公开(公告)号：US10393672B2

公开(公告)日：2019-08-27

申请号：US15959347

申请日：2018-04-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeongho Ahn ,  Jae-Man Oh ,  Seongsil Lee ,  Yusin Yang ,  Dongchul Ihm ,  Hyungsuk Cho

IPC: G02B21/00 ,  G01N21/95 ,  G01N21/88 ,  G01N21/956 ,  G11C29/02 ,  H01J37/28 ,  H01J37/26 ,  G11C29/04

Abstract: A substrate inspection system includes a substrate support, optics configured to irradiate a patterned structure on the substrate and capture images of the patterned structure from light reflected from the patterned structure, a focus adjustment operative to adjust a focal position of the incident light on the patterned structure, and an image processor configured to calculate an optimal value of a focus offset used to establish focal points of the light for defect detection in the patterned structure. The patterned structure may include a first pattern having an opening and a second pattern having top surfaces located at different heights relative to the substrate. The value of the focus offset is determined using images of the top surfaces of the second pattern obtained while changing the focal position of the incident light.

公开(公告)号：US20170146340A1

公开(公告)日：2017-05-25

申请号：US15209137

申请日：2016-07-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Doyoung Yoon ,  Hyungsuk Cho

IPC: G01B11/27

CPC classification number: G01B11/272 ,  G01B11/26 ,  G06T7/73 ,  G06T2207/30148

Abstract: An alignment key pattern includes an origin alignment mark having a cross shape and a rotation angle measurement mark (RAMM) having a radial shape. The RAMM includes a plurality of radially-extending bars that are aligned to a common center point. These radially-extending bars include at least two horizontal bars, which extend horizontally and are spaced apart from each other, a vertical bar configured to be perpendicular to and spaced apart from the horizontal bars, and diagonal bars configured to have a first angle with respect to and be spaced apart from the horizontal bars and the vertical bar.