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公开(公告)号：US4421843A
公开(公告)日：1983-12-20
申请号：US455910
申请日：1983-01-06
申请人： Shuzo Hattori , Shinzo Morita , Tsuneo Fujii
发明人： Shuzo Hattori , Shinzo Morita , Tsuneo Fujii
摘要： A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment. The pattern formation by electron beam delineation is promoted by heat treating the delineated film at a temperature not less than the glass transition temperature of the polymer under reduced pressure or by treating the delineated film with hydrogen or an inert gas plasma.
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2.发明授权Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film 失效在基材上形成丙烯酸氟烷基酯聚合物的膜和从膜制备图案化抗蚀剂的方法
公开(公告)号：US4421842A
公开(公告)日：1983-12-20
申请号：US455909
申请日：1983-01-06
申请人： Shuzo Hattori , Shinzo Morita , Tsuneo Fujii
发明人： Shuzo Hattori , Shinzo Morita , Tsuneo Fujii
摘要： A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment. The pattern formation by electron beam delineation is promoted by heat treating the delineated film at a temperature not less than the glass transition temperature of the polymer under reduced pressure or by treating the delineated film with hydrogen or an inert gas plasma.
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3.发明授权Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film 失效在基材上形成丙烯酸氟烷基酯聚合物的膜和从膜制备图案化抗蚀剂的方法
公开(公告)号：US4382985A
公开(公告)日：1983-05-10
申请号：US310407
申请日：1981-10-09
申请人： Shuzo Hattori , Shinzo Morita , Tsuneo Fujii
发明人： Shuzo Hattori , Shinzo Morita , Tsuneo Fujii
摘要： A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment. The pattern formation by electron beam delineation is promoted by heat treating the delineated film at a temperature not less than the glass transition temperature of the polymer under reduced pressure or by treating the delineated film with hydrogen or an inert gas plasma.
摘要翻译： 通过等离子体聚合在基材上形成丙烯酸氟烷基酯聚合物膜的方法。 氟烷基丙烯酸酯聚合物膜对高能量射线具有高灵敏度并具有优异的分辨能力，并且作为抗蚀剂膜是非常有用的。 本发明的等离子体聚合膜具有很少的针孔，并且能耐干蚀刻。 通过用高能射线照射薄膜以形成潜在图案并通过使用溶剂或含氧或含氧气体等离子体蚀刻的湿法显影潜像，来制备图案化的抗蚀剂膜。 此外，仅通过电子束照射可以在膜中形成图案。 图案形成可以通过没有显影处理的电子束描绘来实现。 通过电子束描绘的图案形成通过在不低于聚合物的玻璃化转变温度的温度下在减压下热处理所描绘的膜或通过用氢气或惰性气体等离子体处理所描绘的膜来促进。
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4.发明授权Fluoroalkyl acrylate resist material and process for forming fine resist pattern 失效氟烷基丙烯酸酯抗蚀剂材料和形成精细抗蚀剂图案的方法
公开(公告)号：US4686168A
公开(公告)日：1987-08-11
申请号：US710190
申请日：1985-03-11
申请人： Tsuneo Fujii , Hiroshi Inukai , Takayuki Deguchi , Toshihiko Amano , Masami Kakuchi , Hiroshi Asakawa , Osamu Kogure
发明人： Tsuneo Fujii , Hiroshi Inukai , Takayuki Deguchi , Toshihiko Amano , Masami Kakuchi , Hiroshi Asakawa , Osamu Kogure
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
摘要： A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.
