METHOD OF RECYCLING HELIUM FROM WASTE GAS IN SEMICONDUCTOR PROCESS

    公开(公告)号:US20250122079A1

    公开(公告)日:2025-04-17

    申请号:US18677245

    申请日:2024-05-29

    Abstract: A method of recycling helium from a waste gas generated in a semiconductor process includes forming a first treatment gas by treating helium-containing waste gas emitted from a semiconductor process facility by using a scrubber module, transporting the first treatment gas to a purification facility, forming a first helium gas with a first purity by fractionating the first treatment gas in the purification facility, forming a second helium gas with a second purity by treating the first helium gas by using a back-end purification module in the purification facility, and providing the second helium gas to the semiconductor process facility.

Patent Agency Ranking