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1.发明申请SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOMASK BLANK, AND PHOTOMASK BLANK 审中-公开溅射沉积方法，溅射系统，光电隔离层的制造和光电隔离公开(公告)号：US20150159264A1
公开(公告)日：2015-06-11
申请号：US14561311
申请日：2014-12-05
发明人： Kouhei SASAMOTO , Souichi FUKAYA , Hideo NAKAGAWA , Yukio INAZUKI
CPC分类号： C23C14/3464 , C23C14/0676 , C23C14/352 , G03F1/68 , H01J37/3417 , H01J37/3441 , H01J37/3447
摘要： A film is sputter deposited on a substrate by providing a vacuum chamber (3) with first and second targets (1, 2) such that the sputter surfaces (11, 21) of the first and second targets (1, 2) may face the substrate (5) and be arranged parallel or oblique to each other, simultaneously supplying electric powers to the first and second targets (1, 2), and depositing sputtered particles on the substrate while controlling sputtering conditions such that the rate at which sputtered particles ejected from one target reach the sputter surface of the other target and deposit thereon is not more than the rate at which the sputtered particles are removed from the other target by sputtering.
摘要翻译： 通过向第一和第二靶（1,2）提供具有第一和第二靶（1,2）的真空室（3），将薄膜溅射沉积在基底上，使得第一和第二靶（1,2）的溅射表面（11,21）可面向 基板（5）并且彼此平行或倾斜地布置，同时向第一和第二靶材（1,2）提供电力，并且在溅射条件下沉积溅射的颗粒，使得溅射的颗粒的速度 从一个靶到达另一个靶的溅射表面并沉积在其上不超过通过溅射将溅射的颗粒从另一靶移除的速率。
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公开(公告)号：US20230387084A1
公开(公告)日：2023-11-30
申请号：US18031735
申请日：2021-09-27
IPC分类号： H01L25/075 , H01L21/66 , H01L21/683
CPC分类号： H01L25/0753 , H01L22/22 , H01L21/6835 , H01L33/0093
摘要： A method for producing a light emitting diode supply substrate for transferring a plurality of light emitting diodes to a supply destination, including: a first mounting step of mounting a plurality of light emitting diodes on a supply substrate; a selective removal step of selectively removing defective light emitting diodes on the supply substrate, and a second mounting step of transferring a normal light emitting diode to a position where the defective light emitting diode has been arranged on the supply substrate. Thus, a method produces a light emitting diode supply substrate capable of producing a light emitting diode supply substrate capable of transferring a plurality of normal light emitting diodes to a supply destination.
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公开(公告)号：US20240047243A1
公开(公告)日：2024-02-08
申请号：US18267201
申请日：2021-11-16
发明人： Hideo NAKAGAWA , Yoshinori OGAWA , Toshiyuki OZAI
IPC分类号： H01L21/67
CPC分类号： H01L21/67144
摘要： A microstructure-transfer stamp component including a substrate and a silicone-based rubber film formed on the substrate, wherein a surface of the silicone-based rubber film facing away from the substrate has one or more recesses each being closed except for a surface opening. This provides a microstructure-transfer stamp component that can optimize temporary adhesive strength of the surface of the silicone-based rubber film stamp in a short period of time.
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公开(公告)号：US20160216603A1
公开(公告)日：2016-07-28
申请号：US14917748
申请日：2014-07-24
发明人： Tsutomu SUZUKI , Shinichi OHORI , Ryuji KOITABASHI , Hideo NAKAGAWA , Takuro KOSAKA , Takahiro KISHITA , Hiroshi FUKUDA
IPC分类号： G03F1/66 , H01L21/673
CPC分类号： G03F1/66 , H01L21/67359 , H01L21/67393
摘要： The purpose of the present invention is to further reliably reduce the contamination of photomask blanks due to the adherence of the dust and particles generated during the storage, transportation, or operation of the container while suppressing the effect on a resist pattern, thereby improving the quality and yield of the photomask blanks. The present invention pertains to a container (1) for storing photomask blanks that stores, transports, or safeguards photomask blanks (2), wherein at least one of the components is constituted by a thermoplastic resin where the amount of caprolactam measured by the dynamic head space method when kept for 60 minutes at 40° C. is 0.01 ppm or less n-decane conversion amount per resin weight, and the surface resistance value is no more than 1.0E+13 ohms.
