摘要:
A laser structure, including: a dielectric matrix formed of a first material; a laser source formed within the dielectric matrix and formed of a semiconductor material; and a plurality of side confining features formed within the dielectric matrix and extending parallel to and along a length of the laser source. The plurality of side confining features are formed of the semiconductor material.
摘要:
An optical device including: an optical waveguide; and a plurality of diffraction grating layers provided along the optical waveguide, wherein each of the diffraction grating layers comprises a diffraction grating, each diffraction grating comprising a discontinuous first semiconductor layer and a second semiconductor layer burying the first semiconductor layer, the first and second semiconductor layers having different refractive indices, the plurality of diffraction grating layers comprise at least two diffraction grating layers being different from each other in terms of the length of a region where the diffraction grating is provided, and the diffraction gratings in an overlap region of the plurality of diffraction grating layers have the same phase and period is provided.
摘要:
In a semiconductor laser device having a substrate and an active region, the active region includes an active layer between tensile strain optical waveguide layers. The active layer includes at least one compressive strain quantum well sublayer. When the active layer includes more than one compressive strain quantum well sublayer, the active layer further includes at least one barrier sublayer being formed between the more than one quantum well sublayer and having an identical amount of tensile strain to that of the optical waveguide layers. The absolute value of a sum of a product of the strain and the total thickness of the at least one quantum well sublayer and a product of the strain and the total thickness of the optical waveguide layers and the at least one barrier sublayer (if any) is equal to or smaller than 0.05 nm.
摘要:
A semiconductor laser device comprises a GaAs substrate, a first cladding layer having either one of p-type electrical conductivity and n-type electrical conductivity, a first optical waveguide layer, an In.sub.x2 Ga.sub.1-x2 As.sub.1-y2 P.sub.y2 first barrier layer, an In.sub.x3 Ga.sub.1-x3 As.sub.1-y3 P.sub.y3 quantum well active layer, an In.sub.x2 Ga.sub.1-x2 As.sub.1-y2 P.sub.y2 second barrier layer, a second optical waveguide layer, and a second cladding layer having the other electrical conductivity, the layers being overlaid in this order on the substrate. Each cladding layer and each optical waveguide layer have compositions, which are lattice matched with the substrate. Each of the first and second barrier layers has a tensile strain with respect to the substrate and is set such that a total layer thickness of the barrier layers may be 10 nm to 30 nm, and a product of a strain quantity of the tensile strain and the total layer thickness may be 0.05 nm to 0.2 nm. The active layer has a composition, which is lattice matched with the substrate, or a composition, which has a tensile strain of at most 0.003 with respect to the substrate.
摘要:
Optical semiconductor devices with integrated diffraction gratings with higher quality are realized through the use of Al-free grating layers. AlGaAs/GaAs regime optical semiconductor devices, such as laser diodes or optical filters, conventionally utilize an AlGaAs grating layer that has a strong affinity for oxidation. Instead of a Al-containing layer, a quantenary, InGaAsP grating layer is utilized, lattice matched to the underlying AlGaAs/GaAs structure, substantially eliminating any problem of oxide contamination. Also, an Al-free, ternary InGaP grating layer is utilized in the InGaP/InGaAsP/GaAs material regime. The quantum well active region of these devices may also be modified to extend the gain bandwidth of operation of these devices to insure continued operation over a wider temperature range with the wavelength peak of the grating in that the wavelength peak of the grating more assuredly remains within the wavelength operating range of the device.
摘要:
The gain coupled distributed feedback semiconductor laser includes an active layer and a diffraction grating which is provided in the vicinity of the active layer and has a plurality of light absorption layer periodically arranged along a resonator length direction. A relationship among energy h.nu. (h is Planck's constant, and .nu. is a frequency of induced emission light), forbidden band width E.sub.g of the light absorption layer, and energy band width .delta.E where free electrons are thermally distributed satisfies h.nu..gtoreq.E.sub.g +.delta.E.
摘要翻译:增益耦合分布反馈半导体激光器包括有源层和衍射光栅,该衍射光栅设置在有源层附近并具有沿着谐振器长度方向周期性排列的多个光吸收层。 能量h nu(h是普朗克常数,nu是感应发射光的频率),光吸收层的禁带宽度Eg和热分布自由电子的能带宽度ΔE之间的关系满足hnu> = Eg + delta E.
摘要:
After a compound semiconductor layer including InP is formed on a semiconductor substrate, a compound semiconductor layer including As is epitaxially grown by metal organic chemical vapor deposition method using an organic As as the material for feeding the As.
摘要:
A semiconductor laser comprises an active layer, optical waveguide layers formed on opposite sides of the active layer, and cladding layers. The active layer is constituted of an InGaAsP type of compound semiconductor. Each of the optical waveguide layers is constituted of an InGaAsP type of quarternary compound semiconductor, in which the content of As in the Group-V elements is at least 2%, or an InGaAlAsP type of five-element compound semiconductor, in which the content of As in the Group-V elements falls within the range of 2% to 10%. Each of the cladding layers is constituted of an InGaAsP type of quarternary compound semiconductor, in which the content of As in the Group-V elements falls within the range of 2% to 10%, or an InGaAlAsP type of five-element compound semiconductor, in which the content of As in the Group-V elements falls within the range of 2% to 10%.
摘要:
The present invention provide a laser, where the laser is divided into a laser region and a grating adjustment region through a first electrical isolation layer; the laser region is configured to generate optical signals, where the optical signals include an optical signal with a wavelength corresponding to a “0” signal and an optical signal with a wavelength corresponding to a “1” signal; the grating adjustment region is configured to adjust a wavelength of the grating adjustment region by controlling current of the grating adjustment region, so that the optical signal with the wavelength corresponding to the “1” signal of the laser region passes through the grating adjustment region, and the optical signal with the wavelength corresponding to the “0” signal of the laser region returns to the laser region, thereby implementing suppression to chirp of a directly modulated laser.
摘要:
A semiconductor optical amplifier includes an n-type semiconductor layer, a p-type semiconductor layer an active layer provided between the n-type semiconductor layer and the p-type semiconductor layer, the active layer transmitting an optical signal and a current-injection part that injects current into the active layer via the n-type semiconductor layer and the p-type semiconductor layer, the active layer including a first active layer that includes AlGaInAs, and a second active layer that includes GaInAsP, the second active layer provided closer to an output side than the first active layer, and the first active layer and the second active layer being butt-jointed.