公开(公告)号：US10297481B2

公开(公告)日：2019-05-21

申请号：US14211360

申请日：2014-03-14

申请人： Tokyo Electron Limited

发明人： Yuji Ono ,  Toru Ishii ,  Makoto Saito ,  Mitsuru Obara ,  Yasushi Takeuchi

IPC分类号： H05B6/10 ,  H01L21/677 ,  G11C11/16

摘要： A magnetic annealing apparatus is provided which performs a magnetic annealing on workpieces held in a workpiece boat by using a horizontal superconducting magnet as a magnetic field generating unit. The magnetic annealing apparatus includes a carrier configured to accommodate the workpieces before the magnetic annealing process; and a workpiece conveyance mechanism configured to convey the workpieces held in the carrier to the workpiece boat. The workpiece conveyance mechanism is capable of holding the workpieces in either a horizontal state or in a vertical state.

公开(公告)号：US09406537B2

公开(公告)日：2016-08-02

申请号：US14017654

申请日：2013-09-04

申请人： Tokyo Electron Limited

发明人： Katsuhiko Oyama ,  Yasushi Takeuchi

IPC分类号： H01L21/673 ,  H01L21/677

CPC分类号： H01L21/67373 ,  H01L21/67389 ,  H01L21/67772

摘要： Provided is a cover opening/closing apparatus which includes: a wafer conveyance port having an opening edge and configured to be opened/closed by an opening/closing door; and a cover removal apparatus installed on the opening/closing door and configured to remove a cover of a FOUP which is formed with a substrate outlet having a opening edge. When the cover removal apparatus removes the cover of the FOUP, the opening edge of the substrate outlet is closely contacted with the opening edge of the wafer conveyance port. The cover removal apparatus includes: a latch key which is engaged with the cover of the FOUP, a driving unit configured to drive the latch key, and an accommodation unit configured to accommodate the driving unit. The cover opening/closing apparatus further includes an exhaust system configured to exhaust a space within the accommodation unit.

摘要翻译： 本发明提供一种盖开闭装置，其特征在于，包括：具有开口边缘的晶片输送口，其构造成由开闭门打开/关闭; 以及安装在所述打开/关闭门上并构造成移除形成有具有开口边缘的基板出口的FOUP的盖的盖拆除装置。 当盖拆卸装置移除FOUP的盖时，基板出口的开口边缘与晶片输送口的开口边缘紧密接触。 盖拆除装置包括：与FOUP的盖接合的闩锁键，构造成驱动闩锁键的驱动单元和构造成容纳驱动单元的容纳单元。 盖打开/关闭装置还包括排气系统，该排气系统构造成排出容纳单元内的空间。

公开(公告)号：US10549305B2

公开(公告)日：2020-02-04

申请号：US15685375

申请日：2017-08-24

申请人： TOKYO ELECTRON LIMITED

发明人： Yuya Sasaki ,  Kiichi Takahashi ,  Yasushi Takeuchi

IPC分类号： B05B15/60 ,  B05B15/62 ,  C23C16/455 ,  B05B1/20 ,  B05B1/00

摘要： A support structure for a suspended injector includes a suspended injector having a tubular vertical portion extending in a vertical direction, one or more chamfered portions formed by chamfering an outer peripheral surface near an upper end of the tubular vertical portion, a pair of holding members each having a flat surface formed on an inner peripheral surface of each of the pair of holding members to engage with each of the chamfered portions, each of the pair of holding members holding the tubular vertical portion of the suspended injector by sandwiching the tubular vertical portion of the suspended injector from both sides each of the pair of holding members, and a support structure part configured to fixedly support the pair of holding members, and configured to suspend and support the suspended injector.

公开(公告)号：US09508914B2

公开(公告)日：2016-11-29

申请号：US14211619

申请日：2014-03-14

申请人： Tokyo Electron Limited

发明人： Yuji Ono ,  Toru Ishii ,  Makoto Saito ,  Mitsuru Obara ,  Yasushi Takeuchi

IPC分类号： F27D3/12 ,  H01L39/02 ,  H01L43/12 ,  F27B5/06 ,  F27B5/12 ,  F27B5/13 ,  F27D3/00 ,  F27D11/12 ,  F27D19/00 ,  C21D1/04

CPC分类号： H01L39/02 ,  C21D1/04 ,  C21D2281/00 ,  F27B5/06 ,  F27B5/12 ,  F27B5/13 ,  F27D3/0024 ,  F27D3/0084 ,  F27D11/12 ,  F27D19/00 ,  F27D2003/0003 ,  F27D2003/0018 ,  G11C11/16 ,  H01L43/12

摘要： Disclosed is a magnetic annealing apparatus including a carrier conveyance region and a workpiece conveyance region. The carrier conveyance region includes: a first mounting table where a carrier is disposed; second mounting tables where carriers convey workpieces from the carrier conveyance region to the workpiece conveyance region; a storage unit; and a carrier conveyance mechanism that performs carrying-out/carrying-in of the carriers. The workpiece conveyance region includes: an aligner device; a workpiece boat; a workpiece conveyance mechanism that conveys the workpieces from the carriers disposed on the second mounting tables to the workpiece boat via the aligner device; a heating unit; a magnetic field generating unit; and a transfer mechanism that transfers the workpieces held by the workpiece boat into the magnetic field generating unit.

