Invention Grant
US06500971B2 Ester compounds having alicyclic and oxirane structures and method for preparing the same 有权
具有脂环和环氧乙烷结构的酯化合物及其制备方法

Ester compounds having alicyclic and oxirane structures and method for preparing the same
Abstract:
An ester compound of formula (1) is provided. R1 is H or methyl, R2 is tertiary C4-20 alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.
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