公开(公告)号：US09128384B2

公开(公告)日：2015-09-08

申请号：US13673729

申请日：2012-11-09

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Yu Chao Lin ,  Chia-Hao Hsu ,  Kuo-Yu Wu ,  Chia-Jen Chen ,  Chao-Cheng Chen

IPC: H01L21/66 ,  H01L21/312 ,  G03F7/40 ,  G03F7/00 ,  G03F7/075 ,  G03F7/09 ,  G03F7/095 ,  H01L21/033 ,  H01L21/3213

CPC classification number: H01L22/12 ,  G03F7/0035 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/095 ,  G03F7/40 ,  G03F7/70633 ,  H01L21/0276 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/32139

Abstract: An embodiment of a method of forming a substrate pattern including forming a bottom layer and an overlying middle layer on the substrate. A photo resist pattern is formed on the middle layer. An etch coating layer is deposited on the photo resist pattern. The etch coating layer and the photo resist pattern are used as a masking element to pattern at least one of the middle layer and the bottom layer. The substrate is etched to form the substrate pattern using the at least one of the patterned middle layer and the patterned bottom layer as a masking element. The substrate pattern may be used as an element of an overlay measurement process.

Abstract translation: 一种形成衬底图案的方法的实施例，包括在衬底上形成底层和上覆中间层。 在中间层上形成光刻胶图形。 蚀刻涂层沉积在光刻胶图案上。 蚀刻涂层和光刻胶图案用作屏蔽元件以图案化中间层和底层中的至少一个。 使用图案化中间层和图案化底层中的至少一个作为掩模元件来蚀刻衬底以形成衬底图案。 衬底图案可以用作覆盖测量过程的元件。

公开(公告)号：US11894404B2

公开(公告)日：2024-02-06

申请号：US17824952

申请日：2022-05-26

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Yun-Hao Chen ,  Kuo-Yu Wu ,  Tse-Hua Lu

IPC: H01L27/146

CPC classification number: H01L27/14621 ,  H01L27/1463 ,  H01L27/14603 ,  H01L27/14645

Abstract: The present disclosure provides an optical structure and a method for fabricating an optical structure, the method includes forming a light detection region in a substrate, forming an isolation structure at surrounding the light detection region, and forming a primary grid over the isolation structure, including forming a metal layer over the isolation structure, forming a first dielectric layer over the metal layer, and partially removing the metal layer and the first dielectric layer with a first mask by patterning, and forming a secondary grid at least partially surrounded by the primary grid laterally.

公开(公告)号：US11848339B2

公开(公告)日：2023-12-19

申请号：US17206572

申请日：2021-03-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzung-Yi Tsai ,  Kuo-Yu Wu ,  Tse-Hua Lu

IPC: H01L27/146 ,  H01L21/762

CPC classification number: H01L27/14609 ,  H01L21/76224

Abstract: A semiconductor structure includes a semiconductor substrate, an image sensor, and an isolation structure. The isolation structure is adjacent to the image sensor and disposed in the semiconductor substrate. The isolation structure includes a first oxide layer, a second oxide layer over the first oxide layer, and a charge-trapping layer disposed between the first oxide layer and the second oxide layer. The charge-trapping layer includes a material different from those of the first oxide layer and the second oxide layer.

公开(公告)号：US09373552B2

公开(公告)日：2016-06-21

申请号：US14835140

申请日：2015-08-25

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Yu Chao Lin ,  Chia-Hao Hsu ,  Kuo-Yu Wu ,  Chia-Jen Chen ,  Chao-Cheng Chen

IPC: H01L21/66 ,  G03F7/20 ,  H01L21/033 ,  G03F7/00 ,  G03F7/075 ,  G03F7/09 ,  G03F7/095 ,  G03F7/40 ,  H01L21/027 ,  H01L21/311 ,  H01L21/3213

CPC classification number: H01L22/12 ,  G03F7/0035 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/095 ,  G03F7/40 ,  G03F7/70633 ,  H01L21/0276 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/32139

Abstract: A method of calibrating or monitoring an exposing tool including forming a substrate pattern in a substrate, wherein forming the substrate pattern includes providing a first patterned photo resist layer having an etch coating layer disposed thereon and using the first patterned photo resist layer and the etch coating layer to pattern an underlying layer. The patterned underlying layer is then used as a masking element when etching the substrate pattern into the substrate. A second photo resist pattern is formed over the substrate pattern. An overlay measurement is executed of the second photo resist pattern to the substrate pattern.

Abstract translation: 一种校准或监测曝光工具的方法，包括在衬底中形成衬底图案，其中形成衬底图案包括提供其上设置有蚀刻涂层的第一图案化光刻胶层，并使用第一图案化光刻胶层和蚀刻涂层 层来模拟底层。 然后，当将衬底图案蚀刻到衬底中时，将图案化的底层用作掩模元件。 第二光刻胶图案形成在衬底图案上。 对基板图案执行第二光刻胶图案的覆盖测量。

公开(公告)号：US11348958B2

公开(公告)日：2022-05-31

申请号：US16414498

申请日：2019-05-16

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Yun-Hao Chen ,  Kuo-Yu Wu ,  Tse-Hua Lu

IPC: H01L27/146

Abstract: The present disclosure provides an optical structure, including a substrate, a light detection region in the substrate, an isolation structure in the substrate, surrounding the light detection region, a color filter layer over the substrate, and a dielectric grid structure in the color filter layer, the dielectric grid structure overlapping with the light detection region.

公开(公告)号：US20150364383A1

公开(公告)日：2015-12-17

申请号：US14835140

申请日：2015-08-25

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Yu Chao Lin ,  Chia-Hao Hsu ,  Kuo-Yu Wu ,  Chia-Jen Chen ,  Chao-Cheng Chen

IPC: H01L21/66 ,  H01L21/311 ,  H01L21/027 ,  H01L21/033

CPC classification number: H01L22/12 ,  G03F7/0035 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/095 ,  G03F7/40 ,  G03F7/70633 ,  H01L21/0276 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/32139

Abstract: A method of calibrating or monitoring an exposing tool including forming a substrate pattern in a substrate, wherein forming the substrate pattern includes providing a first patterned photo resist layer having an etch coating layer disposed thereon and using the first patterned photo resist layer and the etch coating layer to pattern an underlying layer. The patterned underlying layer is then used as a masking element when etching the substrate pattern into the substrate. A second photo resist pattern is formed over the substrate pattern. An overlay measurement is executed of the second photo resist pattern to the substrate pattern.

Abstract translation: 一种校准或监测曝光工具的方法，包括在衬底中形成衬底图案，其中形成衬底图案包括提供其上设置有蚀刻涂层的第一图案化光刻胶层，并使用第一图案化光刻胶层和蚀刻涂层 层来模拟底层。 然后，当将衬底图案蚀刻到衬底中时，将图案化的底层用作掩模元件。 第二光刻胶图案形成在衬底图案上。 对基板图案执行第二光刻胶图案的覆盖测量。