Semiconductor devices having penetration vias with portions having decreasing widths

    公开(公告)号:US11664316B2

    公开(公告)日:2023-05-30

    申请号:US16849085

    申请日:2020-04-15

    CPC classification number: H01L23/5384 H01L23/5385 H01L2224/08146

    Abstract: A semiconductor device may include a first semiconductor substrate having a first surface and a second surface opposite to each other, a first circuit layer provided on the first surface of the first semiconductor substrate, a connection pad provided on the second surface of the first semiconductor substrate, and a first penetration via and a second penetration via penetrating the first semiconductor substrate and at least a portion of the first circuit layer. The first penetration via and the second penetration via may be provided in a first penetration hole and a second penetration hole, respectively. Each of the first and second penetration holes may include a first portion, a second portion, and a third portion. A width of the first portion of the first penetration hole may be smaller than a width of the first portion of the second penetration hole.

    Semiconductor device
    9.
    发明授权

    公开(公告)号:US11804419B2

    公开(公告)日:2023-10-31

    申请号:US17185166

    申请日:2021-02-25

    Abstract: A semiconductor device may include a substrate including a first surface and a second surface, which are opposite to each other, an insulating layer on the first surface of the substrate, a first via structure and a second via structure penetrating the substrate and a portion of the insulating layer and having different widths from each other in a direction parallel to the first surface of the substrate, metal lines provided in the insulating layer, and an integrated circuit provided on the first surface of the substrate. A bottom surface of the first via structure may be located at a level lower than a bottom surface of the second via structure, when measured from the first surface of the substrate. The second via structure may be electrically connected to the integrated circuit through the metal lines.

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