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公开(公告)号:US11145532B2
公开(公告)日:2021-10-12
申请号:US16722789
申请日:2019-12-20
Applicant: TOTO LTD.
Inventor: Masafumi Ikeguchi , Tetsuro Itoyama , Shuichiro Saigan , Jun Shiraishi
IPC: H01L21/683 , H01L21/687 , H01L21/67 , H01J37/32
Abstract: An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole is connected to at least one of multiple first grooves. At least one second groove are provided in the first region. The multiple first grooves have substantially circular planar configurations and are provided concentrically. The second groove is connected to at least two of the first grooves. When projected onto a plane perpendicular to a first direction from the base plate toward the ceramic dielectric substrate, at least a portion of the first gas introduction hole overlaps at least one of the first groove or the second groove at a portion where the first groove and the second groove are connected.
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公开(公告)号:US10964579B2
公开(公告)日:2021-03-30
申请号:US16810220
申请日:2020-03-05
Applicant: TOTO LTD.
Inventor: Tetsuro Itoyama , Jumpei Uefuji
IPC: H01T23/00 , H01L21/683
Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.
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公开(公告)号:US20200286766A1
公开(公告)日:2020-09-10
申请号:US16810220
申请日:2020-03-05
Applicant: TOTO LTD.
Inventor: Tetsuro Itoyama , Jumpei Uefuji
IPC: H01L21/683
Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.
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公开(公告)号:US10373854B2
公开(公告)日:2019-08-06
申请号:US15937126
申请日:2018-03-27
Applicant: TOTO LTD.
Inventor: Jumpei Uefuji , Hitoshi Sasaki , Kosuke Yamaguchi , Kengo Maehata , Yuichi Yoshii , Tetsuro Itoyama
IPC: H01L21/683 , H05B3/28 , H01L21/67 , H01L21/687
Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, an electrode layer, a base plate, and a heater plate. The ceramic dielectric substrate has a first major surface where a processing object is placed. The electrode layer is provided in the ceramic dielectric substrate. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the base plate and the first major surface. The heater plate includes a first heater element and a second heater element. The first heater element emits heat due to a current flowing. The second heater element emits heat due to a current flowing. When viewed along a direction perpendicular to the first major surface, bends of the first heater element is more than bends of the second heater element, and the first heater element includes a portion positioned at a gap of the second heater element.
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