公开(公告)号：US20190228120A1

公开(公告)日：2019-07-25

申请号：US16127692

申请日：2018-09-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Yub Ie ,  Jung Geun Jee ,  Sung Youn Chung ,  Jae Myung Choe

IPC: G06F17/50 ,  C23C16/455

Abstract: An apparatus for generating 3D shape data of a showerhead includes: a data processor that generates data sets comprising information indicating values of a first distance between an upper surface of a wafer and a showerhead, information indicating positions on the wafer and information about a fluid flow physical quantity value and determines a function representing a relationship among the various information; an input unit that receives condition data comprising a target fluid flow physical quantity value for each of the positions; and a database that stores information about the function. The data processor obtains information about a second distance, which has the target fluid flow physical quantity value, between the upper surface of the wafer and the showerhead at each of the positions, extracts spatial coordinate information of a lower surface of the showerhead, and generates 3D shape data of the showerhead using the spatial coordinate information.

公开(公告)号：US20250104217A1

公开(公告)日：2025-03-27

申请号：US18784343

申请日：2024-07-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Bo Gyeong Kang ,  Ye Ji Kim ,  Min-Chul Park ,  Byoung Seon Choi ,  Seong Ryeol Kim ,  Young-Gu Kim ,  Jae Myung Choe

IPC: G06T7/00 ,  G06V10/44 ,  G06V10/75 ,  G06V10/762

Abstract: A computing device of predicting potential predicting potential defect-inducing factors within a semiconductor layout is provided. The computing device comprising: a machine learning module, calculating predicted measurement data corresponding to at least one first semiconductor layout image among a plurality of semiconductor layout mages after being trained based on the plurality of semiconductor layout images and corresponding real measurement data and an image explanation module generating an attribution map image of the predicted measurement data based on an image regression model utilizing an integrated gradient (IG) manner, analyzing the attribution map image and detecting elements within the attribution map image with attribution values with high sensitivity to the predicted measurement data as potential defect-inducing factors in advance.

公开(公告)号：US10790168B2

公开(公告)日：2020-09-29

申请号：US15972350

申请日：2018-05-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung Bo Shim ,  Hyuk Kim ,  Sun Taek Lim ,  Jae Myung Choe ,  Jeon Il Lee ,  Sung-Il Cho

IPC: H01L21/67 ,  H01L21/683 ,  H01J37/32 ,  H01L21/3065 ,  H01L21/311

Abstract: Provided are a plasma treatment apparatus and a method of fabricating semiconductor device using the same. The plasma treatment apparatus includes a chamber which provides a plasma treatment space, a bottom electrode disposed in the chamber and supports a wafer, a top electrode disposed in the chamber facing the bottom electrode, a source power source which supplies a source power output of a first frequency to the bottom electrode, a bias power source which supplies a bias power output of a second frequency different from the first frequency to the bottom electrode, and a pulse power source which applies a pulse voltage to the bottom electrode, wherein the bias power output is a bias voltage which is pulse-modulated to a first voltage level in a first time section and pulse-modulated to a second voltage level in a second time section and is applied to the bottom electrode.

公开(公告)号：US11182518B2

公开(公告)日：2021-11-23

申请号：US16127692

申请日：2018-09-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Yub Ie ,  Jung Geun Jee ,  Sung Youn Chung ,  Jae Myung Choe

IPC: G06F30/20 ,  C23C16/455 ,  G06F30/17

Abstract: An apparatus for generating 3D shape data of a showerhead includes: a data processor that generates data sets comprising information indicating values of a first distance between an upper surface of a wafer and a showerhead, information indicating positions on the wafer and information about a fluid flow physical quantity value and determines a function representing a relationship among the various information; an input unit that receives condition data comprising a target fluid flow physical quantity value for each of the positions; and a database that stores information about the function. The data processor obtains information about a second distance, which has the target fluid flow physical quantity value, between the upper surface of the wafer and the showerhead at each of the positions, extracts spatial coordinate information of a lower surface of the showerhead, and generates 3D shape data of the showerhead using the spatial coordinate information.

公开(公告)号：US10128112B2

公开(公告)日：2018-11-13

申请号：US15595945

申请日：2017-05-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cho Eun Lee ,  Jin Bum Kim ,  Kang Hun Moon ,  Jae Myung Choe ,  Sun Jung Kim ,  Dong Suk Shin ,  Il Gyou Shin ,  Jeong Ho Yoo

IPC: H01L21/336 ,  H01L21/02 ,  H01L21/223 ,  H01L29/66

Abstract: A method of fabricating a semiconductor device is provided. The method includes forming a dummy gate electrode on a substrate, forming a trench on a side surface of the dummy gate electrode, performing a bake process of removing an impurity from the trench and forming a source/drain in the trench, wherein the bake process comprises a first stage and a second stage following the first stage, an air pressure in which the substrate is disposed during the first stage is different from an air pressure in which the substrate is disposed during the second stage, and the bake process is performed while the substrate is on a stage rotating the substrate, wherein a revolution per minute (RPM) of the substrate during the first stage is different from a revolution per minute (RPM) of the substrate during the second stage.