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公开(公告)号:US09728403B2
公开(公告)日:2017-08-08
申请号:US14787773
申请日:2015-10-13
Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd. , Wuhan China Star Optoelectronics Technology Co., Ltd.
Inventor: Chao He , Guoqiang Tang , Yuan Guo , Juan Li , Yuxia Chen
CPC classification number: H01L21/0242 , G02F1/1333 , G02F1/1362 , G02F2001/13685 , G09G3/2092 , G09G3/3611 , G09G3/3629 , G09G2300/0417 , G09G2300/0495 , H01L21/02576 , H01L21/77 , H01L27/12
Abstract: The present invention provides an array substrate and a manufacturing method thereof. The manufacturing method of the array substrate according to the present invention forms a gate electrode in the same metal layer with source and drain electrodes and divides a common electrode layer that is conventionally in the form of an entire surface into two portions, of which one serves as a common electrode, while the other portion feeds an input of a gate scan signal thereby eliminating an operation of forming an interlayer insulation layer and thus reducing manufacturing cost of the operation. The array substrate of the present invention comprises a gate electrode that is formed in the same metal layer with source and drain electrodes so that no interlayer insulation layer is present between the gate electrode and the source and drain electrodes, thereby simplifying the structure and reducing the manufacturing cost of the array substrate.
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公开(公告)号:US20170200600A1
公开(公告)日:2017-07-13
申请号:US14787773
申请日:2015-10-13
Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd. , Wuhan China Star Optoelectronics Technology Co., Ltd.
Inventor: Chao He , Guoqiang Tang , Yuan Guo , Juan Li , Yuxia Chen
CPC classification number: H01L21/0242 , G02F1/1333 , G02F1/1362 , G02F2001/13685 , G09G3/2092 , G09G3/3611 , G09G3/3629 , G09G2300/0417 , G09G2300/0495 , H01L21/02576 , H01L21/77 , H01L27/12
Abstract: The present invention provides an array substrate and a manufacturing method thereof. The manufacturing method of the array substrate according to the present invention forms a gate electrode in the same metal layer with source and drain electrodes and divides a common electrode layer that is conventionally in the form of an entire surface into two portions, of which one serves as a common electrode, while the other portion feeds an input of a gate scan signal thereby eliminating an operation of forming an interlayer insulation layer and thus reducing manufacturing cost of the operation. The array substrate of the present invention comprises a gate electrode that is formed in the same metal layer with source and drain electrodes so that no interlayer insulation layer is present between the gate electrode and the source and drain electrodes, thereby simplifying the structure and reducing the manufacturing cost of the array substrate.
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公开(公告)号:US09671646B1
公开(公告)日:2017-06-06
申请号:US15166273
申请日:2016-05-27
Inventor: Guoqiang Tang
IPC: H01L33/00 , G02F1/1335 , H01L27/12 , G02F1/1362 , H01L29/66 , G02F1/1368 , G02F1/1333 , G02F1/1339 , G02F1/1341
CPC classification number: G02F1/133621 , G02F1/133345 , G02F1/133512 , G02F1/133514 , G02F1/133516 , G02F1/13394 , G02F1/1341 , G02F1/134363 , G02F1/136209 , G02F1/1368 , G02F2001/133357 , G02F2001/133562 , G02F2001/133614 , G02F2001/134372 , G02F2001/13685 , G02F2201/086 , G02F2202/02 , G02F2202/36 , G02F2203/05 , G02F2203/055 , H01L27/1222 , H01L27/1248 , H01L27/127 , H01L29/66757 , H01L29/78621 , H01L29/78633
Abstract: A method for manufacturing an eye-protecting liquid crystal display device is disclosed, in which an ultraviolet light emitting material and a ultraviolet absorbent are added in a first planarization layer of an array substrate and a second planarization layer of a color filter substrate. The ultraviolet absorbent absorbs short-wavelength blue light having a wavelength less than 400 nm and ultraviolet light emitting from a backlight module. The short-wavelength blue light and the ultraviolet light so absorbed excite the ultraviolet light emitting material to give off long-wavelength visible blue light having a wavelength greater than 400 nm. The first and second planarization layers are thus useful in converting ultraviolet light and short-wavelength blue light having a wavelength less than 400 nm, which could damage human eyes, into long-wavelength visible blue light having a wavelength greater than 400 nm that does not damage human eyes.
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