公开(公告)号：US11410868B2

公开(公告)日：2022-08-09

申请号：US17179994

申请日：2021-02-19

Applicant: TOTO LTD.

Inventor： Masaki Sato ,  Ikuo Itakura ,  Shuichiro Saigan ,  Jun Shiraishi ,  Yutaka Momiyama ,  Kouta Kobayashi

IPC: H01L21/683

Abstract: An electrostatic chuck includes: an electrically-conductive base plate including a first part, a second part at an outer circumference of the first part, and a gas inlet path for introducing a cooling gas; a first electrostatic chuck part configured to clamp a wafer on the first part, including a ceramic dielectric substrate that includes an embedded first clamping electrode and at least one through-hole communicating with the gas inlet path; and a second electrostatic chuck part configured to clamp a focus ring on the second part, including a ceramic layer that includes at least one through-hole for introducing a cooling gas and that includes at least a first layer contacting the focus ring when the second electrostatic chuck part clamps the focus ring, in which the first layer is less dense than the ceramic dielectric substrate. Thereby, the electrostatic chuck can increase the device yield.

公开(公告)号：US12198964B2

公开(公告)日：2025-01-14

申请号：US16810272

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Jun Shiraishi ,  Shuichiro Saigan ,  Tatsuya Mori ,  Yuki Sasaki ,  Masahiro Watanabe

IPC: H01L21/683 ,  C23C16/455 ,  C23C16/458 ,  H01J37/32 ,  H01L21/67 ,  H01L21/687

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate includes first and second major surfaces. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided in the ceramic dielectric substrate and is opposite to the gas feed channel. The first porous part includes a first porous region, and a first dense region denser than the first porous region. The first porous region includes first sparse portions, and a first dense portion. The first sparse portions include pores. The first dense portion has a higher than the first sparse portions. The first dense portion is positioned between the first sparse portions. The first sparse portions include a first wall part provided between the pores.

公开(公告)号：US11276602B2

公开(公告)日：2022-03-15

申请号：US16810404

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Jun Shiraishi ,  Shuichiro Saigan ,  Tatsuya Mori ,  Masahiro Watanabe ,  Yuki Sasaki

IPC: H01L21/683 ,  H01J37/32 ,  H01L21/67

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate includes first and second major surfaces, and at least one groove. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the groove and the gas feed channel. The ceramic dielectric substrate includes holes communicating with the groove and the gas feed channel and piercing the ceramic dielectric substrate in a first direction from the base plate toward the ceramic dielectric substrate. The first porous part includes at least one porous region including pores, and at least one dense region denser than the porous region. The porous region further includes at least one dense part.

公开(公告)号：US12014947B2

公开(公告)日：2024-06-18

申请号：US17690337

申请日：2022-03-09

Applicant: TOTO LTD.

Inventor： Jun Shiraishi ,  Shuichiro Saigan ,  Tatsuya Mori ,  Masahiro Watanabe

IPC: H01L21/683

CPC classification number: H01L21/6833

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the base plate and the first major surface. The ceramic dielectric substrate includes a first hole part. The first porous part includes a porous section, and a first compact section being more compact than the porous section. The porous section including a plurality of sparse portions including a plurality of pores including a first pore and a second pore, and a dense portion having a higher density than the sparse portion.

公开(公告)号：US11626310B2

公开(公告)日：2023-04-11

申请号：US16576289

申请日：2019-09-19

Applicant: TOTO LTD.

Inventor： Jun Shiraishi ,  Shuichiro Saigan ,  Tatsuya Mori ,  Masahiro Watanabe

IPC: H01L21/683 ,  H05K1/03

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface on opposite side from the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided at a position between the base plate and the first major surface of the ceramic dielectric substrate. The position is opposed to the gas feed channel. The first porous part includes a plurality of sparse portions each including a plurality of pores. The plurality of sparse portions are spaced from each other. Each of the plurality of sparse portions extends in a direction inclined by a prescribed angle with respect to a first direction from the base plate to the ceramic dielectric substrate.

公开(公告)号：US11380574B2

公开(公告)日：2022-07-05

申请号：US17179994

申请日：2021-02-19

Applicant: TOTO LTD.

Inventor： Masaki Sato ,  Ikuo Itakura ,  Shuichiro Saigan ,  Jun Shiraishi ,  Yutaka Momiyama ,  Kouta Kobayashi

IPC: H01L21/683

Abstract: An electrostatic chuck includes: an electrically-conductive base plate including a first part, a second part at an outer circumference of the first part, and a gas inlet path for introducing a cooling gas; a first electrostatic chuck part configured to clamp a wafer on the first part, including a ceramic dielectric substrate that includes an embedded first clamping electrode and at least one through-hole communicating with the gas inlet path; and a second electrostatic chuck part configured to clamp a focus ring on the second part, including a ceramic layer that includes at least one through-hole for introducing a cooling gas and that includes at least a first layer contacting the focus ring when the second electrostatic chuck part clamps the focus ring, in which the first layer is less dense than the ceramic dielectric substrate. Thereby, the electrostatic chuck can increase the device yield.