摘要翻译： 公开了一种包括载体输送区域和工件输送区域的磁性退火装置。 载体输送区域包括：载置体设置的第一安装台; 第二安装台，其中载体将工件从载体输送区域传送到工件输送区域; 存储单元; 以及承载运送机构，其执行承载物的搬运。 工件输送区域包括：对准器装置; 工件船 工件传送机构，其通过对准装置将来自设置在第二安装台上的载体的工件传送到工件舟皿; 加热单元 磁场产生单元; 以及将由工件舟皿保持的工件传送到磁场产生单元的传送机构。

公开(公告)号：US20140287926A1

公开(公告)日：2014-09-25

申请号：US14211619

申请日：2014-03-14

申请人： TOKYO ELECTRON LIMITED

发明人： Yuji Ono ,  Toru Ishii ,  Makoto Saito ,  Mitsuru Obara ,  Yasushi Takeuchi

IPC分类号： F27D3/12 ,  H01L39/02

CPC分类号： H01L39/02 ,  C21D1/04 ,  C21D2281/00 ,  F27B5/06 ,  F27B5/12 ,  F27B5/13 ,  F27D3/0024 ,  F27D3/0084 ,  F27D11/12 ,  F27D19/00 ,  F27D2003/0003 ,  F27D2003/0018 ,  G11C11/16 ,  H01L43/12

摘要： Disclosed is a magnetic annealing apparatus including a carrier conveyance region and a workpiece conveyance region. The carrier conveyance region includes: a first mounting table where a carrier is disposed; second mounting tables where carriers are disposed to convey workpieces from the carrier conveyance region to the workpiece conveyance region; a storage unit that stores carriers; and a carrier conveyance mechanism that performs carrying-out/carrying-in of the carriers. The workpiece conveyance region includes: an aligner device that aligns workpieces; a workpiece boat that holds plural groups of workpieces; a workpiece conveyance mechanism that conveys the workpieces from the carriers disposed on the second mounting tables to the workpiece boat via the aligner device; a heating unit that heats the workpieces; a magnetic field generating unit that applies a magnetic field to the workpieces; and a transfer mechanism that transfers the workpieces held by the workpiece boat into the magnetic field generating unit.

摘要翻译： 公开了一种包括载体输送区域和工件输送区域的磁性退火装置。 载体输送区域包括：载置体设置的第一安装台; 第二安装台，其中载体被设置成将工件从载体输送区域传送到工件输送区域; 存储载体的存储单元; 以及承载运送机构，其执行承载物的搬运。 工件传送区域包括：对准工件的对准器装置; 保持多组工件的工件舟; 工件传送机构，其通过对准装置将来自设置在第二安装台上的载体的工件传送到工件舟皿; 加热单元，加热工件; 向工件施加磁场的磁场产生单元; 以及将由工件舟皿保持的工件传送到磁场产生单元的传送机构。

公开(公告)号：US10428425B2

公开(公告)日：2019-10-01

申请号：US15413600

申请日：2017-01-24

申请人： Tokyo Electron Limited

发明人： Katsuhiko Oyama ,  Kiichi Takahashi ,  Yasushi Takeuchi ,  Katsuyoshi Aikawa

IPC分类号： C23C16/40 ,  B23B31/11 ,  G06K5/00 ,  B25B13/46 ,  B25B27/00 ,  C23C16/458 ,  C23C16/455

摘要： A film deposition apparatus for sequentially supplying reaction gases, which mutually react, into a chamber to deposit a film on a substrate includes a turntable rotatable and including a concave portion on an upper surface, a bottom portion of the concave portion having a through hole, a substrate supporting member attachable to and detachable from the concave portion, an upper surface of the substrate supporting member mounting the substrate, a lower surface of the substrate supporting member having a first protruding portion, a drive mechanism moving up and down the turntable and revolving the turntable, a lid member located lower than the turntable, an upper surface of the lid member having a second protruding portion, and a control unit revolving the turntable to cause the first protruding portion to contact the second protruding portion and cause the substrate supporting member to be spun a predetermined angle relative to the turntable.

