Laser crystallizing apparatus
    3.
    发明授权

    公开(公告)号:US11666989B2

    公开(公告)日:2023-06-06

    申请号:US16842272

    申请日:2020-04-07

    CPC classification number: B23K26/127 B23K26/352

    Abstract: Provided is a laser crystallizing apparatus including a laser generator generating a laser beam and an optical system photo-converting the laser beam to make a converted laser beam. A beam transmitting unit includes a passage through which the converted laser beam is transmitted into the chamber. The beam transmitting unit includes a chamber window provided on the chamber to transmit the laser beam, and a shield window movably disposed below the chamber window to prevent a material generated in the chamber from reaching the chamber window.

    Laser crystallizing apparatus
    4.
    发明授权

    公开(公告)号:US10898972B2

    公开(公告)日:2021-01-26

    申请号:US15168325

    申请日:2016-05-31

    Abstract: A laser crystallizing apparatus includes a stage configured to receive a substrate, the stage including a plurality of groove lines each having a predetermined depth and width, and a plurality of control holes, each arranged in a respective groove line. Each control hole is provided with a negative pressure to hold the substrate to a surface of the stage or a positive pressure to release the substrate from the surface of the stage.

    Laser crystallization apparatus for crystallizing an amorphous silicon thin film

    公开(公告)号:US10181413B2

    公开(公告)日:2019-01-15

    申请号:US15138986

    申请日:2016-04-26

    Abstract: A laser crystallization apparatus includes a laser generator that generates a laser beam including a plurality of line beams that are parallel to each other. An optical system includes a plurality of lenses and mirrors, wherein the optical system optically converts the generated laser beam to a converted laser beam. A chamber includes a stage and a substrate disposed on the stage, wherein a laser-crystallized thin film is formed on the substrate when the substrate is irradiated by the converted laser beam. A line focus adjuster that adjusts a line focus and a final focus of the plurality of line beams passing through the optical system, wherein the substrate is irradiated by the plurality of line beams at the final focus of the plurality of line beams.

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