Laser annealing apparatus and method of manufacturing display apparatus using the same
    3.
    发明授权
    Laser annealing apparatus and method of manufacturing display apparatus using the same 有权
    激光退火装置及使用其的显示装置的制造方法

    公开(公告)号:US09378951B1

    公开(公告)日:2016-06-28

    申请号:US14831802

    申请日:2015-08-20

    CPC classification number: H01L21/02675

    Abstract: A method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate, placing the substrate with the amorphous silicon layer in a chamber having a window on an upper portion thereof, and directing a laser beam toward the window, and converting the amorphous silicon layer into a polycrystalline silicon layer by irradiating the amorphous silicon layer with the laser beam while nitrogen gas is discharged from a nozzle located adjacent to an opening of a stabilizing room, wherein the laser beam reaches the amorphous silicon layer on the substrate after passing through the window, the stabilization room, and the opening of the stabilization room, wherein the opening faces the substrate.

    Abstract translation: 一种制造显示装置的方法,所述方法包括在基板上形成非晶硅层,将具有非晶硅层的基板放置在其上部具有窗口的室中,并将激光束引向窗口,以及 通过在与稳定室的开口相邻的喷嘴排出氮气的同时用激光束照射非晶硅层将非晶硅层转换为多晶硅层,其中激光束到达基板上的非晶硅层 在通过窗户,稳定室和稳定室的开口之后,其中开口面向衬底。

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