公开(公告)号：US20200006503A1

公开(公告)日：2020-01-02

申请号：US16563948

申请日：2019-09-09

Applicant: Samsung Display Co., Ltd.

Inventor： Yu-Gwang JEONG ,  Shin-Il CHOI ,  Su-Bin BAE ,  Sung-Hoon YANG

IPC: H01L29/417

Abstract: According to an exemplary embodiment, a display substrate includes a gate metal pattern comprising a gate electrode, an active pattern disposed on the gate pattern and a source metal pattern disposed on the active pattern. The source metal pattern includes a first lower pattern disposed on the active pattern, a second lower pattern disposed on the first lower pattern, a low-resistance metal pattern disposed on the second lower pattern, and an upper pattern disposed on the low-resistance metal pattern. The first lower pattern, the second lower pattern, and the upper pattern each include a material that is the same.

公开(公告)号：US20160043105A1

公开(公告)日：2016-02-11

申请号：US14606986

申请日：2015-01-27

Applicant: Samsung Display Co., LTD.

Inventor： Yu-Gwang JEONG ,  Shin-Il CHOI ,  Su-Bin BAE ,  Sung-Hoon YANG

IPC: H01L27/12 ,  H01L29/66 ,  H01L29/786 ,  H01L23/532 ,  H01L23/528

CPC classification number: H01L29/41733 ,  H01L23/53214 ,  H01L23/53257 ,  H01L29/458 ,  H01L29/66765 ,  H01L2924/0002 ,  H01L2924/00

Abstract: According to an exemplary embodiment, a display substrate includes a gate metal pattern comprising a gate electrode, an active pattern disposed on the gate pattern and a source metal pattern disposed on the active pattern. The source metal pattern includes a first lower pattern disposed on the active pattern, a second lower pattern disposed on the first lower pattern, a low-resistance metal pattern disposed on the second lower pattern, and an upper pattern disposed on the low-resistance metal pattern. The first lower pattern, the second lower pattern, and the upper pattern each include a material that is the same.

Abstract translation: 根据示例性实施例，显示基板包括栅极金属图案，栅极金属图案包括栅电极，设置在栅极图案上的有源图案和设置在有源图案上的源极金属图案。 源极金属图案包括设置在有源图案上的第一下部图案，设置在第一下部图案上的第二下部图案，设置在第二下部图案上的低电阻金属图案，以及设置在低电阻金属上的上部图案 模式。 第一下图案，第二下图案和上图案均包括相同的材料。

公开(公告)号：US20150162363A1

公开(公告)日：2015-06-11

申请号：US14468633

申请日：2014-08-26

Applicant: Samsung Display Co., LTD.

Inventor： Jae-Neung KIM ,  Yu-Gwang JEONG ,  Shin-Il CHOI ,  Dae-Ho KIM ,  Myoung-Geun CHA ,  Sang-Gab KIM ,  Jung-Ha SON

IPC: H01L27/12

CPC classification number: H01L27/1262 ,  H01L27/1218 ,  H01L27/124

Abstract: A display substrate includes a data pad on a base substrate, a first buffer layer which covers the data pad, a second buffer layer pattern which is disposed on the first buffer layer and separated from the data pad in a plan view, an active layer on the second buffer layer pattern, a gate insulation layer pattern on the active layer, both ends of the active layer exposed by the gate insulation layer pattern, and a gate electrode on the gate insulation layer pattern.

Abstract translation: 显示基板包括在基底基板上的数据焊盘，覆盖数据焊盘的第一缓冲层，布置在第一缓冲层上并在平面图中与数据焊盘分离的第二缓冲层图案，活性层 第二缓冲层图案，有源层上的栅极绝缘层图案，由栅极绝缘层图案曝光的有源层的两端以及栅极绝缘层图案上的栅极电极。

公开(公告)号：US20150053989A1

公开(公告)日：2015-02-26

申请号：US14455113

申请日：2014-08-08

Applicant: Samsung Display Co., Ltd.

Inventor： Yu-Gwang JEONG ,  Shin-Il CHOI ,  Su-Bin BAE ,  Dae-Ho KIM ,  Sang-Gab KIM ,  Jae-Neung KIM

IPC: H01L27/12 ,  H01L21/02 ,  H01L21/3065

CPC classification number: H01L27/124 ,  H01L21/31116 ,  H01L21/76804 ,  H01L21/76832 ,  H01L27/1259

Abstract: A display substrate includes a base substrate, a common line on the base substrate, a first insulation layer covering the common line and having a first insulating material, a conductive pattern on the first insulation layer and including a source electrode and a drain electrode, a second insulation layer covering the drain electrode and the common line, and including a lower second insulation layer having a second insulating material and an upper second insulation layer having the first insulating material, a first electrode electrically connected to the drain electrode through a first contact hole in the second insulation layer, and a second electrode electrically connected to the common line through a second contact hole in the first and second insulation layers. The upper and lower second insulation layers on the drain electrode have a first hole and a second hole respectively that form the first contact hole.

