公开(公告)号：US20170348727A1

公开(公告)日：2017-12-07

申请号：US15537545

申请日：2015-12-14

Applicant: UNIVERSITÄT ULM

Inventor： Steffen STREHLE ,  Daniel Markus ROSSKOPF ,  Andreas Magnus PROBST

IPC: B05D1/28 ,  H05K3/12 ,  B81C1/00 ,  H05K1/03 ,  H05K1/09

CPC classification number: B05D1/28 ,  B81C1/00373 ,  B81C2201/0185 ,  B81C2201/0187 ,  B82B3/0066 ,  H05K1/0306 ,  H05K1/09 ,  H05K3/102 ,  H05K3/1275 ,  H05K2201/026 ,  H05K2201/09036 ,  H05K2201/09045 ,  H05K2203/0108 ,  H05K2203/0271 ,  H05K2203/0528

Abstract: The invention relates to a method for producing a substrate structured by nanowires, characterized in that no lubricant and no lithographic resist mask is used in the method, and only by moving a donor substrate having nanowires relative to a substrate and by locally tribological properties on the surface of the substrate, a specified number of nanowires is deposited selectively at locally defined points of the substrate. The invention further relates to a substrate that can be produced using the method according to the invention, and which selectively contains a specified number of nanowires on a surface at locally defined points. The invention further relates to the use of the substrate according to the invention in microelectronics, microsystems technology, and/or micro-sensor systems.