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1.发明申请公开(公告)号：US20190206659A1
公开(公告)日：2019-07-04
申请号：US16239874
申请日：2019-01-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： JUNGGON KIM , Sunghun Key , Choelmin Jang , Myungsoo Huh
IPC: H01J37/32 , C23C16/455
CPC classification number: H01J37/32449 , C23C16/45563 , H01J37/32834 , H01J37/32862
Abstract: A deposition apparatus includes a deposition gas supply unit including an opening and closing valve. The deposition gas supply unit is configured to selectively supply a source gas or a mixture gas into a chamber. A cleaning gas supply unit is configured to supply a cleaning gas into the chamber. A deposition head includes a first deposition head including a first nozzle configured to supply the source gas and the cleaning gas and a second deposition head including a second nozzle configured to supply the source gas, the mixture gas, and the cleaning gas. An exhaust unit is configured to discharge the cleaning gas and remaining source and mixture gases from the chamber. A cleaning gas valve unit is configured to be selectively opened and closed to supply the cleaning gas to at least any one of the first deposition head and the second deposition head.
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公开(公告)号：US10991913B2
公开(公告)日：2021-04-27
申请号：US16199848
申请日：2018-11-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
Abstract: Provided are an encapsulating structure, an organic light-emitting display device including the encapsulating structure, and a method of manufacturing the same. The encapsulating structure includes a first barrier layer including a first inorganic layer having a first thickness; a plasma polymer layer on the first inorganic layer, the plasma polymer layer having a second thickness smaller than or equal to the first thickness; and a second barrier layer including at least one second inorganic layer on the plasma polymer layer. The at least one second inorganic layer has a third thickness, and the third thickness is smaller than or equal to the second thickness.
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公开(公告)号：US10211427B2
公开(公告)日：2019-02-19
申请号：US15640945
申请日：2017-07-03
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myungsoo Huh , Sunghun Key , Sungchul Kim , Cheollae Roh , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi
IPC: H01L51/52 , H01J37/32 , C23C16/04 , C23C16/34 , C23C16/455 , C23C16/505
Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.
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公开(公告)号：US11499232B2
公开(公告)日：2022-11-15
申请号：US16122755
申请日：2018-09-05
Applicant: Samsung Display Co., Ltd.
Inventor： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
IPC: C23C16/54 , C23C16/455 , H01J37/32
Abstract: A deposition apparatus and method of deposition are provided. The deposition apparatus includes a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.
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公开(公告)号：US09722206B2
公开(公告)日：2017-08-01
申请号：US14811729
申请日：2015-07-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myungsoo Huh , Sunghun Key , Sungchul Kim , Cheollae Roh , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi
IPC: H01L33/00 , H01L51/52 , H01J37/32 , C23C16/04 , C23C16/34 , C23C16/455 , C23C16/505
CPC classification number: H01L51/5256 , C23C16/042 , C23C16/345 , C23C16/45565 , C23C16/505 , H01J37/32091 , H01J37/3244
Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.
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Patent Agency Ranking
公开(公告)号：US11849601B2
公开(公告)日：2023-12-19
申请号：US16719304
申请日：2019-12-18
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choelmin Jang , Myungsoo Huh , Sunghun Key , Junggon Kim , Eun Jung
IPC: H10K50/844 , H10K71/00 , H10K59/80 , H10K59/12
CPC classification number: H10K50/8445 , H10K59/87 , H10K71/00 , H10K59/12
Abstract: A display apparatus includes a substrate, a display portion that includes a plurality of pixels disposed on the substrate, and an encapsulation portion that covers the display portion and includes a hybrid encapsulation layer that includes a plurality of inorganic layers and at least one organic layer that includes a plasma polymer. An end of the hybrid encapsulation layer includes a tip portion that includes an inorganic material and a multi-layered portion which extends from the tip portion toward a central portion of the substrate and in which the plurality of inorganic layers and the at least one organic layer are sequentially and alternately stacked, and a thickness of each of the inorganic layers and the organic layer decreases toward the tip portion.
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公开(公告)号：US20170309864A1
公开(公告)日：2017-10-26
申请号：US15640945
申请日：2017-07-03
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myungsoo Huh , Sunghun Key , Sungchul Kim , Cheollae Roh , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi
IPC: H01L51/52 , H01J37/32 , C23C16/505 , C23C16/455 , C23C16/34 , C23C16/04
CPC classification number: H01L51/5256 , C23C16/042 , C23C16/345 , C23C16/45565 , C23C16/505 , H01J37/32091 , H01J37/3244
Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.
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公开(公告)号：US20230012818A1
公开(公告)日：2023-01-19
申请号：US17951111
申请日：2022-09-23
Applicant: Samsung Display Co., Ltd.
Inventor： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
IPC: C23C16/54 , H01J37/32 , C23C16/455
Abstract: A deposition apparatus including a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.
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9.发明授权公开(公告)号：US11075059B2
公开(公告)日：2021-07-27
申请号：US16239874
申请日：2019-01-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Junggon Kim , Sunghun Key , Choelmin Jang , Myungsoo Huh
IPC: H01J37/32 , C23C16/455
Abstract: A deposition apparatus includes a deposition gas supply unit including an opening and closing valve. The deposition gas supply unit is configured to selectively supply a source gas or a mixture gas into a chamber. A cleaning gas supply unit is configured to supply a cleaning gas into the chamber. A deposition head includes a first deposition head including a first nozzle configured to supply the source gas and the cleaning gas and a second deposition head including a second nozzle configured to supply the source gas, the mixture gas, and the cleaning gas. An exhaust unit is configured to discharge the cleaning gas and remaining source and mixture gases from the chamber. A cleaning gas valve unit is configured to be selectively opened and closed to supply the cleaning gas to at least any one of the first deposition head and the second deposition head.
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公开(公告)号：US20190203359A1
公开(公告)日：2019-07-04
申请号：US16122755
申请日：2018-09-05
Applicant: Samsung Display Co., Ltd.
Inventor： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
IPC: C23C16/54 , C23C16/455 , H01J37/32
CPC classification number: C23C16/54 , C23C16/45519 , C23C16/45544 , H01J37/3244
Abstract: A deposition apparatus and method of deposition are provided. The deposition apparatus includes a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.
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