-
公开(公告)号：US09787222B2
公开(公告)日：2017-10-10
申请号：US14721408
申请日：2015-05-26
发明人： Kaoru Yamamoto , Shinji Orimoto , Naoyuki Suzuki
IPC分类号： H02N13/00 , H01L21/683 , H01L21/687
CPC分类号： H02N13/00 , H01L21/6833 , H01L21/68742 , H01L21/6875
摘要： Provided is an electrostatic attraction apparatus in which a first insulating layer is formed on a base in an electrostatic chuck. A first portion of the first insulating layer extends on a first face of the base and a second portion of the first insulating layer extends on at least a portion of a second face of the base. An attraction electrode is formed on the first portion of the first insulating layer. A second insulating layer is formed on the first portion of the first insulating layer and the attraction electrode. A conductor pattern extends from the attraction electrode and provides a power supply terminal on the second portion of the first insulating layer. A contact part of a terminal member urged by an urging unit is in contact with the power supply terminal. The terminal member is connected with a wiring line connected to a supply power.
-
公开(公告)号：US11532784B2
公开(公告)日：2022-12-20
申请号：US17193545
申请日：2021-03-05
发明人： Manabu Nakagawasai , Koji Maeda , Shinji Orimoto , Motoi Yamagata
摘要： A substrate processing apparatus includes a processing chamber where a substrate support on which a substrate is placed and a target holder configured to hold a target are disposed, a freezing device disposed with a gap with respect to a bottom surface of the substrate support and having a chiller and a cold heat medium laminated on the chiller, and a rotating device configured to rotate the substrate support. The substrate processing apparatus further includes a first elevating device configured to raise and lower the substrate support, a coolant channel formed in the chiller to supply a coolant to the gap, and a cold heat transfer material disposed in the gap and being in contact with the substrate support and the cold heat medium so as to transfer heat therebetween.
-
公开(公告)号：US11417504B2
公开(公告)日：2022-08-16
申请号：US16660696
申请日：2019-10-22
发明人： Manabu Nakagawasai , Naoyuki Suzuki , Shinji Orimoto , Hiroyuki Yokohara , Motoi Yamagata , Koji Maeda
IPC分类号： H01J37/32 , C23C14/34 , C23C14/50 , C23C14/54 , H01L21/683 , H01F41/32 , H01L43/12 , H01J37/34 , H01L21/673
摘要： A stage device includes a stage configured to hold a target substrate in a vacuum chamber, a cold heat transfer body fixedly disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body and cooled to an extremely low temperature by a chiller disposed below the cold heat transfer body, and cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage. The stage device further includes a stage support configured to rotatably support the stage and formed in a cylindrical shape to surround an upper part of the cold heat transfer body wherein the stage support has a vacuum insulation structure, and a rotation part configured to support the stage support and rotated by a driving mechanism while being sealed with magnetic fluid.
-
公开(公告)号：US20190390326A1
公开(公告)日：2019-12-26
申请号：US16442721
申请日：2019-06-17
发明人： Junichi Takei , Naoyuki Suzuki , Hiroshi Sone , Shinji Orimoto
摘要： A substrate stage includes: a shaft rotatably disposed with respect to a bottom surface of a processing container; a base provided on the shaft; and a horizontal mover attached to the base and configured to move a substrate in the processing container in a horizontal direction with respect to the bottom surface.
-
公开(公告)号：US20200303223A1
公开(公告)日：2020-09-24
申请号：US16819287
申请日：2020-03-16
IPC分类号： H01L21/67 , H01L21/687 , G01K13/00
摘要： A temperature measuring device that measures a temperature of a rotatable stage that holds a substrate, includes: a contact portion provided at a position that does not hinder placing of the substrate on the stage, and a temperature detector having a temperature sensor, and provided at a position separated from the temperature detection contact portion except when measuring a temperature. When measuring the temperature of the stage, the temperature detection contact portion and the temperature detector are relatively moved and brought into contact with each other in a state where the stage is not rotating to detect the temperature of the stage.
