公开(公告)号：US20120112182A1

公开(公告)日：2012-05-10

申请号：US13280628

申请日：2011-10-25

Applicant: Takahide Ishii ,  Yoshihiro Oshima

Inventor： Takahide Ishii ,  Yoshihiro Oshima

IPC: H01L33/08 ,  H01L21/336

CPC classification number: H01L29/7869 ,  H01L27/1225 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/66969 ,  H01L29/78606

Abstract: Disclosed herein is a method of manufacturing a thin film transistor having a structure that a gate electrode and an oxide semiconductor layer are disposed with a gate insulating film interposed between the gate electrode and the oxide semiconductor layer, and a source/drain electrode is electrically connected to the oxide semiconductor layer, the method including: continuously depositing an aluminum oxide (Al2O3) layer as a protective film and an aluminum (Al) layer in this order on any of the source/drain electrode, the gate insulating film, and the oxide semiconductor layer by using sputtering.

Abstract translation: 这里公开了一种制造薄膜晶体管的方法，该薄膜晶体管的结构是栅极电极和氧化物半导体层被设置在栅电极和氧化物半导体层之间的栅绝缘膜上，并且源/漏电极电连接 涉及氧化物半导体层的方法，该方法包括：在源极/漏极，栅极绝缘膜和氧化物中的任何一个上依次沉积作为保护膜的氧化铝（Al 2 O 3）层和铝（Al）层 半导体层。

公开(公告)号：US08906738B2

公开(公告)日：2014-12-09

申请号：US13280628

申请日：2011-10-25

Applicant: Takahide Ishii ,  Yoshihiro Oshima

Inventor： Takahide Ishii ,  Yoshihiro Oshima

IPC: H01L21/00 ,  H01L21/16 ,  H01L29/786 ,  H01L29/66 ,  H01L29/49 ,  H01L27/12

CPC classification number: H01L29/7869 ,  H01L27/1225 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/66969 ,  H01L29/78606

Abstract: Disclosed herein is a method of manufacturing a thin film transistor having a structure that a gate electrode and an oxide semiconductor layer are disposed with a gate insulating film interposed between the gate electrode and the oxide semiconductor layer, and a source/drain electrode is electrically connected to the oxide semiconductor layer, the method including: continuously depositing an aluminum oxide (Al2O3) layer as a protective film and an aluminum (Al) layer in this order on any of the source/drain electrode, the gate insulating film, and the oxide semiconductor layer by using sputtering.

Abstract translation: 这里公开了一种制造薄膜晶体管的方法，该薄膜晶体管的结构是栅极电极和氧化物半导体层被设置在栅电极和氧化物半导体层之间的栅绝缘膜上，并且源/漏电极电连接 涉及氧化物半导体层的方法，该方法包括：在源极/漏极，栅极绝缘膜和氧化物中的任何一个上依次沉积作为保护膜的氧化铝（Al 2 O 3）层和铝（Al）层 半导体层。

公开(公告)号：US09324741B2

公开(公告)日：2016-04-26

申请号：US13417360

申请日：2012-03-12

Applicant: Takahide Ishii

Inventor： Takahide Ishii

IPC: H01L27/12 ,  H01L33/38 ,  H01L51/52

CPC classification number: H01L27/1288 ,  H01L27/1225 ,  H01L33/38 ,  H01L51/5209

Abstract: Disclosed herein is a manufacturing method of a display device including: forming a gate electrode on a substrate; forming a laminated film by photolithography techniques. The laminated film is provided above the gate electrode with a gate insulating film sandwiched therebetween and includes a semiconductor layer, at least either a source/drain electrode or a pixel electrode, a planarizing film and a pixel isolation film. The manufacturing method further includes forming a functional layer and a common electrode in this order after the formation of the laminated film. The functional layer includes an organic electric field light-emitting layer. Two or more layers are patterned all together in at least part of the laminated film during the formation of the laminated film.

Abstract translation: 本文公开了一种显示装置的制造方法，包括：在基板上形成栅电极; 通过光刻技术形成层压膜。 叠层膜设置在栅电极上方，其间夹有栅极绝缘膜，并且包括半导体层，至少源极/漏极或像素电极，平坦化膜和像素隔离膜。 制造方法还包括在形成层压膜之后依次形成功能层和公共电极。 功能层包括有机电场发光层。 在形成层压膜期间，在层压膜的至少一部分中，将两层或更多层图案化。

公开(公告)号：US07839063B2

公开(公告)日：2010-11-23

申请号：US11020467

申请日：2004-12-22

Applicant: Akemi Matsuo ,  Kunio Goto ,  Yasushi Ito ,  Shinjiro Kida ,  Takahide Ishii

