Method for cleaning semiconductor substrate
    2.
    发明授权
    Method for cleaning semiconductor substrate 失效
    半导体基板的清洗方法

    公开(公告)号:US07503982B2

    公开(公告)日:2009-03-17

    申请号:US10818033

    申请日:2004-04-05

    IPC分类号: C23G1/00 C23G1/02

    摘要: A method for cleaning a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees comprises contacting the semiconductor surface with a cleaning liquid composition including an aliphatic polycarboxylic acid, an organic solvent having a hydroxyl group and/or an ether group, an anionic surfactant and water.

    摘要翻译: 一种用于清洁其表面与其下降到其上的水的接触角至少为70度的半导体衬底的方法包括使半导体表面与包含脂肪族多元羧酸,具有羟基的有机溶剂和/或 醚基,阴离子表面活性剂和水。

    Support apparatus for optical characteristic measurement, and program product used for same
    5.
    发明申请
    Support apparatus for optical characteristic measurement, and program product used for same 有权
    用于光学特性测量的支持装置,以及用于其的程序产品

    公开(公告)号:US20060229838A1

    公开(公告)日:2006-10-12

    申请号:US11398792

    申请日:2006-04-06

    IPC分类号: G01D1/00

    摘要: A support apparatus for optical characteristic measurement includes a measurement data inputter configured to input measurement data obtained by an optical characteristic measuring instrument, an image inputter configured to input an image of a measurement object, a measurement table in which the measurement data and the image of the measurement object corresponding to the measurement data are recorded, and a measurement data manager configured to record the measurement data inputted by the measurement data inputter in the measurement table so as to be associated with the image of the measurement object every time an optical characteristic of the measurement object is measured.

    摘要翻译: 用于光学特性测量的支持装置包括测量数据输入器,其被配置为输入由光学特性测量仪器获得的测量数据,被配置为输入测量对象的图像的图像输入器,测量数据和测量数据的图像 记录与测量数据相对应的测量对象,并且测量数据管理器被配置为将测量数据输入器输入的测量数据记录在测量表中,以便每当测量对象的光学特性 测量对象。

    Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process
    6.
    发明申请
    Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process 审中-公开
    半导体衬底清洗液和半导体衬底清洗工艺

    公开(公告)号:US20060035797A1

    公开(公告)日:2006-02-16

    申请号:US11201910

    申请日:2005-08-10

    IPC分类号: C23G1/00 B08B3/00

    摘要: A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.

    摘要翻译: 提供一种半导体衬底清洗液组合物,其包含一种或多种选自每分子具有至少两个磺酸基的化合物,植酸和缩合磷酸化合物的类型; 无机酸; 和水。 还提供了一种清洗半导体衬底的方法,该方法包括使用半导体衬底清洗液组合物清洗半导体衬底的第一步骤,在第一步骤之后,用纯水,臭氧水清洗半导体衬底的第二步骤 通过将臭氧气体溶解在纯水或过氧化氢水溶液中形成。

    Photoresist stripping liquid composition
    9.
    发明授权
    Photoresist stripping liquid composition 有权
    光阻剥离液组合物

    公开(公告)号:US06231677B1

    公开(公告)日:2001-05-15

    申请号:US09255537

    申请日:1999-02-22

    IPC分类号: C23G102

    CPC分类号: G03F7/42

    摘要: A photoresist stripping liquid composition effective for removing resist residues after dry etching and resist ashing in the manufacturing processes of semiconductor devices, which does not corrode the different metallic materials, and wherein are comprised, as active component, one or more polycarboxylic acids and/or their salts selected from the group consisting of aliphatic polycarboxylic acids and their salts as well as aminopolycarboxylic acids and their salts.

    摘要翻译: 一种光致抗蚀剂剥离液体组合物,其有效用于在不腐蚀不同金属材料的半导体器件的制造工艺中干蚀刻后除去抗蚀剂残留物并抵抗灰化,并且其中作为活性组分包含一种或多种多元羧酸和/或 它们的盐选自脂族多元羧酸及其盐以及氨基多羧酸及其盐。

    Magnetic stimulus type urinary incontinence treatment apparatus
    10.
    发明授权
    Magnetic stimulus type urinary incontinence treatment apparatus 失效
    磁刺激型尿失禁治疗仪

    公开(公告)号:US06179769B2

    公开(公告)日:2001-01-30

    申请号:US08996541

    申请日:1997-12-23

    IPC分类号: A61N200

    CPC分类号: A61N2/006 A61N2/02 Y10S128/25

    摘要: A magnetic stimulus type urinary incontinence treatment coil apparatus for generating flux for generating eddy current in a physiological body by providing a coil having an upper surface curved in a concave manner at least in a longitudinal direction such that the coil is fitted to at least part of an area from a front face region of a urethra opening to a rear face region of an anus, the coil wound around the area; and a support for supporting the coil at a position at which the coil is fitted to a patient.

    摘要翻译: 一种磁刺激型尿失禁治疗线圈装置,用于通过提供具有至少沿纵向弯曲的上表面的线圈来产生生理体内产生涡流的通量,使得线圈装配到至少部分 从尿道开口的前面区域到肛门的后面区域的区域,所述线圈缠绕在所述区域上; 以及用于在线圈被安装到患者处的位置处支撑线圈的支撑件。