Invention Application

  • Patent Title: ELECTROSTATIC CHUCK
  • Application No.: US16810220
    Application Date: 2020-03-05
  • Publication No.: US20200286766A1
    Publication Date: 2020-09-10
  • Inventor: Tetsuro ItoyamaJumpei Uefuji
  • Applicant: TOTO LTD.
  • Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@71d0657c
  • Main IPC: H01L21/683
  • IPC: H01L21/683
ELECTROSTATIC CHUCK
Abstract:
According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.
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