Inventor： Akemi Matsuo ,  Kunio Goto ,  Yasushi Ito ,  Shinjiro Kida ,  Takahide Ishii

IPC: H01J63/04 ,  H01J1/62 ,  H01J5/16

CPC classification number: H01J29/898 ,  H01J29/085

Abstract: To provide a display panel having such a structure that a color filter is unlikely to suffer damage due to a heat treatment in a reducing atmosphere in the fabrication process for display device. A display panel (anode panel AP) includes a fluorescent region formed on a substrate, and an electrode (anode electrode), formed on the fluorescent region, wherein electrons emitted from an electron source penetrate the electrode and collide with the fluorescent region to allow the fluorescent region to emit light to obtain a desired image, wherein a color filter and a color filter protective film are formed in this order from the side of the substrate between the substrate and the fluorescent region.

Abstract translation: 为了提供一种具有这样的结构的显示面板，即在显示装置的制造工艺中，由于在还原气氛中的热处理，滤色器不太可能遭受损坏。 显示面板（阳极面板AP）包括形成在基板上的荧光区域和形成在荧光区域上的电极（阳极电极），其中从电子源发射的电子穿透电极并与荧光区域碰撞，以允许 荧光区域发光以获得期望的图像，其中从衬底和荧光区域之间的衬底侧开始依次形成滤色器和滤色器保护膜。

公开(公告)号：US20120241745A1

公开(公告)日：2012-09-27

申请号：US13417360

申请日：2012-03-12

Applicant: Takahide Ishii

Inventor： Takahide Ishii

IPC: H01L33/16 ,  H01L33/08

CPC classification number: H01L27/1288 ,  H01L27/1225 ,  H01L33/38 ,  H01L51/5209

Abstract: Disclosed herein is a manufacturing method of a display device including: forming a gate electrode on a substrate; forming a laminated film by photolithography technique. The laminated film is provided above the gate electrode with a gate insulating film sandwiched therebetween and includes a semiconductor layer, at least either a source/drain electrode or a pixel electrode, a planarizing film and a pixel isolation film. The manufacturing method further includes forming a functional layer and a common electrode in this order after the formation of the laminated film. The functional layer includes an organic electric field light-emitting layer. Two or more layers are patterned all together in at least part of the laminated film during the formation of the laminated film.

Abstract translation: 本文公开了一种显示装置的制造方法，包括：在基板上形成栅电极; 通过光刻技术形成层压膜。 叠层膜设置在栅电极上方，其间夹有栅极绝缘膜，并且包括半导体层，至少源极/漏极或像素电极，平坦化膜和像素隔离膜。 制造方法还包括在形成层压膜之后依次形成功能层和公共电极。 功能层包括有机电场发光层。 在形成层压膜期间，在层压膜的至少一部分中，将两层或更多层图案化。

公开(公告)号：US20050258728A1

公开(公告)日：2005-11-24

申请号：US11020467

申请日：2004-12-22

Applicant: Akemi Matsuo ,  Kunio Goto ,  Yasushi Ito ,  Shinjiro Kida ,  Takahide Ishii

Inventor： Akemi Matsuo ,  Kunio Goto ,  Yasushi Ito ,  Shinjiro Kida ,  Takahide Ishii

IPC: H01J31/12 ,  H01J1/30 ,  H01J29/08 ,  H01J29/28 ,  H01J29/32 ,  H01J29/89 ,  H01J1/62

CPC classification number: H01J29/898 ,  H01J29/085

Abstract: To provide a display panel having such a structure that a color filter is unlikely to suffer a damage due to a heat treatment in a reducing atmosphere in the fabrication process for display device. A display panel (anode panel AP) comprises a fluorescent region formed on a substrate, and an electrode (anode electrode) formed on the fluorescent region, wherein electrons emitted from an electron source penetrate the electrode and collide with the fluorescent region to allow the fluorescent region to emit light to obtain a desired image, wherein a color filter and a color filter protective film are formed in this order from the side of the substrate between the substrate and the fluorescent region.

Abstract translation: 为了提供一种具有这样一种结构的显示面板，即在显示装置的制造过程中，由于在还原气氛中的热处理，滤色器不太可能遭受损坏。 显示面板（阳极面板AP）包括形成在基板上的荧光区域和形成在荧光区域上的电极（阳极电极），其中从电子源发射的电子穿透电极并与荧光区域碰撞以允许荧光 区域发光以获得期望的图像，其中从衬底和荧光区域之间的衬底侧依次形成滤色器和滤色器保护膜。