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公开(公告)号：US08470125B2
公开(公告)日：2013-06-25
申请号：US13246614
申请日：2011-09-27
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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公开(公告)号：US20090221223A1
公开(公告)日：2009-09-03
申请号：US12427642
申请日：2009-04-21
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
IPC: B24B41/06
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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公开(公告)号：US07534364B2
公开(公告)日：2009-05-19
申请号：US10826185
申请日：2004-04-15
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
Abstract: A substrate is maintained beneath a substrate mounting surface with a retaining ring that includes a generally annular lower portion having a bottom surface for contacting the polishing surface during polishing, and a generally annular upper portion having a bottom surface joined to the lower portion and a top surface fixed to and abutting the base. The lower portion is made of a plastic and the upper lower portion is made of a metal which is more rigid than the plastic.
Abstract translation: 衬底被保持在衬底安装表面下方，其具有保持环，保持环包括大体上环形的下部，其具有用于在抛光期间接触抛光表面的底表面，以及大致环形的上部，其具有连接到下部的底面， 表面固定到基座上并邻接基座。 下部由塑料制成，上部的上部由比塑料更硬的金属制成。
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公开(公告)号：US20120325395A1
公开(公告)日：2012-12-27
申请号：US13603876
申请日：2012-09-05
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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公开(公告)号：US08029640B2
公开(公告)日：2011-10-04
申请号：US12427642
申请日：2009-04-21
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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Patent Agency Ranking
公开(公告)号：US20130276979A1
公开(公告)日：2013-10-24
申请号：US13917250
申请日：2013-06-13
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
IPC: B24B41/06
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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公开(公告)号：US20120018093A1
公开(公告)日：2012-01-26
申请号：US13246614
申请日：2011-09-27
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
IPC: C23F1/08
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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公开(公告)号：US06913518B2
公开(公告)日：2005-07-05
申请号：US10430912
申请日：2003-05-06
Applicant: Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Thomas H. Osterheld , Sen-Hou Ko , Mohsen Salek
Inventor： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Thomas H. Osterheld , Sen-Hou Ko , Mohsen Salek
IPC: B24B37/16 , B24B41/047 , B24B7/22
CPC classification number: B24B37/16
Abstract: A platen for chemical mechanical polishing of a substrate includes a surface upon which a polishing pad can be placed, a support structure, and a controller. The surface has a first region and a second region and is operable to exert force against the polishing pad during polishing. The support structure is located beneath the second region and is operable to cause the second region to exert more force than the first region. The controller is operable to adjust the amount of force that is exerted by the second region.
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9.发明授权Carrier head with a multilayer retaining ring for chemical mechanical polishing 失效带有多层固定环的载体头用于化学机械抛光公开(公告)号：US06251215B1
公开(公告)日：2001-06-26
申请号：US09090679
申请日：1998-06-03
Applicant: Steven M. Zuniga , Thomas H. Osterheld , Lawrence M. Rosenberg
Inventor： Steven M. Zuniga , Thomas H. Osterheld , Lawrence M. Rosenberg
IPC: B24B500
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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公开(公告)号：US08486220B2
公开(公告)日：2013-07-16
申请号：US13603876
申请日：2012-09-05
Applicant: Steven M. Zuniga , Thomas H. Osterheld
Inventor： Steven M. Zuniga , Thomas H. Osterheld
Abstract: A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Abstract translation: 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。
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