APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20200299829A1

    公开(公告)日:2020-09-24

    申请号:US16714344

    申请日:2019-12-13

    Abstract: Disclosed are an apparatus for and a method of manufacturing a semiconductor device, The apparatus includes a chamber, an evaporator that evaporates an organic source to provide a source gas on a substrate in the chamber, a vacuum pump that pumps the source gas and air from the chamber, an exhaust line between the vacuum, pump and the chamber, and an analyzer connected to the exhaust line. The analyzer detects a derived molecule produced from the organic source and determines a replacement time of the evaporator.

    IMAGE SENSOR AND FABRICATION METHOD OF THE SAME

    公开(公告)号:US20250126916A1

    公开(公告)日:2025-04-17

    申请号:US18650969

    申请日:2024-04-30

    Abstract: An image sensor is provided. The image sensor includes: a plurality of pixels; a semiconductor substrate including a first surface and a second surface opposing the first surface; a device isolation layer provided in a trench penetrating through the first surface and the second surface of the semiconductor substrate, and separating the plurality of pixels from each other; and a microlens provided on the second surface. The device isolation layer includes: a buried insulating pattern penetrating through the first surface and the second surface; an insulating liner between the buried insulating pattern and the semiconductor substrate; a conductive liner between the insulating liner and the buried insulating pattern; and a buried conductive pattern provided on at least a portion of the buried insulating pattern and contacting the conductive liner.

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