Invention Application
- Patent Title: ELECTROSTATIC CHUCK
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Application No.: US16810220Application Date: 2020-03-05
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Publication No.: US20200286766A1Publication Date: 2020-09-10
- Inventor: Tetsuro Itoyama , Jumpei Uefuji
- Applicant: TOTO LTD.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@71d0657c
- Main IPC: H01L21/683
- IPC: H01L21/683

Abstract:
According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.
Public/Granted literature
- US10964579B2 Electrostatic chuck Public/Granted day:2021-03-30
Information query
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