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公开(公告)号：US20230312351A1
公开(公告)日：2023-10-05
申请号：US18004342
申请日：2021-06-07
发明人： Akihiro HIRATE , Waichi YAMAMURA
CPC分类号： C01B32/21 , C23C16/32 , C01P2002/54
摘要： A carbide-coated carbon material including a base material containing carbon as a main component and chlorine, and a carbide layer containing a carbide as a main component and chlorine, the carbide layer being disposed on the base material. The base material has, near an interface between the base material and the carbide layer, a base material buffer region where a chlorine concentration continuously changes in a direction toward the carbide layer. The carbide layer has, near the interface between the base material and the carbide layer, a carbide layer buffer region where the chlorine concentration continuously changes in a direction toward the base material. The carbide-coated carbon material has sufficient adhesion strength in the interface between the carbide layer and the base material containing carbon as a main component.
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公开(公告)号：US20220170153A1
公开(公告)日：2022-06-02
申请号：US17670832
申请日：2022-02-14
发明人： Chikara MORI , Waichi YAMAMURA
IPC分类号： C23C16/458 , C23C16/26 , C23C16/32 , C23C16/30
摘要： The present invention relates to a chemical vapor deposition apparatus for forming a film on a surface of a substrate(6) held in a reaction container, wherein the reaction container includes a first holding member(4) that is capable of holding the substrate(6) and a second holding member(5) that is capable of holding the substrate(6) independently from the first holding member(4), and at least one holding member among the first holding member(4) and the second holding member(5) is movable in a vertical direction. In addition, a method of forming a film of the present invention includes a first step of holding a substrate(6) by a first holding member(4) to form a film on a surface of a substrate by chemical vapor deposition; a second step of moving at least one holding member among the first holding member(4) and the second holding member(5) in at least one direction of the upper direction and the lower direction to hold the substrate by the second holding member(5); and a third step of forming a film on the surface of the substrate(6) held by the second holding member(5) by the chemical vapor deposition. According to the present invention, there is provided a chemical vapor deposition apparatus and a method of forming a film which are capable of forming a film on the entire surface of a substrate by one film formation.
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3.发明公开公开(公告)号：US20230304148A1
公开(公告)日：2023-09-28
申请号：US18043371
申请日：2021-08-30
发明人： Shoji KANO , Waichi YAMAMURA
摘要： The present invention relates to a heat-resistant coat member packaged body including: a heat-resistant coat member formed by coating a substrate with a heat-resistant material; and a bag member that accommodates the heat-resistant coat member wherein the bag member has a water vapor permeability of 0.3 g/m2·day or less. The present invention also relates to a method for packaging a heat-resistant coat member, including packaging a heat-resistant coat member obtained by coating a substrate with a heat-resistant material with a bag member having a water vapor permeability of 0.3 g/m2·day or less. According to the present invention, it is possible to provide a heat-resistant coat member packaged body capable of obtaining a heat-resistant coat member in which peeling of a heat-resistant material coating a substrate can be suppressed even when heated after being stored for a long period of time, and a method for packaging the heat-resistant coat member.
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公开(公告)号：US20210140067A1
公开(公告)日：2021-05-13
申请号：US17149733
申请日：2021-01-15
发明人： Chikara MORI , Waichi YAMAMURA , Shoji KANO , Akihiro HIRATE
IPC分类号： C30B29/36 , C04B41/00 , C30B25/08 , C04B41/87 , C30B23/00 , C30B25/12 , C04B41/50 , C23C16/32 , C23C16/56
摘要： A member for an apparatus for manufacturing a semiconductor single crystal having long product life and a tantalum carbide coated carbon material are provided. The tantalum carbide coated carbon material according to the present invention is a tantalum carbide coated carbon material in which at least a part of a surface of a carbon base material is coated with a tantalum carbide coated film containing tantalum carbide as a main component, in which in the tantalum carbide coated film, an intensity of an X-ray diffraction line corresponding to a plane with respect to an out-of-plane direction is larger than intensities of X-ray diffraction lines corresponding to other crystal planes, and the intensity ratio is 60% or more with respect to a sum of intensities of X-ray diffraction lines corresponding to all crystal planes.
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公开(公告)号：US20190169768A1
公开(公告)日：2019-06-06
申请号：US16208482
申请日：2018-12-03
发明人： Chikara MORI , Waichi YAMAMURA , Shoji KANO , Akihiro HIRATE
摘要： A member for an apparatus for manufacturing a semiconductor single crystal having long product life and a tantalum carbide coated carbon material are provided. The tantalum carbide coated carbon material according to the present invention is a tantalum carbide coated carbon material in which at least a part of a surface of a carbon base material is coated with a tantalum carbide coated film containing tantalum carbide as a main component, in which in the tantalum carbide coated film, an intensity of an X-ray diffraction line corresponding to a plane with respect to an out-of-plane direction is larger than intensities of X-ray diffraction lines corresponding to other crystal planes, and the intensity ratio is 60% or more with respect to a sum of intensities of X-ray diffraction lines corresponding to all crystal planes.
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