-
公开(公告)号:US20250169376A1
公开(公告)日:2025-05-22
申请号:US18664982
申请日:2024-05-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaehyeong LEE , Hyeokshin KWON , Daeyun KIM , Daeseok HAN
Abstract: A Josephson junction device has a second region between first and third regions, and the Josephson junction device includes: a substrate in the first, second, and third regions; a first superconductive layer arranged on the substrate in the first and second regions and not the third region; a second superconductive layer arranged in the second and third regions and spatially overlapping the first superconductive layer in the second region; an oxide layer sandwiched between the first superconductive layer the second superconductive in the second region; and a first trench in the substrate in the third region, the trench passing under the second superconductive layer in the third region.
-
公开(公告)号:US20250169380A1
公开(公告)日:2025-05-22
申请号:US18623276
申请日:2024-04-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaehyeong LEE , Jaeho SHIN , Insu JEON , Daeseok HAN
Abstract: A qubit chip device includes: a substrate; a superconducting qubit provided on the substrate; a ground plate, on the substrate, surrounding a perimeter of the superconducting qubit, and including a conductive layer on the substrate and a superconducting layer on the conductive layer; and a readout circuit electrically connected to the superconducting qubit.
-
公开(公告)号:US20240260483A1
公开(公告)日:2024-08-01
申请号:US18507672
申请日:2023-11-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Daeseok HAN , Jaehyeong LEE , Jinhyoun KANG , Daeyun KIM , Jaeho SHIN , Daeho YANG
CPC classification number: H10N60/124 , H10N60/0941 , H10N60/805
Abstract: A device including a Josephson junction device including a first superconductor layer, a first oxide layer disposed on a first upper surface of the first superconductor layer, a second superconductor layer disposed to partially overlap the first superconductor layer, a second oxide layer disposed on a second upper surface of the second superconductor layer, and a third superconductor layer including a first portion facing the first upper surface of the first superconductor layer and a second portion facing the second upper surface of the second superconductor layer, and a first thickness of a first portion of the first oxide layer between a lower surface of the first portion of the third superconductor layer and a third upper surface of the first superconductor layer is less than a second thickness of a second portion of the first oxide layer.
-
公开(公告)号:US20240237558A9
公开(公告)日:2024-07-11
申请号:US18194539
申请日:2023-03-31
Inventor: Jaehyeong LEE , Gilho LEE , Jinhyoun KANG , Jaeho SHIN , Seunghan LEE , Daeseok HAN
IPC: H10N69/00
CPC classification number: H10N69/00
Abstract: A superconducting quantum interferometric device (SQUID) includes: a conductive material region formed on a partial region of a substrate; a first superconducting material layer including a first loop including first and second extension units that are spaced apart from each other to form a proximity Josephson junction and that form a stack structure with the conductive material region; a second superconducting material layer including a second loop including first and second end units spaced apart from each other; and a tunnel Josephson junction formed by a stack structure including a tunnel thin film layer forming and the first and second end units, wherein at least a portion of the second loop forms a stack structure with the first loop.
-
公开(公告)号:US20240138271A1
公开(公告)日:2024-04-25
申请号:US18194539
申请日:2023-03-30
Inventor: Jaehyeong LEE , Gilho LEE , Jinhyoun KANG , Jaeho SHIN , Seunghan LEE , Daeseok HAN
IPC: H10N69/00
CPC classification number: H10N69/00
Abstract: A superconducting quantum interferometric device (SQUID) includes: a conductive material region formed on a partial region of a substrate; a first superconducting material layer including a first loop including first and second extension units that are spaced apart from each other to form a proximity Josephson junction and that form a stack structure with the conductive material region; a second superconducting material layer including a second loop including first and second end units spaced apart from each other; and a tunnel Josephson junction formed by a stack structure including a tunnel thin film layer forming and the first and second end units, wherein at least a portion of the second loop forms a stack structure with the first loop.
-
-
-
-