公开(公告)号：US20240304420A1

公开(公告)日：2024-09-12

申请号：US18344307

申请日：2023-06-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Siyoung Koh ,  Hadong Jin ,  Namkyun Kim ,  Seungbo Shim ,  Sungyong Lim ,  Sungyeol Kim

IPC: H01J37/32 ,  G01R27/16

CPC classification number: H01J37/32183 ,  G01R27/16 ,  H01J37/32926 ,  H01J37/32935

Abstract: An apparatus for providing radio frequency (RF) power includes a load having a process chamber, a RF power generator configured to provide the RF power through a cable electrically connected to the load, and a reflected power controller configured to detect reflected power from the load in a delivery mode and configured to control the RF power according to the reflected power that was detected.

公开(公告)号：US20250132133A1

公开(公告)日：2025-04-24

申请号：US18640999

申请日：2024-04-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jisoo Im ,  Dongwan Kim ,  Minsung Kim ,  Siyoung Koh ,  Younseon Wang ,  Junho Im

IPC: H01J37/32 ,  H01J37/08

Abstract: A substrate processing apparatus comprises a process chamber, a stage in the process chamber, the stage supporting a substrate, and a grid in the process chamber and upwardly spaced apart from the stage. The grid includes a dielectric plate having a central axis that extends in a first direction, a first electrode plate embedded in the dielectric plate, a second electrode plate downwardly spaced apart from the first electrode plate and embedded in the dielectric plate, and a third electrode plate downwardly spaced apart from the second electrode plate and embedded in the dielectric plate.