Invention Grant
- Patent Title: Electrostatic chuck which reduces arc discharge
-
Application No.: US16352899Application Date: 2019-03-14
-
Publication No.: US11018039B2Publication Date: 2021-05-25
- Inventor: Kosuke Yamaguchi , Jun Shiraishi , Ikuo Itakura , Yutaka Momiyama , Shuichiro Saigan
- Applicant: TOTO LTD.
- Applicant Address: JP Kitakyushu
- Assignee: TOTO LTD.
- Current Assignee: TOTO LTD.
- Current Assignee Address: JP Kitakyushu
- Agency: Carrier Blackman & Associates, P.C.
- Agent Joseph P. Carrier; William D. Blackman
- Priority: JPJP2018-047009 20180314,JPJP2018-203725 20181030
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; H01L21/687

Abstract:
According to the embodiment, the electrostatic chuck includes a ceramic dielectric substrate having a first major surface and a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface and being opposite to the gas introduction path. The ceramic dielectric substrate includes a first hole part positioned between the first major surface and the first porous part. At least one of the ceramic dielectric substrate or the first porous part includes a second hole part positioned between the first hole part and the first porous part, and a dimension of the second hole part is smaller than a dimension of the first porous part and larger than a dimension of the first hole part.
Public/Granted literature
- US20190287839A1 ELECTROSTATIC CHUCK Public/Granted day:2019-09-19
Information query
IPC分类: