公开(公告)号：US20140242728A1

公开(公告)日：2014-08-28

申请号：US13777352

申请日：2013-02-26

Applicant: TDK CORPORATION

Inventor： Hitoshi HATATE ,  Atsuyoshi TSUNODA ,  Makoto FUKUI ,  Shuji OKAME ,  Ken FUJII

IPC: H01L43/12

CPC classification number: H01L43/12 ,  G01R33/093 ,  G01R33/098 ,  G11B5/3909 ,  G11B2005/3996

Abstract: A magnetoresistive device includes an MR element including a metal layer, and an insulating portion made of magnesium oxide and in contact with the MR element. A method of manufacturing the magnetoresistive device includes the step of removing an unwanted magnesium oxide film that is formed by the magnesium oxide in the process of forming the insulating portion. In this step, the unwanted magnesium oxide film is wet etched by using an etchant containing an aqueous ammonia solution.

Abstract translation: 磁阻器件包括包括金属层的MR元件和由氧化镁制成并与MR元件接触的绝缘部分。 制造磁阻器件的方法包括在形成绝缘部分的过程中除去由氧化镁形成的不想要的氧化镁膜的步骤。 在该步骤中，通过使用含有氨水溶液的蚀刻剂湿法蚀刻不需要的氧化镁膜。

公开(公告)号：US20180005648A1

公开(公告)日：2018-01-04

申请号：US15197342

申请日：2016-06-29

Applicant: TDK CORPORATION

Inventor： Ken FUJII ,  Hisayoshi WATANABE ,  Masachika HASHINO ,  Takamitsu SAKAMOTO ,  Tetsuya HIRAKI

IPC: G11B5/127 ,  C23C16/455 ,  C23C16/04 ,  C23C16/40 ,  G11B5/39 ,  G11B5/11

CPC classification number: G11B5/1272 ,  G11B5/012 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

Abstract: This method of manufacturing a perpendicular magnetic recording head includes: forming a water-soluble resin film on a base; forming a first resist pattern having an opening on the water-soluble resin film; selectively dissolving the water-soluble resin film exposed at a bottom of the opening with a developer to expose a part of a surface of the base; forming a non-magnetic oxide film to cover the opening and the exposed part of the surface of the base; forming a second resist pattern to fill the opening covered with the non-magnetic oxide film and then removing the first resist pattern and the non-magnetic oxide film; forming a first side shield and a second side shield on the base to allow them to face each other with the second resist pattern therebetween; and forming a magnetic pole between the first and the second side shields after removal of the second resist pattern.

公开(公告)号：US20150140685A1

公开(公告)日：2015-05-21

申请号：US14082249

申请日：2013-11-18

Applicant: TDK Corporation

Inventor： Hisayoshi WATANABE ,  Ken FUJII ,  Takayuki NISHIZAWA ,  Masachika HASHINO

IPC: H01L43/12 ,  G03F1/00 ,  H01L43/08

CPC classification number: H01L21/0274 ,  G03F1/00 ,  G03F7/203 ,  G03F7/70633 ,  G11B5/1278 ,  G11B5/3163 ,  G11B5/3958 ,  G11B5/3967 ,  G11B5/4886 ,  H01L21/312

Abstract: A method for manufacturing a pattern multilayer body that has a plurality of pattern layers, and where a pattern is formed in each pattern layer, includes a step of forming an overlay pattern within an overlay pattern formation region, and in the step of forming the overlay pattern, a photoresist film is formed, and after a photoresist film is exposed via a main mask, a resist pattern is formed by exposing a sub mask(s). The main mask has a pattern light-shielding part that is commonly used for forming a pattern in each pattern layer, and each main light-shielding part for forming each overlay patter; and a sub mask has an opening part that is exposable to an unexposed region(s) within an overlay pattern formation region other than an unexposed region(s) on the photoresist film, which has been light-shielded by the main light-shielding part for forming a corresponding overlay pattern. This enables forming an overlay pattern that is high in position gap measurement accuracy in a direction orthogonal to the lamination direction when manufacturing a pattern multilayer body.

Abstract translation: 一种用于制造具有多个图案层并且在每个图案层中形成图案的图案多层体的方法包括在覆盖图案形成区域内形成覆盖图案的步骤，并且在形成覆盖层的步骤中 形成光致抗蚀剂膜，并且在通过主掩模曝光光致抗蚀剂膜之后，通过暴露子掩模形成抗蚀剂图案。 主掩模具有通常用于在每个图案层中形成图案的图案遮光部分和用于形成每个覆盖图案的每个主遮光部分; 并且子掩模具有可暴露于除光致抗蚀剂膜上的未曝光区域之外的覆盖图案形成区域内的未曝光区域的开口部分，其被主遮光部分遮光 用于形成对应的覆盖图案。 由此，能够在制造图案层叠体时形成与层叠方向正交的方向上的位置间隙测定精度高的覆盖图形。

公开(公告)号：US20140268424A1

公开(公告)日：2014-09-18

申请号：US13845580

申请日：2013-03-18

Applicant: TDK Corporation

Inventor： Tatsuhiro NOJIMA ,  Ken FUJII

IPC: G11B5/39

CPC classification number: G11B5/3116 ,  G11B5/1871 ,  G11B5/3163 ,  G11B5/3903 ,  G11B5/3967 ,  Y10T29/49032 ,  Y10T29/49052

Abstract: Method for manufacturing a magnetic head includes providing a stopper layer on an upper surface of a main magnetic pole layer applying a magnetic flux to a recording medium via a first insulation layer, providing a second insulation layer on the upper surface of the first insulation layer to cover at least an entire surface of the stopper layer, covering an upper surface portion of the second insulation layer with a mask layer, forming a height difference portion by removing at least a first insulation layer portion not covered by the mask layer by etching to at least partially remove at least a stopper layer portion in a film thickness direction, and subsequently by removing the mask layer, forming a electrode film in the height difference portion, and forming a plating film, which is a magnetic shield for the main magnetic pole layer, on an upper surface of the electrode.

Abstract translation: 制造磁头的方法包括在主磁极层的上表面上设置阻挡层，该主磁极层通过第一绝缘层向记录介质施加磁通量，在第一绝缘层的上表面上提供第二绝缘层， 覆盖止挡层的至少整个表面，用掩模层覆盖第二绝缘层的上表面部分，通过蚀刻至少除去未被掩模层覆盖的第一绝缘层部分形成高度差部分 在膜厚方向上至少部分去除至少一个阻挡层部分，然后通过除去掩模层，在高差部分形成电极膜，并形成作为主磁极层的磁屏蔽的镀膜 ，在电极的上表面上。