公开(公告)号：US10964239B2

公开(公告)日：2021-03-30

申请号：US16391802

申请日：2019-04-23

Applicant: Samsung Display Co., Ltd.

Inventor： Daeyoun Cho ,  Sangkil Kim ,  Hyunho Kim ,  Young-joo Noh ,  Jongwoo Park ,  Jongwon Lee ,  Juhee Lee ,  Youngtae Choi

IPC: G01R31/02 ,  G09G3/00 ,  G09G3/3225

Abstract: A lighting test device for a display panel includes: a connection part including a first connection test pad, a second connection test pad and a plurality of test pads, which are arranged at an end of the connection part, where the connection part is allowed to be connected to the display panel through the first connection test pad, the second connection test pad and the test pads; and a test circuit which outputs a connection test signal to the first connection test pad, receives a feedback signal through the second connection test pad, and adjusts voltage levels of test signals to be applied to the test pads based on the connection test signal and the feedback signal.

公开(公告)号：US10777771B2

公开(公告)日：2020-09-15

申请号：US16557077

申请日：2019-08-30

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Juhee Lee ,  Jongwoo Park ,  Youngtae Choi ,  Daeyoun Cho

IPC: H01L51/52 ,  H01L27/32 ,  G09G3/3283 ,  G09G3/3266

Abstract: A display apparatus includes a substrate, a display area including a plurality of pixels, a non-display area outside the display area, a first dam surrounding the display area, a second dam surrounding the first dam, a third dam between the display area and the first dam. The third dam including a first insulating layer and a second insulating layer on the first insulating layer, and a thin film encapsulation layer covering the display area, the thin film encapsulation layer including at least one inorganic encapsulation layer and at least one organic encapsulation layer. The third dam includes a first region in which the second insulating layer is spaced along a direction in which the first insulating layer extends, and a second region in which the second insulating layer is continuously present along the direction in which the first insulating layer extends, the second region not overlapping the first region.

公开(公告)号：US11574833B2

公开(公告)日：2023-02-07

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H02N13/00 ,  H01L21/683 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US20210358791A1

公开(公告)日：2021-11-18

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H01L21/683 ,  H02N13/00 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US20190341277A1

公开(公告)日：2019-11-07

申请号：US16173950

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Haeyoung Yoo ,  Taejong Kim ,  Juhee Lee ,  Myungsoo Huh ,  Jaekyu Park ,  Hyunwoo Joo

IPC: H01L21/67 ,  H01J37/32 ,  H01L27/12 ,  H01L21/311 ,  H01L27/32 ,  H01L21/027

Abstract: Provided is a display device manufacturing apparatus and a manufacturing method of a display device. The display device manufacturing apparatus includes: a chamber; a supporter arranged in the chamber and supporting a substrate; an electrode arranged in the chamber so as to face the supporter; a gas supply arranged in the chamber and configured to supply process gas into the chamber; a first baffle arranged at a rim of the supporter and having at least one first through hole; and a second baffle arranged between the first baffle and the chamber and covering the at least one first through hole in a plan view to alter a path of by-products discharged from the chamber.

公开(公告)号：US11004395B2

公开(公告)日：2021-05-11

申请号：US16382191

申请日：2019-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Jongwoo Park ,  Youngtae Choi ,  Daeyoun Cho

IPC: G09G3/3258 ,  H05K5/00 ,  G09G3/3266 ,  G09G3/3275

Abstract: A display device includes a base layer, first pixels, second pixels, a power supply line (PSL), a power supply voltage supply circuit (PSVSC), and a feedback wire (FBW). The base layer includes a display area (DA) and a non-display area (NDA) adjacent to the DA. The DA includes a first pixel area (PA) including first pixels and a second PA including second pixels. The second PA protrudes from the first PA. The PSL extends in at least a first direction in the DA. The PSL receives a first power supply voltage (PSV) through a first end of the PSL, and supplies the first PSV to the first and second pixels. The PSVSC supplies the first PSV to the PSL through the first end. The FBW is electrically connected to a second end of the PSL disposed in the second PA. The FBW feeds back the first PSV to the PSVSC.

公开(公告)号：US10796933B2

公开(公告)日：2020-10-06

申请号：US16173950

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Haeyoung Yoo ,  Taejong Kim ,  Juhee Lee ,  Myungsoo Huh ,  Jaekyu Park ,  Hyunwoo Joo

IPC: H01L21/67 ,  H01J37/32 ,  H01L27/12 ,  H01L21/311 ,  H01L21/027 ,  H01L27/32

Abstract: Provided is a display device manufacturing apparatus and a manufacturing method of a display device. The display device manufacturing apparatus includes: a chamber; a supporter arranged in the chamber and supporting a substrate; an electrode arranged in the chamber so as to face the supporter; a gas supply arranged in the chamber and configured to supply process gas into the chamber; a first baffle arranged at a rim of the supporter and having at least one first through hole; and a second baffle arranged between the first baffle and the chamber and covering the at least one first through hole in a plan view to alter a path of by-products discharged from the chamber.