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公开(公告)号：US5720806A
公开(公告)日：1998-02-24
申请号：US722830
申请日：1996-09-27
申请人： Tsuneo Fujii , Hiroshi Tonoike , Daisaku Isomura
发明人： Tsuneo Fujii , Hiroshi Tonoike , Daisaku Isomura
CPC分类号： C09C1/30 , B41M5/52 , B41M5/5218 , C01P2002/02 , C01P2004/51 , C01P2004/61 , C01P2006/12 , C01P2006/16 , C01P2006/19 , C01P2006/22
摘要： The invention provides a filler for ink jet recording paper which is composed of an amorphous silica containing 0.3-1.0% by weight of Al.sub.2 O.sub.3 and having a BET specific surface area of 250-400 m.sup.2 /g, a mean particle size of 3.6-10.0 .mu.m and a peak position of pore radius as measured by mercury injection method of 37.5-75 angstrom. A coat layer of ink jet recording paper formed of this filler excels not only in true circle property of dots and ink absorbing property when printed by ink jet recording system, but also in surface strength and writing quality. Furthermore, the coating liquid containing this filler has a low viscosity and hence exhibits good coating workability.
摘要翻译： 本发明提供一种喷墨记录纸用填料，其由含有0.3〜1.0重量％的Al 2 O 3的无定形二氧化硅构成，BET比表面积为250〜400m 2 / g，平均粒径为3.6〜10.0μm m和通过汞注入法测量的孔半径的峰值位置为37.5-75埃。 由该填料形成的喷墨记录纸的涂层不仅在通过喷墨记录系统打印时不但具有点和油墨吸收性的真实圆特性，而且还具有表面强度和书写质量。 此外，含有该填料的涂布液的粘度低，因此具有良好的涂布加工性。
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6.发明授权External preparation of 2-amino-2-(2-(4-octylphenyl)ethyl) propane-1,3-diol or pharmaceutically acceptable salts thereof for topical administration 有权外部制备2-氨基-2-（2-（4-辛基苯基）乙基）丙烷-1,3-二醇或其药学上可接受的盐用于局部给药公开(公告)号：US06197829B1
公开(公告)日：2001-03-06
申请号：US09592550
申请日：2000-06-12
申请人： Tsuneo Fujii , Tadashi Mishina , Koji Teshima , Tomonori Imayoshi
发明人： Tsuneo Fujii , Tadashi Mishina , Koji Teshima , Tomonori Imayoshi
IPC分类号： A61K3324
CPC分类号： A61K31/137 , Y10S514/885 , Y10S514/886 , Y10S514/912 , Y10S514/946 , Y10S514/947 , Y10S514/966 , Y10S514/969
摘要： An external preparation for topical administration which aims at inhibiting rejection reactions at organ or bone marrow transplantation or treating autoimmune diseases or allergic diseases and contains as the active ingredient 2-amino-2-(2-(4-octylphenyl)ethyl)propane-1,3-diol or a pharmaceutically acceptable acid addition salt thereof.
摘要翻译： 用于局部给药的外用制剂，其旨在抑制器官或骨髓移植排斥反应或治疗自身免疫疾病或过敏性疾病，并含有作为活性成分的2-氨基-2-（2-（4-辛基苯基）乙基）丙烷-1 ，3-二醇或其药学上可接受的酸加成盐。
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公开(公告)号：US06476004B1
公开(公告)日：2002-11-05
申请号：US09231484
申请日：1999-01-14
申请人： Atsushi Sakai , Rumiko Masuda , Tsuneo Fujii , Tadashi Mishina , Kenji Chiba
发明人： Atsushi Sakai , Rumiko Masuda , Tsuneo Fujii , Tadashi Mishina , Kenji Chiba
IPC分类号： A61K31715
CPC分类号： B82Y5/00 , A61K9/0019 , A61K9/0048 , A61K9/08 , A61K31/135 , A61K31/137 , A61K47/26 , A61K47/40 , A61K47/6951
摘要： Medicinal compositions which can be processed into solutions and are useful in inhibiting rejection reactions against the transplantation of organs or bone marrow, in the maintenance immunotherapy therefor or in treating autoimmune diseases, characterized by containing 2-amino-2-[2-(4-octylphenyl)ethyl]propane-1,3-diol or pharmaceutically acceptable acid-addition salts thereof and cyclodextrins as a stabilizer optionally together with saccharides, if required.
