DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20250089475A1

    公开(公告)日:2025-03-13

    申请号:US18635753

    申请日:2024-04-15

    Abstract: A display device includes a substrate, a first transistor including a first active layer disposed on the substrate and a first gate electrode disposed on the first active layer, and a first gate insulating layer disposed between the first active layer and the first gate electrode. The first active layer includes an oxide semiconductor containing indium (In) at a content range of about 40 at % to about 54 at %, and the first gate insulating layer has an emission amount range of oxygen (O2) of about 2.48E+19 Molec./cm3 to about 2.76E+19 Molec./cm3, or an emission amount range of nitrogen monoxide (NO) of about 1.04E+20 Molec./cm3 to about 1.15E+20 Molec./cm3 under heat treatment conditions performed at a temperature range of about 50° C. to about 550° C.

    DISPLAY DEVICE
    2.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240063356A1

    公开(公告)日:2024-02-22

    申请号:US18342567

    申请日:2023-06-27

    CPC classification number: H01L33/62 H01L25/167

    Abstract: A display device includes: a first electrode and a second electrode spaced from the first electrode; a first insulating layer on the first electrode and the second electrode; a plurality of light emitting elements on the first insulating layer and on the first electrode and the second electrode; a first connection electrode on the first electrode and contacting the plurality of light emitting elements; and a second connection electrode on the second electrode and contacting the plurality of light emitting elements, wherein each of the first electrode and the second electrode includes a first metal layer and a second metal layer on the first metal layer and including a different material from the first metal layer, a thickness of the first metal layer is between 100 Å to 300 Å, and a thickness of each of the first electrode and the second electrode is 2600 Å or less.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210327910A1

    公开(公告)日:2021-10-21

    申请号:US17157184

    申请日:2021-01-25

    Abstract: A display device may include a first gate electrode disposed on a substrate, a buffer layer disposed on the first gate electrode, a first active pattern on the buffer layer, the first active pattern overlapping the first gate electrode and including an oxide semiconductor, a second active pattern on the buffer layer, spaced apart from the first active pattern, and including an oxide semiconductor, the second active pattern including a channel region, and a source region and a drain region, a source pattern and a drain pattern respectively at ends of the first active pattern, a first insulation pattern disposed on the first active pattern, a second insulation pattern disposed on the channel region, a first oxygen supply pattern on the first insulation pattern, a second oxygen supply pattern on the second insulation pattern, and a second gate electrode on the second oxygen supply pattern.

    THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY PANEL HAVING THE SAME
    4.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY PANEL HAVING THE SAME 有权
    薄膜晶体管基板,其制造方法和具有该薄膜晶体管的液晶显示面板

    公开(公告)号:US20160133754A1

    公开(公告)日:2016-05-12

    申请号:US14661470

    申请日:2015-03-18

    Abstract: A thin film transistor substrate includes a substrate, a bottom gate on the substrate, a first insulating layer on the substrate and on the bottom gate, a drain on the first insulating layer, a source on the first insulating layer, the source including a first source at a first side of the drain and a second source at a second side of the drain, an active layer on the first insulating layer, the active layer including a first active layer contacting the drain and the first source and a second active layer contacting the drain and the second source, a second insulating layer on the drain, the source, and the active layer, and a top gate on the second insulating layer.

    Abstract translation: 薄膜晶体管衬底包括衬底,衬底上的底栅,衬底上的第一绝缘层和底栅,第一绝缘层上的漏极,第一绝缘层上的源,源包括第一绝缘层 漏极的第一侧的源极和在漏极的第二侧的第二源极,在第一绝缘层上的有源层,有源层包括接触漏极和第一源极的第一有源层和与第一源极接触的第二有源层 漏极和第二源极,漏极,源极和有源层上的第二绝缘层,以及第二绝缘层上的顶栅极。

    DISPLAY DEVICE
    7.
    发明申请

    公开(公告)号:US20220140000A1

    公开(公告)日:2022-05-05

    申请号:US17471679

    申请日:2021-09-10

    Abstract: A display device includes first banks on a substrate and spaced apart from each other, a first electrode and a second electrode on the first banks and spaced apart from each other, a first insulating layer on the first electrode and the second electrode, and light emitting elements on the first insulating layer and each having ends on the first electrode and the second electrode. Each of the first banks includes a first pattern portion including concave portions and convex portions. The first pattern portions of the first banks are disposed on side surfaces of the first banks. The side surfaces are spaced apart and face each other. Each of the first electrode and the second electrode includes a second pattern portion on the first pattern portion and having a pattern shape corresponding to the first pattern portion on a surface thereof.

    DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME

    公开(公告)号:US20210320162A1

    公开(公告)日:2021-10-14

    申请号:US17107638

    申请日:2020-11-30

    Abstract: A display device includes a substrate, a first conductive layer on the substrate and including a lower light blocking pattern and a first signal line, a buffer layer on the first conductive layer, a semiconductor layer on the buffer layer and including a first semiconductor pattern and a second semiconductor pattern separated from the first semiconductor pattern, an insulating layer on the semiconductor layer and including an insulating layer pattern, a second conductive layer on the insulating layer and including a second signal line, a planarization layer on the second conductive layer, and a third conductive layer on the planarization layer and including an anode electrode. The first semiconductor pattern is electrically connected to the lower light blocking pattern by the anode electrode, and at least a portion of the second semiconductor pattern is isolated from and overlaps each of the first signal line and the second signal line.

    THIN FILM TRANSISTOR DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME
    10.
    发明申请
    THIN FILM TRANSISTOR DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME 有权
    薄膜晶体管显示面板及其制造方法

    公开(公告)号:US20160300859A1

    公开(公告)日:2016-10-13

    申请号:US14856405

    申请日:2015-09-16

    Abstract: A thin film transistor display panel including: a first insulating substrate; a first semiconductor disposed between the first insulating substrate and a first gate insulating layer; a gate electrode disposed on the first gate insulating layer, the gate electrode overlapping the first semiconductor; a second gate insulating layer disposed on the gate electrode; a second semiconductor disposed on the second gate insulating layer, the second semiconductor overlapping the gate electrode; an interlayer insulating layer disposed on the second semiconductor; and a source electrode and a drain electrode disposed on the interlayer insulating layer spaced apart from each other, the source electrode and the drain electrode connected to the first semiconductor and the second semiconductor.

    Abstract translation: 一种薄膜晶体管显示面板,包括:第一绝缘基板; 布置在第一绝缘基板和第一栅极绝缘层之间的第一半导体; 设置在所述第一栅极绝缘层上的栅电极,所述栅电极与所述第一半导体重叠; 设置在所述栅电极上的第二栅极绝缘层; 布置在第二栅绝缘层上的第二半导体,第二半导体与栅电极重叠; 设置在所述第二半导体上的层间绝缘层; 以及设置在层间绝缘层彼此间隔开的源电极和漏电极,源电极和漏电极连接到第一半导体和第二半导体。

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