METHOD OF FORMING CONTACT HOLES
    3.
    发明申请
    METHOD OF FORMING CONTACT HOLES 有权
    形成接触孔的方法

    公开(公告)号:US20140148004A1

    公开(公告)日:2014-05-29

    申请号:US13802392

    申请日:2013-03-13

    Inventor: Yong Jae Jang

    Abstract: A method of forming contact holes includes: forming a first conductive layer and a second conductive layer; forming an insulating layer on the first conductive layer and the second conductive layer; forming a photoresist pattern which exposes first and second etch surfaces of a top surface of the insulating layer; performing a first etching process on the insulating layer at a first etching rate; and performing a second etching process on the insulating layer at a second etching rate which is higher than the first etching rate, after a top surface of the first conductive layer is exposed through the insulating layer. The first etch surface is on the first conductive layer, the second etch surface is on the second conductive layer, and a distance between the second etch surface and the second conductive layer is greater than a distance between the first etch surface and the first conductive layer.

    Abstract translation: 一种形成接触孔的方法包括:形成第一导电层和第二导电层; 在所述第一导电层和所述第二导电层上形成绝缘层; 形成曝光所述绝缘层的顶表面的第一和第二蚀刻表面的光致抗蚀剂图案; 以第一蚀刻速率对所述绝缘层进行第一蚀刻工艺; 以及在所述第一导电层的顶表面通过所述绝缘层露出之后,以高于所述第一蚀刻速率的第二蚀刻速率对所述绝缘层进行第二蚀刻处理。 第一蚀刻表面在第一导电层上,第二蚀刻表面在第二导电层上,并且第二蚀刻表面和第二导电层之间的距离大于第一蚀刻表面和第一导电层之间的距离 。

    Organic light-emitting display device

    公开(公告)号:US10347704B2

    公开(公告)日:2019-07-09

    申请号:US15783002

    申请日:2017-10-13

    Abstract: An organic light-emitting diode (OLED) display device includes a substrate, a first gate electrode on the substrate, a second gate electrode on the first gate electrode and at least partially overlapping the first gate electrode, a semiconductor pattern between the first gate electrode and the second gate electrode and at least partially overlapping the first and second gate electrodes, a connecting electrode on the second gate electrode and electrically connected to the semiconductor pattern, and a pixel electrode on the connecting electrode and electrically connected to the connecting electrode.

    Method of forming contact holes
    5.
    发明授权
    Method of forming contact holes 有权
    形成接触孔的方法

    公开(公告)号:US08883630B2

    公开(公告)日:2014-11-11

    申请号:US13802392

    申请日:2013-03-13

    Inventor: Yong Jae Jang

    Abstract: A method of forming contact holes includes: forming a first conductive layer and a second conductive layer; forming an insulating layer on the first conductive layer and the second conductive layer; forming a photoresist pattern which exposes first and second etch surfaces of a top surface of the insulating layer; performing a first etching process on the insulating layer at a first etching rate; and performing a second etching process on the insulating layer at a second etching rate which is higher than the first etching rate, after a top surface of the first conductive layer is exposed through the insulating layer. The first etch surface is on the first conductive layer, the second etch surface is on the second conductive layer, and a distance between the second etch surface and the second conductive layer is greater than a distance between the first etch surface and the first conductive layer.

    Abstract translation: 形成接触孔的方法包括:形成第一导电层和第二导电层; 在所述第一导电层和所述第二导电层上形成绝缘层; 形成曝光所述绝缘层的顶表面的第一和第二蚀刻表面的光致抗蚀剂图案; 以第一蚀刻速率对所述绝缘层进行第一蚀刻工艺; 以及在所述第一导电层的顶表面通过所述绝缘层露出之后,以高于所述第一蚀刻速率的第二蚀刻速率对所述绝缘层进行第二蚀刻处理。 第一蚀刻表面在第一导电层上,第二蚀刻表面在第二导电层上,第二蚀刻表面和第二导电层之间的距离大于第一蚀刻表面和第一导电层之间的距离 。

    Display device and method of manufacturing the same
    8.
    发明授权
    Display device and method of manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号:US09099680B2

    公开(公告)日:2015-08-04

    申请号:US14089486

    申请日:2013-11-25

    CPC classification number: H01L51/5268 H01L51/5271 H01L51/56

    Abstract: A display device and method of manufacturing the same, the display device having a substrate, a plurality of scattering patterns which are located on the substrate and comprise crystallized metal oxide, a first electrode which is located on the scattering patterns, an organic light-emitting layer which is located on the first electrode, and a second electrode which is located on the organic light-emitting layer.

    Abstract translation: 一种显示装置及其制造方法,所述显示装置具有基板,位于所述基板上的多个散射图案,其具有结晶化的金属氧化物,位于所述散射图案上的第一电极,有机发光 位于第一电极上的第二电极和位于有机发光层上的第二电极。

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    显示装置及其制造方法

    公开(公告)号:US20150041765A1

    公开(公告)日:2015-02-12

    申请号:US14089486

    申请日:2013-11-25

    CPC classification number: H01L51/5268 H01L51/5271 H01L51/56

    Abstract: A display device and method of manufacturing the same, the display device having a substrate, a plurality of scattering patterns which are located on the substrate and comprise crystallized metal oxide, a first electrode which is located on the scattering patterns, an organic light-emitting layer which is located on the first electrode, and a second electrode which is located on the organic light-emitting layer.

    Abstract translation: 一种显示装置及其制造方法,所述显示装置具有基板,位于所述基板上的多个散射图案,其包含结晶化金属氧化物,位于所述散射图案上的第一电极,有机发光 位于第一电极上的第二电极和位于有机发光层上的第二电极。

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