摘要翻译： 可以加工成溶液并且可用于抑制针对器官或骨髓的移植的排斥反应的药物组合物，其维持性免疫治疗或治疗自身免疫性疾病，其特征在于含有2-氨基-2- [2-（4- 辛基苯基）乙基]丙烷-1,3-二醇或其药学上可接受的酸加成盐和作为稳定剂的环糊精，如果需要，可以与糖一起使用。
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公开(公告)号：US06329410B1
公开(公告)日：2001-12-11
申请号：US09582291
申请日：2000-06-23
申请人： Tsuneo Fujii , Toshihiro Baba
发明人： Tsuneo Fujii , Toshihiro Baba
IPC分类号： A61K3141
CPC分类号： A61K47/12 , A61K9/0019 , A61K31/4196 , A61K47/02 , A61K47/26
摘要： An aqueous liquid preparation, which has a pH of from 3 to 5 and comprises (R)-(−)-3-methyl-3-methyl -sulfonyl-1-(1H-1,2,4-triazol-1-yl)-2-[4-(trifluoromethyl)phenyl]butan-2-ol or a pharmaceutically acceptable salt thereof; and an injection for intravenous administration comprising the aqueous liquid preparation.
摘要翻译： 一种水性液体制剂，其pH为3至5，并且包含（R） - （ - ） - 3-甲基-3-甲基 - 磺酰基-1-（1H-1,2,4-三唑-1-基） ）-2- [4-（三氟甲基）苯基]丁-2-醇或其药学上可接受的盐; 和用于静脉内给药的注射剂，其包含含水液体制剂。
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公开(公告)号：US4656108A
公开(公告)日：1987-04-07
申请号：US746932
申请日：1985-06-20
申请人： Takaomi Satokawa , Tsuneo Fujii , Takayuki Deguchi
发明人： Takaomi Satokawa , Tsuneo Fujii , Takayuki Deguchi
CPC分类号： G03F7/039 , Y10T428/24306
摘要： A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.
摘要翻译： 由硫代羰基氟化物聚合物制成的抗蚀剂膜，其具有优异的灵敏度，分辨能力和对基材的粘合性能，并且可以提供精细的抗蚀剂图案。 通过在基板上形成抗蚀剂膜，照射电离辐射并用有机溶剂显影来制造抗蚀剂图案。
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10.发明授权Topical administration of 2-amino-2-(2-(4-octylphenyl)ethyl)propane-1,3-diol 失效2-氨基-2-（2-（4-辛基苯基）乙基）丙烷-1,3-二醇的局部给药
公开(公告)号：US6121329A
公开(公告)日：2000-09-19
申请号：US894728
申请日：1997-08-27
申请人： Tsuneo Fujii , Tadashi Mishina , Koji Teshima , Tomonori Imayoshi
发明人： Tsuneo Fujii , Tadashi Mishina , Koji Teshima , Tomonori Imayoshi
IPC分类号： A61K31/135 , A61K9/02 , A61K9/06 , A61K9/08 , A61K9/107 , A61K9/12 , A61K31/137 , A61P37/06 , A61P37/08 , A61K33/24 , A01N59/16
CPC分类号： A61K31/137 , Y10S514/885 , Y10S514/886 , Y10S514/912 , Y10S514/946 , Y10S514/947 , Y10S514/966 , Y10S514/969
摘要： An external preparation for topical administration which aims at inhibiting rejection reactions at organ or bone marrow transplantation or treating autoimmune diseases or allergic diseases and contains as the active ingredient 2-amino-2-(2-(4-octylphenyl)ethyl)propane-1,3-diol or a pharmaceutically acceptable acid addition salt thereof.
摘要翻译： PCT No.PCT / JP96 / 03757 Sec。 371日期1997年8月27日第 102（e）日期1997年8月27日PCT提交1996年12月24日PCT公布。 出版物WO97 / 24112 PCT 日期1997年7月10日为了抑制器官或骨髓移植排斥反应或治疗自身免疫性疾病或过敏性疾病的外用制剂，含有作为活性成分的2-氨基-2-（2-（4-辛基苯基） 乙基）丙烷-1,3-二醇或其药学上可接受的酸加成盐。
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