221704A1

公开(公告)日：2003-12-04

申请号：US10370045

申请日：2003-02-19

Applicant: Praxair Technology, Inc.

Inventor： Michael Clinton Johnson ,  Carl Joseph Heim ,  John Fredric Billingham

IPC: C23G001/00

CPC classification number: F25J3/08 ,  C01B32/50 ,  F25J2205/40 ,  F25J2205/82 ,  F25J2205/84 ,  F25J2215/80 ,  F25J2220/82 ,  F25J2220/84 ,  F25J2235/80 ,  F25J2245/02 ,  F25J2260/80 ,  F25J2270/90 ,  F25J2290/60 ,  Y02P20/544

Abstract: Carbon dioxide is purified through the use of catalytic oxidation. Carbon dioxide is exposed to at least one catalyst, oxidizing at least a portion of the nonvolatile organic residues to form purified carbon dioxide that is directed to an application. Carbon dioxide that is in a near-critical, critical, or supercritical phase can be exposed to the catalyst.

Abstract translation: 通过使用催化氧化来净化二氧化碳。 将二氧化碳暴露于至少一种催化剂，氧化至少一部分非挥发性有机残余物以形成针对应用的纯化二氧化碳。 处于近临界，临界或超临界阶段的二氧化碳可暴露于催化剂。

公开(公告)号：US20030200989A1

公开(公告)日：2003-10-30

申请号：US10427661

申请日：2003-05-01

Applicant: International Test Solutions, Inc.

Inventor： Alan E. Humphrey ,  Billie Jogce Freeze

IPC: C23G001/00

CPC classification number: B08B7/0028 ,  B08B1/00 ,  B08B2220/01 ,  G01R3/00

Abstract: The cleaning device may clean probe elements. The probe elements may be the probe elements of a probe card testing apparatus for testing semiconductor wafers or semiconductor dies on a semiconductor wafer or the probe elements of a handling/testing apparatus for testing the leads of a packaged integrated circuit. During the cleaning of the probe elements, the probe card or the handler/tester is cleaned during the normal operation of the testing machine without removing the probe card from the prober. The cleaning device may be placed within the prober or tester/handler similar to a wafer containing semiconductor dies to be tested so that the probe elements of the testing machine contact the cleaning medium periodically to remove debris and/or reshape the tips of the probe elements. The cleaning device may include a substrate, that may be shaped and sized like a typical semiconductor wafer that typically fits into the testing machine, and a pad attached to the upper surface of the substrate that cleans and/or reshapes the probe element tips without removing the testing head with the probe elements from the testing machine. The cleaning medium may chemically clean the probe elements and trap the environmentally hazardous material within and on the pad.

Abstract translation: 清洁装置可以清洁探针元件。 探针元件可以是用于测试半导体晶片上的半导体晶片或半导体晶片的探针卡测试装置的探针元件或用于测试封装集成电路的引线的处理/测试装置的探针元件。 在清洁探针元件期间，在测试机器的正常操作期间，探针卡或处理器/测试仪被清洁，而不从探测器中移除探针卡。 清洁装置可以放置在探测器或测试器/处理器内，类似于包含要测试的半导体管芯的晶片，使得测试机器的探针元件周期性地接触清洁介质以去除碎屑和/或重新形成探针元件的尖端 。 清洁装置可以包括基底，其可以被成形和尺寸像通常适合于测试机器的典型半导体晶片，以及附接到基板的上表面的垫，其清洁和/或重塑探针元件尖端而不去除 测试头带有来自测试机的探头元件。 清洁介质可以化学地清洁探针元件并且将有害环境的物质捕获到垫内和垫上。

公开(公告)号：US20030172956A1

公开(公告)日：2003-09-18

申请号：US10362071

申请日：2003-02-20

Inventor： Hideyuki Hashi ,  Keizo Miyata ,  Taizou Hamada

IPC: G11B023/50 ,  C23G001/00

CPC classification number: G11B5/865 ,  G11B23/505

Abstract: A cleaning method preventing foreign matter attached to a brush from being transferred back to a magnetic transfer carrier by removing foreign matter attached to a cleaning tool such as the brush with a dummy carrier having a recess equivalent to that on a surface of the magnetic transfer carrier.

Abstract translation: 通过除去附着在诸如电刷的清洁工具上的异物，可以防止附着在电刷上的异物转移回磁性转移载体的清洁方法，该虚拟载体具有与磁性转移载体表面相同的凹槽 。

公开(公告)号：US20030172955A1

公开(公告)日：2003-09-18

申请号：US10353015

申请日：2003-01-29

Inventor： Osamu Kuroda ,  Hiroki Taniyama ,  Takayuki Toshima

IPC: C23G001/00

CPC classification number: H01L21/6719 ,  H01L21/67051 ,  H01L21/68728 ,  H01L21/68792

Abstract: A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for supporting the holding members 60 and a top-face member 62 approaching the substrate W to cover its surface. In arrangement, since the top-face member 62 is supported by the chuck member 61, the holding members 60 can rotate together with the top-face member 62 in one body. With this structure, it is possible to reduce the influence of particles on the substrate W and also possible to provided a low-cost substrate processing apparatus occupied as little installation space as possible.

Abstract translation: 提供了一种用于处理基板的基板处理装置。 该装置包括用于保持基板W的保持构件60，用于支撑保持构件60的卡盘构件61和接近基板W以覆盖其表面的顶面构件62。 在这样的结构中，由于顶面构件62被卡盘构件61支撑，所以保持构件60能够与顶面构件62一体旋转。 利用这种结构，可以减小颗粒对基板W的影响，并且也可以提供尽可能少的安装空间的低成本的基板处理装置。

公开(公告)号：US20030087168A1

公开(公告)日：2003-05-08

申请号：US10328771

申请日：2002-12-23

Inventor： Matthew E. Williams

IPC: B08B006/00 ,  B08B003/12 ,  B08B003/00 ,  B08B007/00 ,  B08B001/02 ,  G03F009/00 ,  C03C023/00 ,  C23G001/00

CPC classification number: G03F1/82 ,  G03F1/64 ,  Y10S134/902

Abstract: A reticle having a pellicle frame and pellicle membrane is cleaned without removing or damaging the pellicle membrane. A cover encases the pellicle membrane and pellicle frame, sealing the pellicle from the external environment during a cleaning process. The cover fits around the periphery of the pellicle frame and covers the pellicle membrane. An edge of the cover in contact with the reticle forms a seal. The reticle is fastened to reticle supports on a spin chuck during the cleaning process. An anchor plate presses the cover to the reticle, maintaining the pellicle sealed from the external environment. The cover and reticle are sandwiched together between the anchor plate and spin chuck.