Disclosed herein is a manufacturing method of a display device including: forming a gate electrode on a substrate; forming a laminated film by photolithography techniques. The laminated film is provided above the gate electrode with a gate insulating film sandwiched therebetween and includes a semiconductor layer, at least either a source/drain electrode or a pixel electrode, a planarizing film and a pixel isolation film. The manufacturing method further includes forming a functional layer and a common electrode in this order after the formation of the laminated film. The functional layer includes an organic electric field light-emitting layer. Two or more layers are patterned all together in at least part of the laminated film during the formation of the laminated film.