-
公开(公告)号：US10254693B2
公开(公告)日：2019-04-09
申请号：US14740805
申请日：2015-06-16
摘要： A fixing unit fixes a plate-shaped member to a fixing base member. The fixing unit includes: a pressing unit configured to press the plate-shaped member toward the fixing base member; and a plurality of positioning units, installed at the fixing base member to be in contact with side surfaces of the plate-shaped member, and configured to place the plate-shaped member with respect to the fixing base member. Each of the positioning units includes: a shaft to be installed at the fixing base member; and a slide part movable along the shaft, and the slide part includes a contact part to be in contact with one of the side surfaces of the plate-shaped member and a clearance part formed on the contact part to have a smaller width than that of the contact part.
-
公开(公告)号：US11605547B2
公开(公告)日：2023-03-14
申请号：US16819287
申请日：2020-03-16
IPC分类号： H01L21/67 , G01K13/00 , H01L21/687
摘要： A temperature measuring device that measures a temperature of a rotatable stage that holds a substrate, includes: a contact portion provided at a position that does not hinder placing of the substrate on the stage, and a temperature detector having a temperature sensor, and provided at a position separated from the temperature detection contact portion except when measuring a temperature. When measuring the temperature of the stage, the temperature detection contact portion and the temperature detector are relatively moved and brought into contact with each other in a state where the stage is not rotating to detect the temperature of the stage.
-
公开(公告)号：US11414747B2
公开(公告)日：2022-08-16
申请号：US16446441
申请日：2019-06-19
发明人： Junichi Takei , Hiroshi Sone , Naoyuki Suzuki , Shinji Orimoto
IPC分类号： H01J37/34 , C23C14/35 , C23C14/54 , H01L21/203
摘要： A sputtering device includes a processing chamber where a substrate is accommodated, and a slit plate that partitions the processing chamber into a first space where a target member is disposed and a second space where the substrate is disposed. The slit plate includes an inner member having an opening that penetrates therethrough in a thickness direction of the slit plate, and an outer member disposed around the inner member. The inner member is attachable to and detachable from the outer member.
-
公开(公告)号：US11293092B2
公开(公告)日：2022-04-05
申请号：US16660700
申请日：2019-10-22
摘要： A stage device includes a stage configured to hold a target substrate in a vacuum chamber, a chiller having a cold head maintained at an extremely low temperature and a cold heat transfer body fixed in contact with the cold head and disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body. The stage device further includes a heat insulating structure unit having a vacuum insulated structure and configured to surround at least the cold head and a connection portion between the cold head and the cold heat transfer body, cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage, and a stage support rotated by a driving mechanism and configured to rotatably support the stage.
-
10.发明申请ELECTROSTATIC ATTRACTION APPARATUS, ELECTROSTATIC CHUCK AND COOLING TREATMENT APPARATUS 有权静电吸引装置，静电卡盘和冷却处理装置公开(公告)号：US20150349668A1
公开(公告)日：2015-12-03
申请号：US14721408
申请日：2015-05-26
发明人： Kaoru Yamamoto , Shinji Orimoto , Naoyuki Suzuki
IPC分类号： H02N13/00 , H01L21/683
CPC分类号： H02N13/00 , H01L21/6833 , H01L21/68742 , H01L21/6875
摘要： Provided is an electrostatic attraction apparatus in which a first insulating layer is formed on a base in an electrostatic chuck. A first portion of the first insulating layer extends on a first face of the base and a second portion of the first insulating layer extends on at least a portion of a second face of the base. An attraction electrode is formed on the first portion of the first insulating layer. A second insulating layer is formed on the first portion of the first insulating layer and the attraction electrode. A conductor pattern extends from the attraction electrode and provides a power supply terminal on the second portion of the first insulating layer. A contact part of a terminal member urged by an urging unit is in contact with the power supply terminal. The terminal member is connected with a wiring line connected to a supply power.
摘要翻译： 提供一种静电吸引装置，其中在静电卡盘中的基座上形成第一绝缘层。 第一绝缘层的第一部分在基底的第一面上延伸，第一绝缘层的第二部分在基底的第二面的至少一部分上延伸。 吸引电极形成在第一绝缘层的第一部分上。 在第一绝缘层和吸引电极的第一部分上形成第二绝缘层。 导体图案从吸引电极延伸，并在第一绝缘层的第二部分上提供电源端子。 由推压单元推压的端子构件的接触部与电源端子接触。 端子构件与连接到电源的布线相连。
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.018 秒)
