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公开(公告)号:US20190198497A1
公开(公告)日:2019-06-27
申请号:US16288727
申请日:2019-02-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jung-han LEE , Sun-ghil LEE , Myung-il KANG , Jeong-yun LEE , Seung-hun LEE , Hyun-jung LEE , Sun-wook KIM
IPC: H01L27/088 , H01L27/11 , H01L29/06 , H01L21/8234 , H01L27/02
Abstract: An integrated circuit (IC) device includes a first and a second fin-type active region protruding from a first region and a second region, respectively, of a substrate, a first and a second gate line, and a first and a second source/drain region. The first fin-type active region has a first top surface and a first recess has a first depth from the first top surface. The first source/drain region fills the first recess and has a first width. The second fin-type active region has a second top surface and a second recess has a second depth from the second top surface. The second depth is greater than the first depth. The second source/drain region fills the second recess and has a second width. The second width is greater than the first width.
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公开(公告)号:US20180182756A1
公开(公告)日:2018-06-28
申请号:US15656377
申请日:2017-07-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jung-han LEE , Sun-ghil Lee , Myung-il Kang , Jeong-yun Lee , Seung-hun Lee , Hyun-jung Lee , Sun-wook Kim
IPC: H01L27/088 , H01L29/06 , H01L27/11
CPC classification number: H01L27/0886 , H01L21/823418 , H01L27/0207 , H01L27/1104 , H01L27/1116 , H01L29/0649
Abstract: An integrated circuit (IC) device includes a first and a second fin-type active region protruding from a first region and a second region, respectively, of a substrate, a first and a second gate line, and a first and a second source/drain region. The first fin-type active region has a first top surface and a first recess has a first depth from the first top surface. The first source/drain region fills the first recess and has a first width. The second fin-type active region has a second top surface and a second recess has a second depth from the second top surface. The second depth is greater than the first depth. The second source/drain region fills the second recess and has a second width. The second width is greater than the first width.
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