CHARACTERIZATION STRUCTURE FOR AN ATOMIC FORCE MICROSCOPE TIP
    3.
    发明申请
    CHARACTERIZATION STRUCTURE FOR AN ATOMIC FORCE MICROSCOPE TIP 有权
    原子力显微镜提示的特征结构

    公开(公告)号:US20130291236A1

    公开(公告)日:2013-10-31

    申请号:US13869430

    申请日:2013-04-24

    IPC分类号: G01Q70/08

    摘要: A structure for the characterization of a tip of an atomic force microscope, the structure being produced on a substrate and including a first support element located above the substrate; a first characterization element with a constant thickness, the first characterization element being located above the first support element and having an upper flat surface and a lower flat surface covering the upper surface of the first support element with two zones extending beyond the upper surface of the first support element, each zone having a characterization surface at one end which is capable of coming into contact with a tip to be characterized, the upper surface and the lower surface of said first characterization element being parallel to the upper surface of the substrate.

    摘要翻译: 一种用于表征原子力显微镜的尖端的结构,所述结构在基底上产生并且包括位于所述基底上方的第一支撑元件; 具有恒定厚度的第一表征元件,第一表征元件位于第一支撑元件上方,并且具有覆盖第一支撑元件的上表面的上平坦表面和下平坦表面,其中两个区域延伸超过第一支撑元件的上表面 第一支撑元件,每个区域在一端具有能够与待表征的尖端接触的表征表面,所述第一表征元件的上表面和下表面平行于基底的上表面。

    Cleaning Station for Atomic Force Microscope
    4.
    发明申请
    Cleaning Station for Atomic Force Microscope 失效
    原子力显微镜清洗站

    公开(公告)号:US20120297510A1

    公开(公告)日:2012-11-22

    申请号:US13458725

    申请日:2012-04-27

    IPC分类号: G01Q90/00

    CPC分类号: G01Q90/00 G01Q70/00

    摘要: A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached.

    摘要翻译: 公开了一种清洁站,用于在支撑在流体介质中的样品成像期间彻底清洁暴露于流体的AFM组件表面。 清洁站被设计成将AFM组件表面选择性地暴露于清洁剂,例如肥皂/洗涤剂和水,等离子体清洁等,以及清洁工具,例如刷子,同时保护流体敏感组分免于暴露于清洁剂。 优选实施例对于其中流体敏感部件(致动器,传感器,连接器等)集成在悬臂支架附接到的相同装置中的扫描器是特别有益的。

    Multiscale spectral nanoscopy
    7.
    发明授权
    Multiscale spectral nanoscopy 有权
    多尺度光谱纳米镜

    公开(公告)号:US09494518B2

    公开(公告)日:2016-11-15

    申请号:US14415779

    申请日:2013-07-18

    摘要: A system and method for non-invasively tracking a particle in a sample is disclosed. The system includes a 2-photon or confocal laser scanning microscope (LSM) and a particle-holding device coupled to a stage with X-Y and Z position control. The system also includes a tracking module having a tracking excitation laser, X-Y and Z radiation-gathering components configured to detect deviations of the particle in an X-Y and Z directions. The system also includes a processor coupled to the X-Y and Z radiation gathering components, generate control signals configured to drive the stage X-Y and Z position controls to track the movement of the particle. The system may also include a synchronization module configured to generate LSM pixels stamped with stage position and a processing module configured to generate a 3D image showing the 3D trajectory of a particle using the LSM pixels stamped with stage position.

    摘要翻译: 公开了一种用于非侵入性跟踪样品中的颗粒的系统和方法。 该系统包括双光子或共聚焦激光扫描显微镜(LSM)和一个与X-Y和Z位置控制的平台耦合的颗粒保持装置。 该系统还包括跟踪模块,该跟踪模块具有跟踪激发激光器,X-Y和Z辐射收集部件,被配置为检测X-Y和Z方向上的粒子的偏差。 该系统还包括耦合到X-Y和Z辐射收集部件的处理器,产生控制信号,该控制信号被配置成驱动载物台X-Y和Z位置控制以跟踪颗粒的移动。 该系统还可以包括配置成生成标有阶段位置的LSM像素的同步模块,以及处理模块,该处理模块被配置为使用标记有阶段位置的LSM像素来生成显示粒子的3D轨迹的3D图像。