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公开(公告)号：US11905590B2
公开(公告)日：2024-02-20
申请号：US17334248
申请日：2021-05-28
申请人： eMagin Corporation
发明人： Evan P. Donoghue , Fridrich Vazan , Kerry Tice , Ilyas I. Khayrullin , Tariq Ali , Qi Wang , Laurie Sziklas , Amalkumar P. Ghosh
CPC分类号： C23C14/34 , C23C14/042 , C23C14/048 , C23C14/542 , H10K71/00 , H10K71/166
摘要： The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
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公开(公告)号：US11313033B2
公开(公告)日：2022-04-26
申请号：US17022868
申请日：2020-09-16
申请人： eMagin Corporation
发明人： Tariq Ali , Ilyas I. Khayrullin , Amalkumar P. Ghosh , Evan P. Donoghue , Qi Wang , Fridrich Vazan , Kerry Tice , Laurie Sziklas
摘要： A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor pressure value generated by heating the crucibles to at least the corresponding material evaporation temperature.
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公开(公告)号：US11149340B2
公开(公告)日：2021-10-19
申请号：US15881485
申请日：2018-01-26
申请人： eMagin Corporation
发明人： Ilyas I. Khayrullin , Amalkumar P. Ghosh , Ihor Wacyk , Evan Donoghue , Tariq Ali , Qi Wang , Kerry Tice
摘要： In a method for designing and fabricating a micro-lens array, a design is finalized by varying certain features of a shadow mask, varying a distance between a source of lens-forming material and the shadow mask, and varying other parameters until the features and distances result in the formation of a micro-lens having desired shape, etc. A shadow mask in accordance with the design is then fabricated and is appropriately positioned with respect to a micro-display and a source of lens-forming material. A plume of lens-forming material is then generated under reduced pressure and which propagates toward the shadow mask, directly patterning the micro-lenses on sub-pixels of the micro-display.
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公开(公告)号：US10072328B2
公开(公告)日：2018-09-11
申请号：US15597635
申请日：2017-05-17
申请人： eMagin Corporation
发明人： Amalkumar P. Ghosh , Fridrich Vazan , Munisamy Anandan , Evan Donoghue , Ilyas I. Khayrullin , Tariq Ali , Kerry Tice
CPC分类号： C23C14/042 , C23C14/24 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： A direct-deposition system capable of forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through an aperture pattern of a shadow mask to deposit on the substrate in the desired pattern. Prior to reaching the shadow mask, the vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. As a result, the vaporized atoms that pass through the shadow mask exhibit little or no lateral spread (i.e., feathering) after passing through its apertures and the material deposits on the substrate in a pattern that has very high fidelity with the aperture pattern of the shadow mask. The present invention, therefore, mitigates the need for relatively large space between regions of deposited material normally required in the prior art, thereby enabling high-resolution patterning.
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公开(公告)号：US10522794B2
公开(公告)日：2019-12-31
申请号：US16178441
申请日：2018-11-01
申请人： eMagin Corporation
发明人： Ilyas I. Khayrullin , Evan P. Donoghue , Kerry Tice , Tariq Ali , Qi Wang , Fridrich Vazan , Amalkumar P. Ghosh
摘要： A method of active alignment of a shadow mask to a substrate includes a first alignment by moving the shadow mask and the substrate a first distance in a vertical direction, capturing a first alignment image, determining at least one of a first correction distance and a first rotational correction angle, and aligning the shadow mask and the substrate by moving the first correction distance and rotating the first rotational correction angle. The method further includes performing a first material deposition process on the substrate and continuously capturing a first series of alignment images during the generation of the first material deposition flow. During the generation of the first material deposition flow the first series of alignment images are analyzed to determine a second correction distance and a second rotational correction angle and determining whether second distance and/or rotational correction angle is greater than or equal to a predetermined value to cause a second alignment process to occur.
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公开(公告)号：US11758751B2
公开(公告)日：2023-09-12
申请号：US17347118
申请日：2021-06-14
申请人： eMagin Corporation
IPC分类号： H01L21/00 , H10K50/805 , H10K59/121
CPC分类号： H10K50/805 , H10K59/121
摘要： Aspects of the present disclosure describe systems, methods, and structures that provide organic light-emitting diodes having high luminous efficiency and low electrical dissipation. Embodiments in accordance with the present disclosure include a top electrode normally comprising a single film that includes a pair of metals and one metal compound, where the metals include a precious metal in combination with an alkaline earth metal or rare-earth metal and the metal compound is an alkali metal compound. As a result, such a top electrode has a work function that is better matched for efficient electron injection than magnesium-silver alloy-based transparent electrodes known in the prior art.
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公开(公告)号：US11152573B2
公开(公告)日：2021-10-19
申请号：US15968325
申请日：2018-05-01
申请人： eMagin Corporation
发明人： Fridrich Vazan , Evan P. Donoghue , Ilyas I. Khayrullin , Tariq Ali , Kerry Tice , Amalkumar P. Ghosh
摘要： A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.
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公开(公告)号：US11275315B2
公开(公告)日：2022-03-15
申请号：US15655544
申请日：2017-07-20
申请人： eMagin Corporation
发明人： Amalkumar P. Ghosh , Fridrich Vazan , Munisamy Anandan , Evan Donoghue , Ilyas I. Khayrullin , Tariq Ali , Kerry Tice
摘要： A direct-deposition system forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. Prior to reaching the shadow mask, vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. Vaporized atoms that pass through the shadow mask exhibit little or no lateral spread after passing through through-holes and the material deposits on the substrate in a pattern that has very high fidelity with the through-hole pattern of the shadow mask.
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公开(公告)号：US11121321B2
公开(公告)日：2021-09-14
申请号：US16178388
申请日：2018-11-01
申请人： eMagin Corporation
发明人： Evan P. Donoghue , Ilyas I. Khayrullin , Kerry Tice , Tariq Ali , Qi Wang , Fridrich Vazan , Amalkumar P. Ghosh
摘要： Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.
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公开(公告)号：US11035033B2
公开(公告)日：2021-06-15
申请号：US16169678
申请日：2018-10-24
申请人： eMagin Corporation
发明人： Evan P. Donoghue , Fridrich Vazan , Kerry Tice , Ilyas I. Khayrullin , Tariq Ali , Qi Wang , Laurie Sziklas , Amalkumar P. Ghosh
摘要： The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
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