摘要翻译： 本发明的目的是为了进一步可靠地减少由于在容器的储存，运输或操作期间产生的灰尘和颗粒的粘附，同时抑制对抗蚀剂图案的影响，从而提高质量，从而可靠地减少光掩模坯料的污染 和光掩模坯料的产率。 本发明涉及一种用于储存，运输或保护光掩模坯料（2）的光掩模坯料的容器（1），其中至少一个部件由热塑性树脂构成，其中由动态头测量的己内酰胺的量 在40℃下保持60分钟时的空间法为每个树脂重量为0.01ppm以下的正癸烷转化量，表面电阻值不大于1.0E + 13欧姆。
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5.发明公开公开(公告)号：US20240191036A1
公开(公告)日：2024-06-13
申请号：US18554444
申请日：2022-04-08
发明人： Yoshiro KANEKO , Hideo NAKAGAWA , Toshiyuki OZAI , Takashi AKETA
IPC分类号： C08G77/26 , C09J183/08
CPC分类号： C08G77/26 , C09J183/08 , C08G2170/00
摘要： To provide an adhesive capable of realizing adhesion excellent in shear strength and impact resistance, a polysiloxane composition usable as a component contained in the adhesive, and respective methods for producing the adhesive and the polysiloxane composition. The polysiloxane composition is a copolymer of an adhesive monomer unit A including an organosiloxane unit containing a substituent RA2 containing a catechol group, and a flexible monomer unit B including an organosiloxane unit containing no catechol group.
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公开(公告)号：US20240117226A1
公开(公告)日：2024-04-11
申请号：US18237950
申请日：2023-08-25
发明人： Takayuki KUSUNOKI , Masao ANDO , Nobuhiro ICHIROKU , Hideo NAKAGAWA , Atsushi WAKAMIYA , Yuko MATSUSHIGE
IPC分类号： C09J163/10 , C09J11/06
CPC分类号： C09J163/10 , C09J11/06 , C09J2301/312 , C09J2301/408
摘要： An adhesive composition, including: a reaction product (A) among a bifunctional epoxy resin represented by the formula (2), a tri- or more functional epoxy resin represented by the formula (3), and a saturated acid anhydride represented by the following general formula (4); a UV-sensitive reaction initiator (B); and a dilution solvent (C), wherein the component (A) is a compound represented by the formula (1), a ratio of a total mole of epoxy groups in the multi-functional epoxy resin to a mole of the saturated acid anhydride is 1.30 to 3.00, and a mole of the bifunctional epoxy resin relative to a total mole of the multi-functional epoxy resin is 0.001 to 0.15. This provides a highly reliable epoxy-resin-based adhesive composition and film-shaped sealing material having a low viscosity, curability at low temperature, and high adhesiveness, and retaining power generation performance of a perovskite solar cell before and after sealing.
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公开(公告)号：US20220124949A1
公开(公告)日：2022-04-21
申请号：US17427437
申请日：2019-12-10
发明人： Hideo NAKAGAWA , Yoshinori OGAWA , Nobuaki MATSUMOTO , Shuhei UEDA , Keiji OHORI , Kohei OTAKE
摘要： A stamp head unit including: a stamp component including at least a silicone-based rubber film on a quartz glass substrate; a stamp-component-holding component including a surface having a hole for vacuum suction of a surface of the quartz glass substrate of the stamp component; and a tubular component having an evacuation suction hole connected to communicate with the hole for vacuum suction so as to maintain a vacuum, and being coupled and fixed with the stamp-component-holding component. This provides: a stamp component that can be fixed stably by a simple and convenient vacuum chuck system; a stamp head unit with which the stamp component can be replaced in a short time; and a microstructure-transfer apparatus provided with the stamp component and the stamp head unit.
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公开(公告)号：US20150160549A1
公开(公告)日：2015-06-11
申请号：US14561301
申请日：2014-12-05
发明人： Kouhei SASAMOTO , Yukio INAZUKI , Souichi FUKAYA , Hideo NAKAGAWA , Hideo KANEKO
IPC分类号： G03F1/46
摘要： A photomask blank comprising a transparent substrate and a chromium-containing film deposited thereon is provided. The chromium-containing film comprises at least one CrC compound layer comprising up to 50 at % of Cr, at least 25 at % of O and/or N, and at least 5 at % of C. From the blank, a photomask having a photomask pattern formed on the substrate is produced, the photomask being used in photolithography of forming a resist pattern with a line width of up to 0.1 μm, using exposure light having a wavelength of up to 250 nm.
摘要翻译： 提供一种包含透明基材和沉积在其上的含铬膜的光掩模坯料。 含铬膜包含至少一种CrC化合物层，其包含至多50原子％的Cr，至少25原子％的O和/或N，以及至少5原子％的C。从该坯料中， 制造形成在基板上的光掩模图案，光掩模用于使用波长高达250nm的曝光光形成线宽度高达0.1μm的抗蚀剂图案的光刻中。
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