Abstract:
A semiconductor device includes an active region extending in a first direction; a device isolation layer on side surfaces of the active region and defining the active region; a gate structure intersecting the active region on the active region and extending in a second direction; source/drain regions in regions in which the active region is recessed, on both sides of the gate structure; first protective layers between the device isolation layer and the gate structure; and a buried interconnection line below the source/drain regions and connected to one of the source/drain regions through an upper surface of the buried interconnection line.
Abstract:
A semiconductor device may include an active pattern on a substrate, a source/drain pattern on the active pattern, a channel pattern connected to the source/drain pattern, a gate electrode on the channel pattern, an active contact on the source/drain pattern, a first lower interconnection line on the gate electrode, and a second lower interconnection line on the active contact and at the same level as the first lower interconnection line. The gate electrode may include an electrode body portion and an electrode protruding portion, wherein the electrode protruding portion protrudes from a top surface of the electrode body portion and is in contact with the first lower interconnection line thereon. The active contact may include a contact body portion and a contact protruding portion, wherein the contact protruding portion protrudes from a top surface of the contact body portion and is in contact with the second lower interconnection line thereon.
Abstract:
A semiconductor device may include first and second active regions on a substrate, first and second active patterns on the first and second active regions, first and second source/drain patterns on the first and second active patterns, first and second silicide patterns on the first and second source/drain patterns, and first and second active contacts coupled to the first and second source/drain patterns. A lowermost portion of the first active contact is at a level higher than that of a lowermost portion of the second active contact. A thickness of the first silicide pattern is greater than that of the second silicide pattern.
Abstract:
A semiconductor device includes active regions extending in a first direction on a substrate; a gate electrode intersecting the active regions on the substrate, extending in a second direction, and including a contact region protruding upwardly; and an interconnection line on the gate electrode and connected to the contact region, wherein the contact region includes a lower region having a first width in the second direction and an upper region located on the lower region and having a second width smaller than the first width in the second direction, and wherein at least one side surface of the contact region in the second direction has a point at which an inclination or a curvature is changed between the lower region and the upper region.
Abstract:
A method of processing an image of a portable terminal, the portable terminal comprising an image signal processor (ISP) and an application processor (AP) includes: acquiring, at the ISP, an image from a camera unit of the portable terminal for each frame of a plurality of frames during an operation of the camera; generating, at the ISP, a display image and a compression image by processing the acquired image; transmitting the display image generated by the ISP for each frame and the compression image at a preset frame interval; and displaying, at the AP, the acquired display image and buffering, at the AP, the compression image.
Abstract:
A semiconductor device is provided. The semiconductor device includes: an active pattern provided on a substrate having an upper surface; an insulation pattern provided above the substrate and contacting an upper surface of the active pattern; channels spaced apart from each other along a direction perpendicular to the upper surface of the substrate, each of the channels including a material provided in the active pattern; and a gate structure contacting an upper surface of the insulation pattern, an upper surface of the channels, a lower surface of the channels, and sidewalls of the channels opposite to each other. A first distance between an upper surface of the active pattern and a lowermost one of the channels is greater than a second distance between an upper surface of one of the channels and a lower surface of an adjacent channel.
Abstract:
Disclosed herein are a method and device for transmitting digital content. A selection of at least one device authorized to receive digital content is detected. It is identified whether each selected device contains a session key that corresponds to a local session key. Digital content is transmitted to each device whose session key corresponds to the local key. Digital content is prevented from transmission to unselected devices not having a corresponding session key.
Abstract:
An image-taking method of a portable terminal apparatus includes acquiring images from a camera sensor at every frame period in a camera operation mode; converting the acquired images to viewing images and compressed images; and buffering the compressed images while displaying the viewing images on a display unit of the portable terminal.
Abstract:
An apparatus and method generate and store metadata in a moving image shooting mode for use in playing and editing the moving image. The moving image processing method of the apparatus equipped with a camera includes acquiring images at every frame period in a moving image shooting mode; generating metadata of the images; encoding the images into the moving image; storing the moving image with the metadata; and displaying a specific metadata selected among the metadata as supplementary functions of the moving image in a moving image playback mode.
Abstract:
A semiconductor device includes a substrate including an active region, a gate structure on the substrate, a plurality of channel layers on the active region, spaced apart from each other and surrounded by the gate structure, a source/drain region in a region at which the active region is recessed, on at least one side of the gate structure, and connected to the channel layers, and a contact plug partially recessing the source/drain region from an upper surface of the source/drain region, electrically connected to the source/drain region, and including a metal-semiconductor compound layer along a recessed surface of the source/drain region and a contact conductor layer on the metal-semiconductor compound layer, wherein the metal-semiconductor compound layer has a first thickness on a side surface of the contact conductive layer and a second thickness on a bottom surface of the contact plug, the second thickness being smaller than the first thickness.