公开(公告)号：US11309204B2

公开(公告)日：2022-04-19

申请号：US16576220

申请日：2019-09-19

Applicant: TOTO LTD.

Inventor： Jun Shiraishi ,  Shuichiro Saigan ,  Tatsuya Mori ,  Masahiro Watanabe

IPC: H01L21/683

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the base plate and the first major surface. The ceramic dielectric substrate includes a first hole part. The first porous part includes a porous section, and a first compact section being more compact than the porous section. As projected on a plane perpendicular to a first direction from the base plate to the ceramic dielectric substrate, the first compact section is configured to overlap the first hole part, and the porous section is configured not to overlap the first hole part.

公开(公告)号：US11145532B2

公开(公告)日：2021-10-12

申请号：US16722789

申请日：2019-12-20

Applicant: TOTO LTD.

Inventor： Masafumi Ikeguchi ,  Tetsuro Itoyama ,  Shuichiro Saigan ,  Jun Shiraishi

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H01J37/32

Abstract: An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole is connected to at least one of multiple first grooves. At least one second groove are provided in the first region. The multiple first grooves have substantially circular planar configurations and are provided concentrically. The second groove is connected to at least two of the first grooves. When projected onto a plane perpendicular to a first direction from the base plate toward the ceramic dielectric substrate, at least a portion of the first gas introduction hole overlaps at least one of the first groove or the second groove at a portion where the first groove and the second groove are connected.

公开(公告)号：US11018039B2

公开(公告)日：2021-05-25

申请号：US16352899

申请日：2019-03-14

Applicant: TOTO LTD.

Inventor： Kosuke Yamaguchi ,  Jun Shiraishi ,  Ikuo Itakura ,  Yutaka Momiyama ,  Shuichiro Saigan

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687

Abstract: According to the embodiment, the electrostatic chuck includes a ceramic dielectric substrate having a first major surface and a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface and being opposite to the gas introduction path. The ceramic dielectric substrate includes a first hole part positioned between the first major surface and the first porous part. At least one of the ceramic dielectric substrate or the first porous part includes a second hole part positioned between the first hole part and the first porous part, and a dimension of the second hole part is smaller than a dimension of the first porous part and larger than a dimension of the first hole part.

公开(公告)号：US20140227623A1

公开(公告)日：2014-08-14

申请号：US14348563

申请日：2012-09-27

Applicant: TOTO LTD.

Inventor： Yasuo Kakinuma ,  Akira Kawakami ,  Shuichiro Saigan ,  Shigeru Ando ,  Chihiro Kobayashi ,  Masato Ota ,  Naoki Watanabe ,  Nobuo Isaka ,  Yuya Takahashi ,  Megumi Shimazu

IPC: H01M8/02

CPC classification number: H01M8/0282 ,  H01M8/004 ,  H01M8/0252 ,  H01M8/0271 ,  H01M8/1213 ,  H01M8/243 ,  Y02E60/521 ,  Y02E60/525

Abstract: In a fuel cell unit 16 that constitutes a fuel cell module 2 of an SOFC device 1, a collector cap 86a is connected to an inner electrode layer 90 via a seal material 96 as an Ag seal portion. A glass coating 30 (dense body) is filled up between the inner electrode layer 90 and an electrolyte layer 94 and the collector cap 86a to cover an upper end surface 96a of the seal material 96. As such, the fuel cell unit 16 includes the seal material 96 constituting as an Ag seal portion that separates a fuel gas from an oxidant gas, and a glass coating 30 at least partially formed to over at least either the fuel gas side surface of the seal material 96 or an the oxidant gas side surface of the seal material 96.

Abstract translation: 在构成SOFC装置1的燃料电池模块2的燃料电池单元16中，集电帽86a通过作为Ag密封部的密封材料96与内部电极层90连接。 在内部电极层90和电解质层94以及集电体帽86a之间填充玻璃涂层30（密实体），以覆盖密封材料96的上端面96a。因此，燃料电池单元16包括 构成作为Ag密封部分的密封材料96，其将燃料气体与氧化剂气体分离;以及至少部分地形成在密封材料96的燃料气体侧表面或氧化剂气体侧表面的至少一个的玻璃涂层30 的密封材料96。