公开(公告)号：US11508929B2

公开(公告)日：2022-11-22

申请号：US16505710

申请日：2019-07-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dongjin Yun ,  Sunghoon Park ,  Seong Heon Kim ,  Hyangsook Lee ,  Woon Jung Paek ,  Youngnam Kwon ,  Yongsu Kim ,  Jaegwan Chung

IPC: H01L23/52 ,  H01L51/52 ,  H01L21/3213 ,  H01L51/00 ,  H01B1/22 ,  H01L51/56 ,  B05D3/00

Abstract: A conductor includes a plurality of metal nanostructures and an organic material, where a portion of the organic material surrounding each of the metal nanostructures is selectively removed, and the conductor has a haze of less than or equal to about 1.1, a light transmittance of greater than or equal to about 85% at about 550 nm, and a sheet resistance of less than or equal to about 100 Ω/sq. An electronic device includes the conductor, and a method of manufacturing a conductor includes preparing a conductive film including a metal nanostructure and an organic material, and selectively removing the organic material from the conductive film using a cluster ion beam sputtering.

公开(公告)号：US10392518B2

公开(公告)日：2019-08-27

申请号：US15499376

申请日：2017-04-27

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  FOUNDATION OF SOONGSIL UNIVERSITY-INDUSTRY COOPERATION

Inventor： Kunmo Chu ,  Byonggwon Song ,  Sunghoon Park ,  Kiyeon Yang ,  Changseung Lee

IPC: H01B1/22 ,  C09D5/24 ,  C09D7/40 ,  C09D7/61 ,  C09D183/04 ,  H01L23/00 ,  C09D11/52 ,  H01R13/24 ,  H01B1/24 ,  H05K1/09 ,  H01L23/498 ,  H01L21/48 ,  C08K3/04 ,  C08K3/08 ,  C08K3/10 ,  H05K1/02 ,  H05K1/18

Abstract: Provided are a paste material, a method of forming the paste material, a wiring member formed from the paste material, and an electronic device including the wiring member. The paste material may include a plurality of liquid metal particles and a polymer binder. The paste material may further include a plurality of nanofillers. At least some of the plurality of nanofillers may each have an aspect ratio equal to or greater than about 3. A content of the plurality of liquid metal particles may be greater than a content of the polymer binder and may be greater than a content of the plurality of nanofillers. The wiring member may be formed by using the paste material, and the wiring member may be used in various electronic devices.

公开(公告)号：US11892767B2

公开(公告)日：2024-02-06

申请号：US17211165

申请日：2021-03-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byungchul Yoo ,  Sunghoon Park ,  Mun Ja Kim

IPC: G03F1/22 ,  G03F7/00

CPC classification number: G03F1/22 ,  G03F7/70983

Abstract: A stud attachment device for attaching a plurality of studs to a photomask constituting a reticle. The stud attachment device including a body; a plurality of holders extending from the body, the holders allowing the studs to be laid thereon, respectively; and a pressure regulator for independently controlling pressures of the holders when the studs are attached to the photomask.

公开(公告)号：US20250164894A1

公开(公告)日：2025-05-22

申请号：US18952436

申请日：2024-11-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunghoon Park ,  Junesik Hwang

IPC: G03F7/00

Abstract: A method of correcting a registration error of a mask includes: performing a test exposure using an exposure apparatus; extracting registration error data according to a dose difference of beams in a preset process condition, through the test exposure; providing a dose map for a pattern area of the mask; and generating a correction map using the dose map and the registration error data.

公开(公告)号：US09588415B2

公开(公告)日：2017-03-07

申请号：US14590145

申请日：2015-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukjong Bae ,  Jin Choi ,  Sunghoon Park

IPC: G03F1/56 ,  G03F1/70 ,  G03F7/20

CPC classification number: G03F1/56 ,  G03F1/70 ,  G03F7/2063 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/31766 ,  H01J2237/31776

Abstract: An exposure system includes a data processing part that forms an exposure layout and an exposure part that irradiates an electron beam at a photoresist layer according to the exposure layout. The data processing part generates a control parameter for driving the exposure part without a pattern position error and a beam drift error and to prevent a discrepancy between the exposure layout and a mask layout to be formed in the photoresist layer. A controlling part controls the exposure part according to the control parameter.

Abstract translation: 曝光系统包括形成曝光布局的数据处理部分和根据曝光布局在光致抗蚀剂层处照射电子束的曝光部分。 数据处理部分产生用于驱动曝光部分的控制参数，而没有图案位置误差和光束偏移误差，并且防止在光致抗蚀剂层中形成曝光布局和掩模布局之间的差异。 控制部根据控制参数控制曝光部。

公开(公告)号：US20150355547A1

公开(公告)日：2015-12-10

申请号：US14590145

申请日：2015-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukjong Bae ,  Jin Choi ,  Sunghoon Park

IPC: G03F7/20

CPC classification number: G03F1/56 ,  G03F1/70 ,  G03F7/2063 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/31766 ,  H01J2237/31776

Abstract: Provided are an exposure system and methods of performing exposing and patterning processes using the same. The exposure system may include a data processing part that forms an exposure layout; and an exposure part that irradiates an electron beam at a photoresist layer according to the exposure layout. The data processing part is constructed and arranged to generate a control parameter for driving the exposure part without a pattern position error and a beam drift error and to prevent a discrepancy between the exposure layout and a mask layout to be formed in the photoresist layer. The exposure system further includes a controlling part that controls the exposure part according to the control parameter.

Abstract translation: 提供一种曝光系统和使用其的曝光和图案化处理的方法。 曝光系统可以包括形成曝光布局的数据处理部分; 以及根据曝光布局在光致抗蚀剂层照射电子束的曝光部。 数据处理部分被构造和布置成产生用于驱动曝光部分的控制参数，而没有图案位置误差和光束偏移误差，并且防止在光致抗蚀剂层中形成曝光布局和掩模布局之间的差异。 曝光系统还包括根据控制参数控制曝光部分的控制部分。