公开(公告)号：US10096504B2

公开(公告)日：2018-10-09

申请号：US14247371

申请日：2014-04-08

申请人： Tokyo Electron Limited

发明人： Katsuhiko Oyama ,  Yasushi Takeuchi ,  Shinji Asari

IPC分类号： H01L21/677 ,  H01L21/673

摘要： A method for managing an atmosphere in a storage container in a processing apparatus including a substrate transfer region and a container transfer region which are partitioned by a partition wall; a load port; a container keeping rack; and a cover opening/closing mechanism, includes substituting the internal atmosphere of the storage container that stores non-processed substrates with the inert gas for using the cover opening/closing mechanism; transferring the storage container of which the internal atmosphere has been substituted with the inert gas, to the container keeping rack and placing and keeping the storage container on the container keeping rack; and putting the storage container on standby on the container keeping rack while maintaining the atmosphere substituted with the inert gas.

公开(公告)号：US09679794B2

公开(公告)日：2017-06-13

申请号：US14025899

申请日：2013-09-13

申请人： TOKYO ELECTRON LIMITED

发明人： Katsuhiko Oyama ,  Yasushi Takeuchi

IPC分类号： H01L21/68 ,  H01L21/677 ,  H01L21/673

CPC分类号： H01L21/677 ,  H01L21/67346 ,  H01L21/68

摘要： According to an embodiment of present disclosure, a spacer is provided. The spacer includes at least a protrusion formed to protrude from an outer periphery of the spacer. The protrusion serves to locate the spacer in place in a transfer mechanism configured to transfer the spacer when the spacer is fixed by the transfer mechanism in such a way that the protrusion comes in contact with the transfer mechanism, and configured to allow the spacer to rotate or move in case the spacer is deviated from a predetermined transfer position when the spacer is engaged with the transfer mechanism.

公开(公告)号：US20140064885A1

公开(公告)日：2014-03-06

申请号：US14017654

申请日：2013-09-04

申请人： Tokyo Electron Limited

发明人： Katsuhiko Oyama ,  Yasushi Takeuchi

IPC分类号： H01L21/673

CPC分类号： H01L21/67373 ,  H01L21/67389 ,  H01L21/67772

摘要： Provided is a cover opening/closing apparatus which includes: a wafer conveyance port having an opening edge and configured to be opened/closed by an opening/closing door; and a cover removal apparatus installed on the opening/closing door and configured to remove a cover of a FOUP which is formed with a substrate outlet having a opening edge. When the cover removal apparatus removes the cover of the FOUP, the opening edge of the substrate outlet is closely contacted with the opening edge of the wafer conveyance port. The cover removal apparatus includes: a latch key which is engaged with the cover of the FOUP, a driving unit configured to drive the latch key, and an accommodation unit configured to accommodate the driving unit. The cover opening/closing apparatus further includes an exhaust system configured to exhaust a space within the accommodation unit.

摘要翻译： 本发明提供一种盖开闭装置，其特征在于，包括：具有开口边缘的晶片输送口，其构造成由开闭门打开/关闭; 以及安装在所述打开/关闭门上并构造成移除形成有具有开口边缘的基板出口的FOUP的盖的盖拆除装置。 当盖拆卸装置移除FOUP的盖时，基板出口的开口边缘与晶片输送口的开口边缘紧密接触。 盖拆除装置包括：与FOUP的盖接合的闩锁键，构造成驱动闩锁键的驱动单元和构造成容纳驱动单元的容纳单元。 盖打开/关闭装置还包括排气系统，该排气系统构造成排出容纳单元内的空间。

公开(公告)号：US09064916B2

公开(公告)日：2015-06-23

申请号：US14250131

申请日：2014-04-10

申请人： TOKYO ELECTRON LIMITED

发明人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

IPC分类号： H01L21/673 ,  C21D9/00 ,  C23C16/56 ,  H01L21/67

CPC分类号： H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

摘要： A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other.

摘要翻译： 衬底保持器具有两个保持器构成体，每个保持器构造体具有布置在假想圆上的多个列，以及保持各个衬底周向部分的衬底保持部。 保持器构成体保持基板，使得它们的前表面或其背面朝向上方具有面向上的基板和具有面向上的后部的基板沿垂直方向交替布置。 保持构造体中的至少一个沿垂直方向移动，以改变保持器构成体相对于彼此的位置。 设置第一对垂直相邻的基板与它们各自的前表面彼此面对的距离，以确保处理均匀性，并且大于第二对垂直相邻的基板之间的距离，并且其相应的后表面彼此面对。