Abstract translation: 显示基板包括基底基板，基底基板上的公共线，覆盖公共线的第一绝缘层，并具有第一绝缘材料，第一绝缘层上的导电图案，包括源电极和漏电极， 覆盖漏电极和公共线的第二绝缘层，并且包括具有第二绝缘材料的下第二绝缘层和具有第一绝缘材料的上第二绝缘层，第一电极，通过第一接触孔电连接到漏电极 以及通过第一绝缘层和第二绝缘层中的第二接触孔与公共线电连接的第二电极。 漏电极上的上，下第二绝缘层分别具有形成第一接触孔的第一孔和第二孔。

公开(公告)号：US20140159059A1

公开(公告)日：2014-06-12

申请号：US13869697

申请日：2013-04-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yu-Gwang JEONG ,  Ji-Young PARK ,  Shin-Il CHOI ,  Sang-Gab KIM

IPC: H01L33/02

CPC classification number: H01L27/124 ,  G02F1/133707 ,  H01L27/1248 ,  H01L27/1288

Abstract: A method of manufacturing a display substrate includes forming a gate insulation layer on the base substrate on which a gate metal pattern, forming a data metal pattern on the gate insulation layer, sequentially forming a insulation layer and an organic layer on the base substrate on which the data metal pattern is formed, partially exposing the organic layer, developing the organic layer to partially remove the organic layer on the data metal pattern and to expose at least a portion of the protecting layer on the gate metal pattern, forming a common electrode on the organic layer, forming a pixel electrode on the on the organic layer, and forming an insulation layer between the pixel electrode and the common electrode. An etching degree of a data metal may be controlled by controlling a thickness of a remained organic layer to reduce a damage of the data metal.

Abstract translation: 一种制造显示基板的方法包括在基底基板上形成栅极绝缘层，栅基金属图案在栅绝缘层上形成数据金属图案，在基底基板上依次形成绝缘层和有机层， 形成数据金属图案，部分地暴露有机层，显影有机层以部分地去除数据金属图案上的有机层，并暴露栅极金属图案上的保护层的至少一部分，形成公共电极 有机层，在有机层上形成像素电极，在像素电极和公共电极之间形成绝缘层。 可以通过控制剩余的有机层的厚度来减少数据金属的损伤来控制数据金属的蚀刻程度。

公开(公告)号：US20140147947A1

公开(公告)日：2014-05-29

申请号：US14168971

申请日：2014-01-30

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yu-Gwang JEONG ,  Young-Wook LEE ,  Sang-Gab KIM ,  Woo-Geun LEE ,  Min-Seok OH ,  Jang-Soo KIM ,  Kap-Soo YOON ,  Shin-Il CHOI ,  Hong-Kee CHIN ,  Seung-Ha CHOI ,  Seung-Hwan SHIM ,  Sung-Hoon YANG ,  Ki-Hun JEONG

IPC: H01L27/12

CPC classification number: H01L27/127 ,  H01L27/1214 ,  H01L27/1259 ,  H01L27/1288 ,  H01L29/66765

Abstract: Embodiments of the present invention relate to a thin film transistor and a manufacturing method of a display panel, and include forming a gate line including a gate electrode on a substrate, forming a gate insulating layer on the gate electrode, forming an intrinsic semiconductor on the gate insulating layer, forming an extrinsic semiconductor on the intrinsic semiconductor, forming a data line including a source electrode and a drain electrode on the extrinsic semiconductor, and plasma-treating a portion of the extrinsic semiconductor between the source electrode and the drain electrode to form a protection member and ohmic contacts on respective sides of the protection member. Accordingly, the process for etching the extrinsic semiconductor and forming an inorganic insulating layer for protecting the intrinsic semiconductor may be omitted such that the manufacturing process of the display panel may be simplified, manufacturing cost may be reduced, and productivity may be improved.

Abstract translation: 本发明的实施例涉及薄膜晶体管和显示面板的制造方法，包括在基板上形成包括栅电极的栅极线，在栅电极上形成栅绝缘层，在栅电极上形成本征半导体 栅极绝缘层，在本征半导体上形成非本征半导体，在外部半导体上形成包括源电极和漏电极的数据线，以及对源电极和漏极之间的非本征半导体的一部分进行等离子体处理，以形成 保护构件和保护构件的相应侧上的欧姆接触。 因此，可以省略用于蚀刻外部半导体和形成用于保护本征半导体的无机绝缘层的工艺，从而可以简化显示面板的制造工艺，可以降低制造成本，并且可以提高生产率。

公开(公告)号：US20150108489A1

公开(公告)日：2015-04-23

申请号：US14579542

申请日：2014-12-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Joo-Han KIM ,  Ki-Yong SONG ,  Dong-Ju YANG ,  Hee-Joon KIM ,  Yeo-Geon YOON ,  Sung-Hen CHO ,  Chang-Hoon KIM ,  Jae-Hong KIM ,  Yu-Gwang JEONG ,  Ki-Yeup LEE ,  Sang-Gab KIM ,  Yun-Jong YEO ,  Shin-Il CHOI ,  Ji-Young PARK

IPC: H01L23/00 ,  H01L27/12

CPC classification number: H01L24/05 ,  G02F1/136227 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L2224/04042 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/00

Abstract: A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.

Abstract translation: 公开了布线的接触部分及其制造方法。 根据实施例的布线的接触部分包括：基板; 设置在所述基板上的导电层; 设置在所述导电层上并具有接触孔的层间绝缘层; 设置在所述导电层上并填充所述接触孔的金属层; 以及透明电极，设置在所述层间绝缘层上并连接到所述金属层，其中所述层间绝缘层包括下绝缘层和设置在所述下绝缘层上的上绝缘层，所述下绝缘层在所述接触孔处被底切， 并且金属层填充在下绝缘层被切下的部分。