公开(公告)号：US10991913B2

公开(公告)日：2021-04-27

申请号：US16199848

申请日：2018-11-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Choelmin Jang ,  Sunghun Key ,  Junggon Kim ,  Myungsoo Huh

IPC: H01L29/08 ,  H01L51/52 ,  H01L51/56 ,  H01L27/32

Abstract: Provided are an encapsulating structure, an organic light-emitting display device including the encapsulating structure, and a method of manufacturing the same. The encapsulating structure includes a first barrier layer including a first inorganic layer having a first thickness; a plasma polymer layer on the first inorganic layer, the plasma polymer layer having a second thickness smaller than or equal to the first thickness; and a second barrier layer including at least one second inorganic layer on the plasma polymer layer. The at least one second inorganic layer has a third thickness, and the third thickness is smaller than or equal to the second thickness.

公开(公告)号：US11499232B2

公开(公告)日：2022-11-15

申请号：US16122755

申请日：2018-09-05

Applicant: Samsung Display Co., Ltd.

Inventor： Choelmin Jang ,  Sunghun Key ,  Junggon Kim ,  Myungsoo Huh

IPC: C23C16/54 ,  C23C16/455 ,  H01J37/32

Abstract: A deposition apparatus and method of deposition are provided. The deposition apparatus includes a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.

公开(公告)号：US11849601B2

公开(公告)日：2023-12-19

申请号：US16719304

申请日：2019-12-18

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Choelmin Jang ,  Myungsoo Huh ,  Sunghun Key ,  Junggon Kim ,  Eun Jung

IPC: H10K50/844 ,  H10K71/00 ,  H10K59/80 ,  H10K59/12

CPC classification number: H10K50/8445 ,  H10K59/87 ,  H10K71/00 ,  H10K59/12

Abstract: A display apparatus includes a substrate, a display portion that includes a plurality of pixels disposed on the substrate, and an encapsulation portion that covers the display portion and includes a hybrid encapsulation layer that includes a plurality of inorganic layers and at least one organic layer that includes a plasma polymer. An end of the hybrid encapsulation layer includes a tip portion that includes an inorganic material and a multi-layered portion which extends from the tip portion toward a central portion of the substrate and in which the plurality of inorganic layers and the at least one organic layer are sequentially and alternately stacked, and a thickness of each of the inorganic layers and the organic layer decreases toward the tip portion.

公开(公告)号：US20230012818A1

公开(公告)日：2023-01-19

申请号：US17951111

申请日：2022-09-23

Applicant: Samsung Display Co., Ltd.

Inventor： Choelmin Jang ,  Sunghun Key ,  Junggon Kim ,  Myungsoo Huh

IPC: C23C16/54 ,  H01J37/32 ,  C23C16/455

Abstract: A deposition apparatus including a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.

公开(公告)号：US11075059B2

公开(公告)日：2021-07-27

申请号：US16239874

申请日：2019-01-04

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Junggon Kim ,  Sunghun Key ,  Choelmin Jang ,  Myungsoo Huh

IPC: H01J37/32 ,  C23C16/455

Abstract: A deposition apparatus includes a deposition gas supply unit including an opening and closing valve. The deposition gas supply unit is configured to selectively supply a source gas or a mixture gas into a chamber. A cleaning gas supply unit is configured to supply a cleaning gas into the chamber. A deposition head includes a first deposition head including a first nozzle configured to supply the source gas and the cleaning gas and a second deposition head including a second nozzle configured to supply the source gas, the mixture gas, and the cleaning gas. An exhaust unit is configured to discharge the cleaning gas and remaining source and mixture gases from the chamber. A cleaning gas valve unit is configured to be selectively opened and closed to supply the cleaning gas to at least any one of the first deposition head and the second deposition head.

公开(公告)号：US20190203359A1

公开(公告)日：2019-07-04

申请号：US16122755

申请日：2018-09-05

Applicant: Samsung Display Co., Ltd.

Inventor： Choelmin Jang ,  Sunghun Key ,  Junggon Kim ,  Myungsoo Huh

IPC: C23C16/54 ,  C23C16/455 ,  H01J37/32

CPC classification number: C23C16/54 ,  C23C16/45519 ,  C23C16/45544 ,  H01J37/3244

Abstract: A deposition apparatus and method of deposition are provided. The deposition apparatus includes a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.