公开(公告)号：US06500971B2

公开(公告)日：2002-12-31

申请号：US09873193

申请日：2001-06-05

申请人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D30316

CPC分类号： C08G65/22 ,  C07D303/48 ,  G03F7/0395

摘要： An ester compound of formula (1) is provided. R1 is H or methyl, R2 is tertiary C4-20 alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.

摘要翻译： 提供式（1）的酯化合物.R1是H或甲基，R2是叔C4-20烷基，k = 0或1.包含作为基础树脂的抗蚀剂组合物由酯化合物产生的聚合物敏感 高能量辐射，具有优异的灵敏度，分辨率，耐蚀刻性和基板粘合性，适用于使用电子束或深紫外线的微图案。

公开(公告)号：US06492090B2

公开(公告)日：2002-12-10

申请号：US09842113

申请日：2001-04-26

申请人： Tsunehiro Nishi ,  Seiichiro Tachibana ,  Mutsuo Nakashima ,  Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Seiichiro Tachibana ,  Mutsuo Nakashima ,  Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Jun Hatakeyama

IPC分类号： G03F7038

CPC分类号： G03F7/039 ,  C08F222/06 ,  C08F222/40 ,  C08F232/08 ,  G03F7/0045 ,  C08F2220/1866 ,  C08F232/04 ,  C08F234/04 ,  C08F232/00

摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 is alkyl or aryl, Y is a divalent hydrocarbon group which may contain a hetero atom and which forms a ring with the carbon atom, Z is a trivalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.

摘要翻译： 提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R1是H，CH3或CH2CO2R3，R2是H，CH3或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基，R5是烷基或芳基，Y是可以含有杂原子的二价烃基， 与碳原子形成环，Z为三价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

公开(公告)号：US06448420B1

公开(公告)日：2002-09-10

申请号：US09572975

申请日：2000-05-18

申请人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Takeru Watanabe ,  Koji Hasegawa ,  Mutsuo Nakashima ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Takeru Watanabe ,  Koji Hasegawa ,  Mutsuo Nakashima ,  Jun Hatakeyama

IPC分类号： C07J900

CPC分类号： C07C69/753 ,  C07C69/013 ,  C07C2602/42 ,  C07C2603/68 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/039

摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.

摘要翻译： 使用具有外型2-烷基双环[2.2.1]庚-2-基酯作为酸可分解部位的新型酯化合物作为溶解调节剂，以配制具有高灵敏度，分辨率，耐蚀刻性和 储存稳定性。

公开(公告)号：US06312867B1

公开(公告)日：2001-11-06

申请号：US09431139

申请日：1999-11-01

申请人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Hideshi Kurihara ,  Koji Hasegawa ,  Takeru Watanabe ,  Osamu Watanabe ,  Mutsuo Nakashima ,  Takanobu Takeda ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Hideshi Kurihara ,  Koji Hasegawa ,  Takeru Watanabe ,  Osamu Watanabe ,  Mutsuo Nakashima ,  Takanobu Takeda ,  Jun Hatakeyama

IPC分类号： G03F7004

CPC分类号： C07C69/56 ,  C07C69/013 ,  C07C69/533 ,  C07C69/54 ,  C07C69/593 ,  C07C69/60 ,  C07C2602/42 ,  C07C2603/68 ,  C07C2603/86 ,  C08F20/18 ,  G03F7/0045 ,  G03F7/039 ,  Y02P20/55

摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

公开(公告)号：US06743566B2

公开(公告)日：2004-06-01

申请号：US10219139

申请日：2002-08-16

申请人： Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： G03C500

CPC分类号： C07D317/24 ,  C08F232/08 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

摘要翻译： 其中k = 0或1，n为0至6的整数的式（1）的环状缩醛化合物是新颖的。 使用环状缩醛化合物作为单体，得到聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且具有优异的灵敏度，分辨率和耐蚀刻性。

公开(公告)号：US06673515B2

公开(公告)日：2004-01-06

申请号：US09951523

申请日：2001-09-14

申请人： Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

IPC分类号： G03F7038

CPC分类号： G03F7/039 ,  C08G61/08 ,  G03F7/0045

摘要： The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.

摘要翻译： 本发明提供了包含式（1-1）或（1-2）的重复单元的聚合物，其中k为0或1，m为0,1,2,3或4，n为1或2，并且具有重量 平均分子量为1,000〜500,000。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

公开(公告)号：US06566038B2

公开(公告)日：2003-05-20

申请号：US09842396

申请日：2001-04-26

申请人： Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

IPC分类号： G03F7039

CPC分类号： C08F222/06 ,  C08F222/40 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111 ,  C08F232/04 ,  C08F2220/1866 ,  C08F232/00

摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is halogen or acyloxy, alkoxycarbonyloxy or alkylsulfonyloxy group which may be substituted with halogen, R5 is H or alkyl, R6 is an acid labile group, Z is a single bond or a divalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.

摘要翻译： 提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R 1为H，CH 3或CH 2 CO 2 R 3，R 2为H，CH 3或CO 2 R 3，R 3为烷基，R 4为卤素或酰氧基，可被卤素取代的烷氧基羰氧基或烷基磺酰氧基，R 5为H或烷基，R 6为酸不稳定基团， Z为单键或二价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

公开(公告)号：US06515150B2

公开(公告)日：2003-02-04

申请号：US09967946

申请日：2001-10-02

申请人： Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： C07D31726

CPC分类号： C07D317/24 ,  C08F232/08 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

公开(公告)号：US06515149B2

公开(公告)日：2003-02-04

申请号：US09922635

申请日：2001-08-07

申请人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D31712

CPC分类号： C08G61/08 ,  C08G61/02 ,  Y10S430/106 ,  Y10S430/111

摘要： Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

公开(公告)号：US06284429B1

公开(公告)日：2001-09-04

申请号：US09512108

申请日：2000-02-24

申请人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Hideshi Kurihara ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

发明人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Hideshi Kurihara ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  C07C69/753 ,  C07C2602/42 ,  C07C2603/68 ,  C08F32/08 ,  G03F7/0045 ,  Y02P20/55

摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

摘要翻译： 提供具有外型2-烷基双环[2.2.1]庚-2-基作为保护基的新型酯化合物以及包含酯化合物单元的聚合物。 聚合物用作基础树脂以配制具有比常规抗蚀剂组合物更高的灵敏度，分辨率和耐蚀刻性的抗蚀剂组合物。