公开(公告)号：US20150188031A1

公开(公告)日：2015-07-02

申请号：US14578907

申请日：2014-12-22

Applicant: YOUTEC CO., LTD.

Inventor： Takeshi KIJIMA ,  Yuuji HONDA ,  Takekazu SHIGENAI ,  Hiroyuki OGIHARA

IPC: H01L41/253 ,  G01R29/22 ,  H05B3/00 ,  H01L41/187 ,  H01L41/22 ,  H01L39/24

CPC classification number: G01R29/22 ,  H01L41/257 ,  H01L41/318 ,  H05B3/0038

Abstract: A thermal poling method in which a poling treatment can be performed easily by a dry process. The poling treatment is performed on a PZT film by performing a heat treatment on the PZT film under a pressurized oxygen atmosphere at a temperature of 400° C. or more and 900° C. or less. The PZT film before the heat treatment has a single-domain crystal structure, and the PZT film after the heat treatment has a multi-domain crystal structure.

Abstract translation: 可以通过干法方便地进行极化处理的热极化方法。 通过在加压氧气氛下在400℃以上且900℃以下的温度下对PZT膜进行热处理，在PZT膜上进行极化处理。 热处理前的PZT膜具有单畴晶体结构，热处理后的PZT膜具有多畴晶体结构。

公开(公告)号：US20180143232A1

公开(公告)日：2018-05-24

申请号：US15873094

申请日：2018-01-17

Applicant: YOUTEC CO., LTD.

Inventor： Takeshi KIJIMA ,  Yuuji HONDA ,  Takekazu SHIGENAI ,  Hiroyuki OGIHARA

IPC: G01R29/22 ,  H01L41/318 ,  H05B3/00 ,  H01L41/257

CPC classification number: G01R29/22 ,  H01L41/257 ,  H01L41/318 ,  H05B3/0038

Abstract: A thermal poling method in which a poling treatment can be performed easily by a dry process. The poling treatment is performed on a PZT film by performing a heat treatment on the PZT film under a pressurized oxygen atmosphere at a temperature of 400° C. or more and 900° C. or less. The PZT film before the heat treatment has a single-domain crystal structure, and the PZT film after the heat treatment has a multi-domain crystal structure.